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page-title" role="heading">Lenses & mirrors</h1><p role="heading" class="hero-banner-subtitle page-subtitle scrollbar-hide max-h-[198px]">The complex optical systems in our machines reduce the image printed on a wafer to the nanometer level</p><div class="hero-banner-comp"><div class="hero-banner-comp-line"><svg class="h-full w-full object-cover object-center " role="img" xlink:title="long arrow"><use href="/images/icons/long-arrow.svg#long-arrow"></use></svg></div><label class="hero-banner-comp-text"><span class="">01 / 42</span></label></div></div></div></div></div></div><div class="component col-span-12 bg-color-gray-100 bg-light custom-container rte-container fluid-grid"><div class="component col-span-12 md:col-start-3 md:col-span-4 no-pt no-px no-pb custom-container rte-container fluid-grid"><div class="component col-span-12 mb-2 font-weight--light custom-rich-text "><div><h5>When we talk about a lithography machine’s optics, we aren’t talking about a single, simple lens. The core of every lithography machine is an extended optical system made up of dozens of individual components.</h5></div></div></div><div class="component col-span-12 md:col-start-7 md:col-start-8 md:col-span-3 no-pb no-pt no-px custom-container rte-container fluid-grid"><div class="component col-span-12 custom-rich-text "><div><p>In deep ultraviolet (DUV) lithography systems, those components are lenses; in extreme ultraviolet (EUV) systems, they’re mirrors. Each component must be correctly positioned to within a nanometer to ensure image quality. ASML’s innovations in lens and mirror design have allowed chipmakers to reduce the sizes of features on microchips. Since the late 1980s, all our lithography systems have featured optics from our strategic partner ZEISS.</p></div></div></div></div><div class="component itb itb--default col-span-12 xl:col-span-12 mb-10 no-pb"><div class="itb-text-col component-wrapper"><div class="component col-span-12 mb-2 font-weight--medium custom-rich-text "><div><h4>Numerical aperture</h4></div></div><div class="component col-span-12 xl:col-span-5 xl:mb-6 md:mb-6 mb-6 custom-rich-text "><div><p>The smallest feature size that a lithography system can print is given by the <a href="https://www.asml.com/en/technology/lithography-principles/rayleigh-criterion" rel="noopener noreferrer">Rayleigh criterion</a>. According to the formula, one factor that affects how small the feature size can be is the numerical aperture (NA), which is a measure of how much light the system’s optics can collect and focus.</p><p><br /></p><p>Increasing a system’s NA by using larger, higher-precision optics will shrink the size of the features it can print. With optical systems more than 1.2 meters tall and weighing more than a metric ton, our highest-resolution <a href="https://www.asml.com/en/products/duv-lithography-systems" rel="noopener noreferrer">DUV lithography machines</a> reach an NA of 1.35.</p><p><br /></p><p>Our state-of-the-art <a href="https://www.asml.com/en/products/euv-lithography-systems" rel="noopener noreferrer">EUV lithography machines</a>, whose largest mirrors are 1 meter across and smooth down to tens of picometers, have an NA of 0.55. Although that’s lower than the NA in DUV machines, the EUV systems print smaller features because they use a much smaller wavelength of light – another factor in the Rayleigh criterion.</p></div></div></div><div class="itb-media-col component-wrapper"><div class="itb-img"><img alt="" width="1918" height="1081" loading="lazy" title="" style="object-position:50% 50%" sizes="(max-width: 99px) 100px, (max-width: 319px) 320px, (max-width: 499px) 500px, (max-width: 575px) 575px, 1200px" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/inside-nxe3400b--euv-source-droplet-generator-and-collector-mirror43688/asml_zeiss_lens_creative_shot_01.jpg?mw=100 100w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/inside-nxe3400b--euv-source-droplet-generator-and-collector-mirror43688/asml_zeiss_lens_creative_shot_01.jpg?mw=320 320w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/inside-nxe3400b--euv-source-droplet-generator-and-collector-mirror43688/asml_zeiss_lens_creative_shot_01.jpg?mw=500 500w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/inside-nxe3400b--euv-source-droplet-generator-and-collector-mirror43688/asml_zeiss_lens_creative_shot_01.jpg?mw=576 576w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/inside-nxe3400b--euv-source-droplet-generator-and-collector-mirror43688/asml_zeiss_lens_creative_shot_01.jpg?mw=1200 1200w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/inside-nxe3400b--euv-source-droplet-generator-and-collector-mirror43688/asml_zeiss_lens_creative_shot_01.jpg?h=1081&iar=0&w=1918"/></div></div></div><div class="component col-span-12 custom-container rte-container fluid-grid"><div class="component itb itb--default col-span-12 img--left"><div class="itb-text-col component-wrapper"><div class="itb-rt custom-rich-text "><h4>Immersion lithography</h4></div><div class="component col-span-12 md:mb-6 custom-rich-text "><div><p>In 2003, ASML took an important step forward in improving the resolution of our DUV systems. We developed immersion lithography, which allows chipmakers to print even smaller features with the same wavelength of light by projecting the light through a layer of water between the lens and the wafer.