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href="https://jobs.bnl.gov/search-jobs/cfn?orgIds=3437&kt=1">Jobs</a> <li><a href="https://www.bnl.gov/cfn/contact.php">Contact</a> <li><a href="https://www.bnl.gov/cfn/business/">Business</a> <li class="orange-menu-item"> <a href="javascript:void(0);">Becoming a User</a> <ul> <li><a href="https://www.bnl.gov/cfn/user/">User Program Overview</a> <li><a href="https://www.bnl.gov/cfn/user/proposal-review.php">Proposal Review Process</a> <li><a target="_blank" href="https://cpp.bnl.gov/">User Proposal System</a> <li><a href="https://www.bnl.gov/cfn/user/agreements.php">User Agreements</a> <li><a target="_blank" href="https://nsrcportal.sandia.gov/">Other Nanoscale Science Research Centers</a> </ul> <li><a href="https://brookhavenlab.sharepoint.com/sites/CFNIntranet" target="_blank">Intranet <i class="fas fa-lock"></i></a> </ul> </div> </div>  <div id="subStripe"> <div class="container_24"> <div class="grid_24"> <h1>Nanofabrication Facility</h1> </div> </div> </div> <div class="container_24"> <div class="grid_24"> <div class="hero"></div> <a class="button headButton reversed" href="/cfn/equipment/">All Equipment »</a> <div id="tabs"> <ul> <li><a href="#tabs-1">Capabilities</a></li> <li><a href="#tabs-2">Major Equipment</a></li> <li><a href="#tabs-3">Minor Equipment</a></li> </ul> <div id="tabs-1"> <div class="tabInnerShell"> <div class="container_24"> <div class="grid_24 alpha omega"> <p>The Nanofabrication Facility is housed in a class 100/1000 clean room (5,000 sq. ft) dedicated to state-of-the art patterning and processing of thin films, nanomaterials, and devices. The instrumentation in the facility has been optimized to provide maximum flexibility for its users, with capabilities to pattern a variety of materials over a wide range of size scales, from 10 nanometers to 10 millimeters. The clean room is used to fabricate devices for nanoelectronics, nanophotonics, biomedical engineering, photovoltaics, x-ray optics, nanomagnetics and beyond.</p> <p><a class="orange button" href="https://wiki.bnl.gov/CFN-nanofab/index.php/Main_Page">» Nanofabrication Resources</a></p> <ul> <li>High-resolution patterning by electron beam lithography and optical lithography </li> <li>Thin-film deposition by electron beam and thermal evaporation, DC and RF magnetron sputtering, and plasma-enhanced chemical vapor deposition. </li> <li>Plasma-based dry etching and wet chemical etching </li> <li> <p>Electrical and optical characterization of thin-film devices </p> </li> </ul> </div> <div class="grid_12 alpha"> <h2>Thin-Film Deposition and Etch</h2> <h4>Reactive Ion Etch</h4> <p class="small">Contact: <a href="/staff/mlu">Ming Lu</a></p> <p>An Oxford Instruments Plasmalab 100 uses an inductively coupled plasma (ICP) source for the high-speed, anisotropic plasma etching of silicon, polymers and dielectric materials. The system has demonstrated capability to etch vertical walls in silicon to a depth of 300 µm at etch rates of 3 µm / min with an aspect ratio (width of feature to etch depth) of 50:1.</p> <p>A Trion Phantom III Reactive Ion Etcher is a general purpose fluorine based plasma etch tool for etching thin films generally 1 µm or less in thickness that have been deposited on silicon or other wafers up to 6" in diameter. Many processes for etching thin layers of photoresist, metal, semiconductors, or insulators are available.</p> <h4>Plasma Enhanced Chemical Vapor Deposition</h4> <p class="small">Contact: <a href="/staff/mlu">Ming Lu</a></p> <p>The Trion Orion III PECVD system is an inductively coupled plasma (ICP) deposition tool used for the deposition of thin films on silicon wafers and other substrates up to 6" in diameter. Current processes in use include the deposition of SiO2, Si3N4, and SiOxNy films.</p> <h4>Physical Vapor Deposition</h4> <p class="small">Contact: <a href="/staff/gwright">Gwen Wright</a></p> <p>Two individual Kurt J. Lesker PVD 75 vacuum deposition systems are available for thin film sputter and electron beam deposition of a wide variety of materials. The sputter deposition system contains has 3 targets for magnetron sputtering, shutter, rotational holder, and substrate heater. The e-beam system uses a 4-pocket electron beam deposition source with automatic crucible indexing. A small Denton evaporator is available for rapid-turn around deposition of metals.</p> </div> <div class="grid_12 omega"> <h2>Lithography</h2> <p>The Nanofabrication Facility features lithography by electron-beam, ultraviolet light, and ion-beam methods providing the capability to pattern from 10's of nanometers up to 100's of microns over large sample areas.</p> <h4>Electron Beam Lithography </h4> <p class="small">Contact: <a href="/staff/stein">Aaron Stein</a> </p> <p>JEOL JBX-6300FS, NPGS system Electron beam lithography at 100, 50, 25 keV (JEOL) and 30 keV (Helios w/ NPGS) is available with patterning of feature sizes as small as 8 nm. The JEOL 6300FS provides capability for high-speed, large area exposures (1mm+) and sub-20 nm overlay and stitching accuracy.