</p><p><br /></p><p>Without the water, reaching an NA of more than 1 was impossible. With it, our systems' optics reach an NA of 1.35.</p></div></div><div class="component col-span-12 md:mb-6 custom-rich-text "><div><h4>Complexity brings control</h4></div></div><div class="component col-span-12 custom-rich-text "><div><p>The sheer complexity of today’s lithography optics makes delivering high-quality optical systems a massive engineering challenge. But it also brings a unique opportunity to control every exposure with immense precision. Thousands of actuators allow the exact position and orientation of individual lens and mirror elements to be minutely adjusted to ensure the perfect image on the wafer every time.</p><p><br /></p><p>Why are these adjustments needed? A working lithography system isn’t static. For example, the repeated intense light pulses used in lithography cause the optical system to warm up, which leads to distortions. These changes may be measured in millikelvins and nanometers, but that’s still enough to lead to defective microchips. Actuators in the optical elements actively compensate for these heating effects.</p></div></div></div><div class="itb-media-col component-wrapper"><div class="itb-img"><img alt="Immersion" width="1918" height="1081" loading="lazy" title="Immersion" style="object-position:50% 50%" sizes="(max-width: 99px) 100px, (max-width: 319px) 320px, (max-width: 499px) 500px, (max-width: 575px) 575px, 1200px" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/immersion_553-cropped.jpg?mw=100 100w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/immersion_553-cropped.jpg?mw=320 320w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/immersion_553-cropped.jpg?mw=500 500w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/immersion_553-cropped.jpg?mw=576 576w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/immersion_553-cropped.jpg?mw=1200 1200w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/immersion_553-cropped.jpg?h=1081&iar=0&w=1918"/></div></div></div></div><div class="component itb itb--default col-span-12 undefined"><div class="itb-text-col component-wrapper"><div class="component col-span-12 mb-2 font-weight--medium custom-rich-text "><div><h4>EUV needs mirrors</h4></div></div><div class="component col-span-12 mb-6 custom-rich-text "><div><p>DUV lithography machines use lenses to focus light. But there are no lenses for EUV lithography. Since most materials absorb EUV light, the lenses would absorb the light in the system. Instead, we developed a brand-new optical system that uses ultrasmooth, multilayer mirrors inside a vacuum chamber. Each mirror has over 100 layers of materials that were carefully chosen and precisely engineered to maximize the reflection of EUV light.</p></div></div><div class="component col-span-12 mb-6 custom-rich-text "><div><p>Flatness is also crucial for EUV reflection. The mirrors are polished to a smoothness of less than one atom’s thickness. To put that in perspective, if the mirrors were the size of Germany, the tallest ‘mountain’ would be just 1 millimeter high.</p></div></div><div class="component col-span-12 mb-2 font-weight--medium custom-rich-text "><div><h4>High NA EUV</h4></div></div><div class="component col-span-12 custom-rich-text "><div><p>ASML’s latest EUV platform (EXE) increased the system’s NA from 0.33 to 0.55. Known as ‘High NA’, this platform has a novel optics design and significantly faster stages. </p><p> </p><p>The High NA platform will enable geometric chip scaling beyond the next decade. It’s designed to enable multiple future nodes, starting at the 2 nm Logic node and followed by Memory nodes at a similar transistor density.</p></div></div></div><div class="itb-media-col component-wrapper"><div class="itb-img"><img alt="Inside NXE3400 " width="1920" height="1080" loading="lazy" title="Inside NXE3400 " style="object-position:50% 50%" sizes="(max-width: 99px) 100px, (max-width: 319px) 320px, (max-width: 499px) 500px, (max-width: 575px) 575px, 1200px" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43679-inside-nxe3400.jpg?mw=100 100w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43679-inside-nxe3400.jpg?mw=320 320w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43679-inside-nxe3400.jpg?mw=500 500w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43679-inside-nxe3400.jpg?mw=576 576w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43679-inside-nxe3400.jpg?mw=1200 1200w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43679-inside-nxe3400.jpg?h=1080&iar=0&w=1920"/></div></div></div><div class="component carousel col-span-12 " role="link" tabindex="0"><div class="carousel-wrapper "><div class="carousel-desktop"><div class="carousel-heading"><hgroup><p class="carousel-subtitle">Lithography principles</p><span class="carousel-title ">The science behind the chip</span></hgroup></div><div class="carousel-mobile"><div class="z-10 flex w-fit items-center gap-4 rounded-28px bg-color-black-900/70 px-8 py-3 absolute left-58.75 top-16 max-md:hidden animate-show-icon opacity-100"><span class="h-2.5 w-2.5 fill-color-white" role="presentation"><svg xmlns="http://www.w3.org/2000/svg" width="10" height="10" viewBox="0 0 10 10" fill="none"><path fill-rule="evenodd" clip-rule="evenodd" d="M4.94975 0.0502621L5.65686 0.757369L1.41423 4.99999L5.65687 9.24262L4.94976 9.94973L0.707128 5.7071L0.707112 5.70712L5.03015e-06 5.00001L2.12145e-05 4.99999L1.17736e-05 4.99998L0.707118 4.29288L0.707128 4.29289L4.94975 0.0502621Z" fill="white"></path></svg></span><span class="my-0.25 h-7.5 w-8 fill-color-yellow" role="presentation"><svg class="h-full w-full object-cover object-center animate-move-swipe-gesture" role="img"><use href="/images/icons/ui.svg#grab-action"></use></svg></span><span class="h-2.5 w-2.5 fill-color-white" role="presentation"><svg xmlns="http://www.w3.org/2000/svg" width="11" height="10" viewBox="0 0 11 10" fill="none"><path fill-rule="evenodd" clip-rule="evenodd" d="M5.84923 9.94974L5.14212 9.24263L9.38475 5.00001L5.14212 0.757376L5.84922 0.0502692L10.0919 4.2929L10.0919 4.29288L10.799 4.99999L10.799 5.00001L10.799 5.00002L10.0919 5.70712L10.0919 5.70711L5.84923 9.94974Z" fill="white"></path></svg></span></div><div class="inline-block h-95 w-65 md:h-125 md:w-73.25"><a title="" target="" class="group relative mr-px block h-full max-w-full text-color-white" href="/en/technology/lithography-principles/rayleigh-criterion"><div class="h-full w-full "><div class="relative h-full w-full"><img alt="Experience Center Veldhoven" width="1920" height="1281" sizes="(max-width: 768px) 507px, 667px" class="h-full w-full object-cover object-center md:h-125" title="Experience Center Veldhoven" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/40868-experience-center-veldhoven.jpg?mw=507 507w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/40868-experience-center-veldhoven.jpg?mw=667 667w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/40868-experience-center-veldhoven.jpg?h=1281&iar=0&w=1920"/><div class="bg-gradient-transparent-black opacity-50 pointer-events-none absolute left-0 top-0 h-full w-full group-hover:bg-gradient-black opacity-100 transition-opacity duration-300 ease-in-out group-hover:opacity-100"></div></div></div><div class="absolute bottom-0 left-0 w-full whitespace-normal px-8 pb-12.25 xl:pb-[57px]"><span class="mb-2 block text-h5">The Rayleigh criterion</span><div class="absolute bottom-7.5 left-8 xl:bottom-10"><div class="underline-yellow after:h-0.75 group-hover:after:w-full "><p class="font-medium opacity-0 transition-opacity ease-out-300 group-hover:opacity-100">Read more</p></div></div><div class="ease-in-out-300-all overflow-hidden rte-container max-h-0 group-hover:max-h-75"><div class="mb-8 whitespace-normal leading-normal"><p>Learn the equation that determines just how small the transistors on a microchip can be.</p></div></div></div></a></div><div class="inline-block h-95 w-65 md:h-125 md:w-73.25"><a title="" target="" class="group relative mr-px block h-full max-w-full text-color-white" href="/en/technology/lithography-principles/light-and-lasers"><div class="h-full w-full "><div class="relative h-full w-full"><img alt="asml lab" width="1920" height="1280" sizes="(max-width: 768px) 507px, 667px" class="h-full w-full object-cover object-center md:h-125" title="asml lab" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/47099-asml-lab.jpg?mw=507 507w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/47099-asml-lab.jpg?mw=667 667w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/47099-asml-lab.jpg?h=1280&iar=0&w=1920"/><div class="bg-gradient-transparent-black opacity-50 pointer-events-none absolute left-0 top-0 h-full w-full group-hover:bg-gradient-black opacity-100 transition-opacity duration-300 ease-in-out group-hover:opacity-100"></div></div></div><div class="absolute bottom-0 left-0 w-full whitespace-normal px-8 pb-12.25 xl:pb-[57px]"><span class="mb-2 block text-h5">Light & lasers</span><div class="absolute bottom-7.5 left-8 xl:bottom-10"><div class="underline-yellow after:h-0.75 group-hover:after:w-full "><p class="font-medium opacity-0 transition-opacity ease-out-300 group-hover:opacity-100">Read more</p></div></div><div class="ease-in-out-300-all overflow-hidden rte-container max-h-0 group-hover:max-h-75"><div class="mb-8 whitespace-normal leading-normal"><p>From visible blue light to invisible extreme UV light, our lithography machines keep innovation in light and lasers moving forward.</p></div></div></div></a></div><div class="inline-block h-95 w-65 md:h-125 md:w-73.25"><a title="" target="" class="group relative mr-px block h-full max-w-full text-color-white" href="/en/technology/lithography-principles/mechanics-and-mechatronics"><div class="h-full w-full "><div class="relative h-full w-full"><img alt="Inside NXE3400 - The wafer handler bringing a wafer into the machine" width="1920" height="1080" sizes="(max-width: 768px) 507px, 667px" class="h-full w-full object-cover object-center md:h-125" title="Inside NXE3400 - The wafer handler bringing a wafer into the machine" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/inside-nxe3400---the-wafer-handler-bringing-a-wafer-into-the-machine_43682.jpg?mw=507 507w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/inside-nxe3400---the-wafer-handler-bringing-a-wafer-into-the-machine_43682.jpg?mw=667 667w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/inside-nxe3400---the-wafer-handler-bringing-a-wafer-into-the-machine_43682.jpg?h=1080&iar=0&w=1920"/><div class="bg-gradient-transparent-black opacity-50 pointer-events-none absolute left-0 top-0 h-full w-full group-hover:bg-gradient-black opacity-100 transition-opacity duration-300 ease-in-out group-hover:opacity-100"></div></div></div><div class="absolute bottom-0 left-0 w-full whitespace-normal px-8 pb-12.25 xl:pb-[57px]"><span class="mb-2 block text-h5">Mechanics & mechatronics</span><div class="absolute bottom-7.5 left-8 xl:bottom-10"><div class="underline-yellow after:h-0.75 group-hover:after:w-full "><p class="font-medium opacity-0 transition-opacity ease-out-300 group-hover:opacity-100">Read more</p></div></div><div class="ease-in-out-300-all overflow-hidden rte-container max-h-0 group-hover:max-h-75"><div class="mb-8 whitespace-normal leading-normal"><p>Our lithography machines feature some of the world’s most advanced, precision-engineered mechanical and mechatronic systems.</p></div></div></div></a></div><div class="inline-block h-95 w-65 md:h-125 md:w-73.25"><a title="" target="" class="group relative mr-px block h-full max-w-full text-color-white" href="/en/technology/lithography-principles/measuring-accuracy"><div class="h-full w-full "><div class="relative h-full w-full"><img alt="NXE3400 metrology" width="1920" height="1080" sizes="(max-width: 768px) 507px, 667px" class="h-full w-full object-cover object-center md:h-125" title="NXE3400 metrology" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?mw=507 507w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?mw=667 667w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?h=1080&iar=0&w=1920"/><div class="bg-gradient-transparent-black opacity-50 pointer-events-none absolute left-0 top-0 h-full w-full group-hover:bg-gradient-black opacity-100 transition-opacity duration-300 ease-in-out group-hover:opacity-100"></div></div></div><div class="absolute bottom-0 left-0 w-full whitespace-normal px-8 pb-12.25 xl:pb-[57px]"><span class="mb-2 block text-h5">Measuring accuracy</span><div class="absolute bottom-7.5 left-8 xl:bottom-10"><div class="underline-yellow after:h-0.75 group-hover:after:w-full "><p class="font-medium opacity-0 transition-opacity ease-out-300 group-hover:opacity-100">Read more</p></div></div><div class="ease-in-out-300-all overflow-hidden rte-container max-h-0 group-hover:max-h-75"><div class="mb-8 whitespace-normal leading-normal"><p>ASML systems rely on data from sensors as well as diffraction-based and electron beam measurements to optimize chip production.</p></div></div></div></a></div><div class="inline-block h-95 w-65 md:h-125 md:w-73.25"><a title="" target="" class="group relative mr-px block h-full max-w-full text-color-white" href="/en/technology/lithography-principles/pushing-k1-further"><div class="h-full w-full "><div class="relative h-full w-full"><img alt="wafer and DUV reticle mask" width="1920" height="1238" sizes="(max-width: 768px) 507px, 667px" class="h-full w-full object-cover object-center md:h-125" title="wafer and DUV reticle mask" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-elements/47147-wafer-and-duv-reticle-mask.jpg?mw=507 507w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-elements/47147-wafer-and-duv-reticle-mask.jpg?mw=667 667w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-elements/47147-wafer-and-duv-reticle-mask.jpg?h=1238&iar=0&w=1920"/><div class="bg-gradient-transparent-black opacity-50 pointer-events-none absolute left-0 top-0 h-full w-full group-hover:bg-gradient-black opacity-100 transition-opacity duration-300 ease-in-out group-hover:opacity-100"></div></div></div><div class="absolute bottom-0 left-0 w-full whitespace-normal px-8 pb-12.25 xl:pb-[57px]"><span class="mb-2 block text-h5">Pushing k1 further</span><div class="absolute bottom-7.5 left-8 xl:bottom-10"><div class="underline-yellow after:h-0.75 group-hover:after:w-full "><p class="font-medium opacity-0 transition-opacity ease-out-300 group-hover:opacity-100">Read more</p></div></div><div class="ease-in-out-300-all overflow-hidden rte-container max-h-0 group-hover:max-h-75"><div class="mb-8 whitespace-normal leading-normal"><p>ASML is pushing the fundamental physical concepts about how light interacts with matter to their absolute limit.</p></div></div></div></a></div></div></div></div></div><div class="component col-span-12 bg-color-primary bg-dark no-pb custom-container rte-container fluid-grid"><div class="component col-span-12 mb-2 md:col-start-3 md:col-span-7 xl:col-start-3 xl:col-span-5 custom-rich-text "><div><h4>More about ASML technology</h4></div></div></div><div class="component col-span-12 bg-color-primary bg-dark no-pt custom-container rte-container fluid-grid"><div class="component custom-container--respy content-cards col-span-12 no-pt no-px no-pb"><div class="content-cards-wrapper"><a title="" target="" class="content-card has-link" href="/en/products/euv-lithography-systems"><img alt="EUV lithography systems" width="1920" height="1080" sizes="(max-width: 99px) 100px, 320px" class="content-card-image" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/products/euv-lithography-systems/twinscan-nxe3400c.png?mw=100 100w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/products/euv-lithography-systems/twinscan-nxe3400c.png?mw=320 320w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/products/euv-lithography-systems/twinscan-nxe3400c.png?h=1080&iar=0&w=1920"/><span class="content-card-title">EUV lithography systems</span><div class="content-card-text rte-container break-words"><p>Providing highest resolution in high-volume manufacturing, ASML’s extreme ultraviolet lithography machines are pushing Moore’s Law forward.</p></div></a><a title="" target="" class="content-card has-link" href="/en/products/duv-lithography-systems"><img alt="DUV lithography systems" width="1920" height="1080" sizes="(max-width: 99px) 100px, 320px" class="content-card-image" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/products/duv-lithography-systems/twinscan-nxt2100i.png?mw=100 100w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/products/duv-lithography-systems/twinscan-nxt2100i.png?mw=320 320w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/products/duv-lithography-systems/twinscan-nxt2100i.png?h=1080&iar=0&w=1920"/><span class="content-card-title">DUV lithography systems</span><div class="content-card-text rte-container break-words"><p>ASML's deep ultraviolet (DUV) lithography systems dive deep into the UV spectrum to print the tiny features that form the basis of the microchip.</p></div></a><a title="" target="" class="content-card has-link" href="/en/products/metrology-and-inspection-systems"><img alt="Metrology & inspection systems" width="1920" height="1080" sizes="(max-width: 99px) 100px, 320px" class="content-card-image" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?mw=100 100w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?mw=320 320w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?h=1080&iar=0&w=1920"/><span class="content-card-title">Metrology & inspection systems</span><div class="content-card-text rte-container break-words"><p>Delivering speed and accuracy, our metrology and inspection portfolio covers every step manufacturing processes, from R&D to mass production.</p></div></a><a title="" target="" class="content-card has-link" href="/en/products/computational-lithography"><img alt="Computational lithography" width="1920" height="1280" sizes="(max-width: 99px) 100px, 320px" class="content-card-image" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-elements/47149-lithography-elements-wafer-reticle.jpg?mw=100 100w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-elements/47149-lithography-elements-wafer-reticle.jpg?mw=320 320w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-elements/47149-lithography-elements-wafer-reticle.jpg?h=1280&iar=0&w=1920"/><span class="content-card-title">Computational lithography</span><div class="content-card-text rte-container break-words"><p>ASML's industry-leading computational lithography products enable accurate lithography simulations that help to improve chip yield and quality.</p></div></a></div></div></div><div class="component itb itb--default col-span-12 mb-12 img--left"><div class="itb-text-col component-wrapper"><div class="itb-rt custom-rich-text "><h3>Overachieving with overlay control</h3></div><div class="component col-span-12 mb-6 custom-rich-text "><div><p>A new lens manipulator aligns microchip layers with unprecedented precision</p></div></div><div class="component primary-btn col-span-12"><a title="" target="" class="btn button--yellowline " rel="noopener noreferer" href="/en/news/stories/2023/novel-lens-manipulator"><span class="text-span">Read the story</span></a></div></div><div class="itb-media-col component-wrapper"><div class="itb-img"><img alt="A person in a cleanroom suit makes an adjustment to the ZEISS projection optics system." width="623" height="350" loading="lazy" title="A person in a cleanroom suit makes an adjustment to the ZEISS projection optics system." style="object-position:50% 50%" sizes="(max-width: 99px) 100px, (max-width: 319px) 320px, (max-width: 499px) 500px, (max-width: 575px) 575px, 1200px" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/news/stories/2023/novel-lens-manipulator/zeiss-projection-optics.jpg?mw=100 100w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/news/stories/2023/novel-lens-manipulator/zeiss-projection-optics.jpg?mw=320 320w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/news/stories/2023/novel-lens-manipulator/zeiss-projection-optics.jpg?mw=500 500w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/news/stories/2023/novel-lens-manipulator/zeiss-projection-optics.jpg?mw=576 576w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/news/stories/2023/novel-lens-manipulator/zeiss-projection-optics.jpg?mw=1200 1200w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/news/stories/2023/novel-lens-manipulator/zeiss-projection-optics.jpg?h=350&iar=0&w=623"/></div></div></div></div></main><footer class="footer-bg--medium relative block w-full"><div id="footer" class="grid grid-cols-12"><div class="component breadcrumbs--footer "><nav><ol><li><a title="Home" class="breadcrumb-item" href="/en">Home</a></li><li><a title="Technology" class="breadcrumb-item" href="/en/technology">Technology</a></li><li><a title="Lithography principles" class="breadcrumb-item" 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Foundation","target":"","querystring":"","id":"{8FF9ED59-5325-4333-98FB-36AB646E0AF6}","href":"/en/company/asml-foundation"}}}}]}}}}}],"search-panel":[{"uid":"82040ea4-185e-44a5-9232-56c3ab9e8024","componentName":"SearchBar","dataSource":"9f2025b5-ff44-40bd-af78-77b96a17f5e1","params":{"GridParameters":"col-span-12","tag":"span","FieldNames":"Header","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"12"},"fields":{"label":{"value":"Search"},"placeholderText":{"value":"Search the site"},"searchPage":{"value":{"href":"https://www.asml.com/en/search","linktype":"external","url":"https://www.asml.com/en/search","target":"","class":"","text":"","title":""}}}}]}}]}}],"hero-banner":[{"uid":"32a62eae-563b-4886-a73c-88cbe1205ab8","componentName":"HeroBanner","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/lenses and mirrors/Data/Hero Banner","params":{"GridParameters":"col-span-12","FieldNames":"Medium","Styles":"{38E4DCEC-7934-4768-ADFE-65E4A5C26274}"},"fields":{"backgroundImage":{"value":{"src":"https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/duv-lens-element.jpg?h=1280\u0026iar=0\u0026w=1920","alt":"duv lens element","width":"1920","height":"1280"}},"backgroundImageFocalPoint":{"Top":"50%","Left":"50%"},"cta":{"value":{"href":""}},"subtitle":{"value":"The complex optical systems in our machines reduce the image printed on a wafer to the nanometer level"},"title":{"value":"Lenses \u0026 mirrors"}},"placeholders":{"hero-banner-quick-link-list":[],"hero-banner-breadcrumb":[{"uid":"347efc5e-34ce-44b7-a63a-a2c9987a4865","componentName":"Breadcrumbs","dataSource":"","params":{"FieldNames":"Default"},"fields":{"data":{"contextItem":{"navigationTitle":{"value":"Lenses \u0026 mirrors"},"hideFooter":{"data":{"value":false}},"url":{"path":"/en/technology/lithography-principles/lenses-and-mirrors"},"ancestors":[{"navigationTitle":{"value":"Lithography principles"},"url":{"path":"/en/technology/lithography-principles"}},{"navigationTitle":{"value":"Technology"},"url":{"path":"/en/technology"}},{"navigationTitle":{"value":"Home"},"url":{"path":"/en/"}}],"parentItem":null}}}}]}}],"headless-main":[{"uid":"3fdb1a3b-674b-4ddd-9d1a-24cfc751ba9f","componentName":"CustomContainer","dataSource":"","params":{"GridParameters":"col-span-12","FieldNames":"Default","Styles":"bg-color-gray-100 bg-light","CacheClearingBehavior":"Clear on publish"},"placeholders":{"content-component-placeholder":[{"uid":"fd2da089-6197-435f-83c1-1e9a1f6b3049","componentName":"CustomContainer","dataSource":"","params":{"GridParameters":"col-span-12 md:col-start-3 md:col-span-4","FieldNames":"Default","Styles":"no-pt no-px no-pb","CacheClearingBehavior":"Clear on publish"},"placeholders":{"content-component-placeholder":[{"uid":"4355bac4-1693-4cbd-a6b5-8e7b2811cf2a","componentName":"CustomRichText","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/lenses and mirrors/Data/RT - Intro 1","params":{"GridParameters":"col-span-12 mb-2","FieldNames":"Default","Styles":"font-weight--light","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003ch5\u003eWhen we talk about a lithography machine’s optics, we aren’t talking about a single, simple lens. The core of every lithography machine is an extended optical system made up of dozens of individual components.\u003c/h5\u003e"}}}]}},{"uid":"7dc06c29-6d1a-41f8-acdb-a0cff79e1b25","componentName":"CustomContainer","dataSource":"","params":{"GridParameters":"col-span-12 md:col-start-7 md:col-start-8 md:col-span-3","FieldNames":"Default","Styles":"no-pb no-pt no-px","CacheClearingBehavior":"Clear on publish"},"placeholders":{"content-component-placeholder":[{"uid":"5ca5da2d-a800-430d-884e-45055c2ac9e2","componentName":"CustomRichText","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/lenses and mirrors/Data/RT - Intro 2","params":{"GridParameters":"col-span-12","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003eIn deep ultraviolet (DUV) lithography systems, those components are lenses; in extreme ultraviolet (EUV) systems, they’re mirrors. Each component must be correctly positioned to within a nanometer to ensure image quality. ASML’s innovations in lens and mirror design have allowed chipmakers to reduce the sizes of features on microchips. Since the late 1980s, all our lithography systems have featured optics from our strategic partner ZEISS.\u003c/p\u003e"}}}]}}]}},{"uid":"3d25cd1c-676a-402f-91d1-064c04ba6b3c","componentName":"ImageTextBlock","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/lenses and mirrors/Data/ITB - Numerical aperture","params":{"GridParameters":"col-span-12 xl:col-span-12 mb-10","FieldNames":"Default","Styles":"no-pb","CacheClearingBehavior":"Clear on publish"},"fields":{"text":{"value":""},"title":{"value":""},"image":{"value":{"src":"https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/inside-nxe3400b--euv-source-droplet-generator-and-collector-mirror43688/asml_zeiss_lens_creative_shot_01.jpg?h=1081\u0026iar=0\u0026w=1918","alt":"","width":"1918","height":"1081"}},"imageFocalPoint":{"Top":"50%","Left":"50%"},"imageCaption":{"value":""},"largeParagraph":{"value":""},"stackedText":{"value":""},"EnableImageEnlargement":{"value":false}},"placeholders":{"image-text-block-placeholder-a":[{"uid":"f120bae0-6809-4fd7-a2e3-a5f5dfd2b27b","componentName":"CustomRichText","dataSource":"a8bcd493-05f6-45d8-9a80-a3fa239fbdd3","params":{"GridParameters":"col-span-12 mb-2","FieldNames":"Default","Styles":"font-weight--medium","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003ch4\u003eNumerical aperture\u003c/h4\u003e"}}},{"uid":"ac3e3346-8b0c-452e-95dc-867f7ac25ca1","componentName":"CustomRichText","dataSource":"5651c27c-5251-4253-be44-4d6e9d50d62f","params":{"GridParameters":"col-span-12 xl:col-span-5 xl:mb-6 md:mb-6 mb-6","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003eThe smallest feature size that a lithography system can print is given by the \u003ca href=\"https://www.asml.com/en/technology/lithography-principles/rayleigh-criterion\" rel=\"noopener noreferrer\"\u003eRayleigh criterion\u003c/a\u003e. According to the formula, one factor that affects how small the feature size can be is the numerical aperture (NA), which is a measure of how much light the system’s optics can collect and focus.\u003c/p\u003e\u003cp\u003e\u003cbr /\u003e\u003c/p\u003e\u003cp\u003eIncreasing a system’s NA by using larger, higher-precision optics will shrink the size of the features it can print. With optical systems more than 1.2 meters tall and weighing more than a metric ton, our highest-resolution \u003ca href=\"https://www.asml.com/en/products/duv-lithography-systems\" rel=\"noopener noreferrer\"\u003eDUV lithography machines\u003c/a\u003e reach an NA of 1.35.\u003c/p\u003e\u003cp\u003e\u003cbr /\u003e\u003c/p\u003e\u003cp\u003eOur state-of-the-art \u003ca href=\"https://www.asml.com/en/products/euv-lithography-systems\" rel=\"noopener noreferrer\"\u003eEUV lithography machines\u003c/a\u003e, whose largest mirrors are 1 meter across and smooth down to tens of picometers, have an NA of 0.55. Although that’s lower than the NA in DUV machines, the EUV systems print smaller features because they use a much smaller wavelength of light – another factor in the Rayleigh criterion.\u003c/p\u003e"}}}],"image-text-block-placeholder-b":[]}},{"uid":"e6481ea2-bbd1-4906-bc75-12b2d255ad14","componentName":"CustomContainer","dataSource":"","params":{"GridParameters":"col-span-12","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"placeholders":{"content-component-placeholder":[{"uid":"3fcd66c8-d5b3-4dc0-8bb2-24829d51afcb","componentName":"ImageTextBlock","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/lenses and mirrors/Data/ITB - Immersion lithography","params":{"GridParameters":"col-span-12","FieldNames":"Default","Styles":"img--left","CacheClearingBehavior":"Clear on publish"},"fields":{"text":{"value":"\u003ch4\u003eImmersion lithography\u003c/h4\u003e"},"title":{"value":""},"image":{"value":{"src":"https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/immersion_553-cropped.jpg?h=1081\u0026iar=0\u0026w=1918","alt":"Immersion","width":"1918","height":"1081"}},"imageFocalPoint":{"Top":"50%","Left":"50%"},"imageCaption":{"value":""},"largeParagraph":{"value":""},"stackedText":{"value":""},"EnableImageEnlargement":{"value":false}},"placeholders":{"image-text-block-placeholder-a":[{"uid":"dcd31291-0750-44eb-bd54-965e33bdecc7","componentName":"CustomRichText","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/lenses and mirrors/Data/RT - Numerical aperture","params":{"GridParameters":"col-span-12 md:mb-6","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003eIn 2003, ASML took an important step forward in improving the resolution of our DUV systems. We developed immersion lithography, which allows chipmakers to print even smaller features with the same wavelength of light by projecting the light through a layer of water between the lens and the wafer.\u003c/p\u003e\u003cp\u003e\u003cbr /\u003e\u003c/p\u003e\u003cp\u003eWithout the water, reaching an NA of more than 1 was impossible. With it, our systems' optics reach an NA of 1.35.\u003c/p\u003e"}}},{"uid":"72a01de5-e2bd-4707-a73d-f1a6fe61e1e8","componentName":"CustomRichText","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/lenses and mirrors/Data/RT - Complexity 1","params":{"GridParameters":"col-span-12 md:mb-6","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003ch4\u003eComplexity brings control\u003c/h4\u003e"}}},{"uid":"4674fd65-12ba-49c1-8fbc-03d381a29825","componentName":"CustomRichText","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/lenses and mirrors/Data/RT - Complexity 2","params":{"GridParameters":"col-span-12","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003eThe sheer complexity of today’s lithography optics makes delivering high-quality optical systems a massive engineering challenge. But it also brings a unique opportunity to control every exposure with immense precision. Thousands of actuators allow the exact position and orientation of individual lens and mirror elements to be minutely adjusted to ensure the perfect image on the wafer every time.\u003c/p\u003e\u003cp\u003e\u003cbr /\u003e\u003c/p\u003e\u003cp\u003eWhy are these adjustments needed? A working lithography system isn’t static. For example, the repeated intense light pulses used in lithography cause the optical system to warm up, which leads to distortions. These changes may be measured in millikelvins and nanometers, but that’s still enough to lead to defective microchips. Actuators in the optical elements actively compensate for these heating effects.\u003c/p\u003e"}}}],"image-text-block-placeholder-b":[]}}]}},{"uid":"cafbbaa2-f10a-45ee-ae06-de0e8eaa3808","componentName":"ImageTextBlock","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/lenses and mirrors/Data/ITB - EUV needs mirrors","params":{"GridParameters":"col-span-12","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"text":{"value":""},"title":{"value":""},"image":{"value":{"src":"https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43679-inside-nxe3400.jpg?h=1080\u0026iar=0\u0026w=1920","alt":"Inside NXE3400 ","width":"1920","height":"1080"}},"imageFocalPoint":{"Top":"50%","Left":"50%"},"imageCaption":{"value":""},"largeParagraph":{"value":""},"stackedText":{"value":""},"EnableImageEnlargement":{"value":false}},"placeholders":{"image-text-block-placeholder-a":[{"uid":"32f3cc2a-cd2f-4038-b25d-ca19eaf58a10","componentName":"CustomRichText","dataSource":"e334473c-a8d5-4ada-a983-70fd8ea37840","params":{"GridParameters":"col-span-12 mb-2","FieldNames":"Default","Styles":"font-weight--medium","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003ch4\u003eEUV needs mirrors\u003c/h4\u003e"}}},{"uid":"8a00818c-df12-48cd-85d4-161838957fa0","componentName":"CustomRichText","dataSource":"82b73cdb-3b91-4b76-8545-d82f2260c892","params":{"GridParameters":"col-span-12 mb-6","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003eDUV lithography machines use lenses to focus light. But there are no lenses for EUV lithography. Since most materials absorb EUV light, the lenses would absorb the light in the system. Instead, we developed a brand-new optical system that uses ultrasmooth, multilayer mirrors inside a vacuum chamber. Each mirror has over 100 layers of materials that were carefully chosen and precisely engineered to maximize the reflection of EUV light.\u003c/p\u003e"}}},{"uid":"7b2af754-7fd2-4f30-b10e-a7a026bac135","componentName":"CustomRichText","dataSource":"21c79492-90b5-497f-ac4d-30b0abba5ebe","params":{"GridParameters":"col-span-12 mb-6","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003eFlatness is also crucial for EUV reflection. The mirrors are polished to a smoothness of less than one atom’s thickness. To put that in perspective, if the mirrors were the size of Germany, the tallest ‘mountain’ would be just 1 millimeter high.\u003c/p\u003e"}}},{"uid":"fa64ae38-3ca1-49f2-aec6-2ca11ffdf4e0","componentName":"CustomRichText","dataSource":"82fdc7db-5530-415e-a46f-e04073dcb2ce","params":{"GridParameters":"col-span-12 mb-2","FieldNames":"Default","Styles":"font-weight--medium","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003ch4\u003eHigh NA EUV\u003c/h4\u003e"}}},{"uid":"14299dda-04bd-45fd-b4f8-da54ff921bc1","componentName":"CustomRichText","dataSource":"83f10c8a-ccaf-4e60-bdac-ff819dbb02f3","params":{"GridParameters":"col-span-12","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003eASML’s latest EUV platform (EXE) increased the system’s NA from 0.33 to 0.55. Known as ‘High NA’, this platform has a novel optics design and significantly faster stages.\u0026nbsp;\u003c/p\u003e\u003cp\u003e\u0026nbsp;\u003c/p\u003e\u003cp\u003eThe High NA platform will enable geometric chip scaling beyond the next decade. It’s designed to enable multiple future nodes, starting at the 2 nm Logic node and followed by Memory nodes at a similar transistor density.\u003c/p\u003e"}}}],"image-text-block-placeholder-b":[]}},{"uid":"98d1ef16-1098-4ef7-ade2-d23589694454","componentName":"Carousel","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/lenses and mirrors/Data/Car - Lithography principles","params":{"GridParameters":"col-span-12","tag":"span","CacheClearingBehavior":"Clear on publish","FieldNames":"Default"},"fields":{"data":{"datasource":{"title":{"data":{"value":"The science behind the chip"}},"subtitle":{"data":{"value":"Lithography principles"}},"children":{"results":[{"title":{"data":{"value":"The Rayleigh criterion"}},"content":{"data":{"value":"\u003cp\u003eLearn the equation that determines just how small the transistors on a microchip can 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