</p> <h4>Optical Lithography </h4> <p class="small">Contact: <a href="/staff/mlu">Ming Lu</a></p> <p><a href="http://www.suss.com/products/mask-aligner/ma-ba6-gen2.html">Karl Suss MA6 Mask</a> Aligner: UV exposure of resist at 365-400nm wavelengths. Substrate sizes range from small chips to 3-inch diameter wafers. Pattern resolution as small as 1um using four-inch square masks.</p> <h4>Dual Scanning Electron Microscope (SEM) / Focused Ion Beam (FIB) system </h4> <p class="small">Contacts: <a href="/staff/fcamino">Fernando Camino</a>, <a href="/staff/stein">Aaron Stein</a></p> <p>A Helios Nanolab (FEI Company) dual-beam system capable of simultaneous focused ion beam milling and SEM imaging. NPGS nanolithography system can be used to pattern with either electrons or ions. Further capabilities are: gas injector for electron or ion beam assisted deposition of platinum and TEOS (dielectric), x-ray detector for EDS analysis, nano-manipulator probe, high resolution SEM (1 nm), FIB (5 nm), and STEM (0.8 nm) imaging, and in-situ sample electrical characterization.</p> </div> </div> </div> </div> <div id="tabs-2"> <div class="tabInnerShell"> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300167'>3-D Laser Lithography System (Photonic Professional GT)</a></h4><div class='shortDescription'><p><strong>3-D Litho:</strong></p><p style="">This tool (Nanoscribe Photonic Professional GT) is an automatic 3-D nanolithography system/3-D printer capable of creating polymer patterns/models down to sub-200 nm resolution using two-photon polymerization technique.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300068'>Deep Reactive Ion Etcher, available w/Bosch process (DRIE)</a></h4><div class='shortDescription'><p><strong>Silicon DRIE:</strong></p><p style="">This system has demonstrated capability to etch vertical walls in silicon to a depth of 300 µm at etch rates of 3 µm / min with an aspect ratio (width of feature to etch depth) of 1:50. It has a laser interferometer endpoint detector (shared with the other Oxford ICP RIE tool) to help achieving an accurate etching depth. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300076'>Dual Beam Scanning Electron/Focused Ion Beam Microscope</a></h4><div class='shortDescription'><p><strong>Dual Beam:</strong></p><p style="">Dual Beam Scanning Electron/Focused Ion Beam Microscope (FEI Helios), capable of simultaneous focused ion beam milling and SEM imaging.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300063'>Electron Beam Deposition System</a></h4><div class='shortDescription'><p style=""><strong>Ebeam Deposit:</strong></p><p style="">Three separate physical vapor deposition systems (all Kurt J. Lesker PVD75) are available for thin-film sputter, thermal, and electron-beam deposition of a wide variety of materials. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300323'>Electron Beam Induced Current (EBIC) Imaging-Helios G5</a></h4><div class='shortDescription'><strong>Electron Beam Induced Current (EBIC) Imaging:</strong><br /><br />EBIC is an analysis technique in the SEM, which creates images using the electrical response of the sample as a function of the scanning position of the electron beam. </div> <li><h4><a href='/cfn/equipment/details.php?q=300073'>Electron Beam Lithography Tool (EBL)</a></h4><div class='shortDescription'><p style=""><strong>Ebeam Litho</strong><strong>:</strong></p><p style="">The JEOL JBX-6300FS is a state-of-the-art 100kV EBL tool providing high-speed patterning capabilities with feature sizes as small as 8 nm over mm-scale areas.<strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300070'>General purpose Reactive Ion Etcher</a></h4><div class='shortDescription'><p style=""><strong>Trion RIE:</strong></p><p style="">The general purpose plasma etch tool (Trion Phantom III) is used for etching thin films generally 1 µm or less in thickness.<strong> </strong></p></div> </ul><ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300315'>Helios G5 Dual Beam SEM/FIB Microscope</a></h4><div class='shortDescription'><p><strong>Helios G5 Dual Beam SEM/FIB Microscope:</strong></p><p>Excellent electron and FIB imaging resolution (including at FIB energies below 2 keV). It possesses an array of imaging, analysis, device fabrication, electrical characterization, and TEM sample preparation capabilities.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300324'>In-Situ Electrical Characterization-Helios G5</a></h4><div class='shortDescription'>The Helios G5 has two ways to perform in-situ electrical characterization. One is to use the 7-pin SMA electrical feedthrough, which requires fixed wiring of the electrodes to the sample or device. The other is to perform two-terminal electrical probing (no need for fixed wiring) using two Kleindiek Nanotechnik robotic manipulators (fA-range current measurement resolution and nanometer scale positioning resolution). </div> <li><h4><a href='/cfn/equipment/details.php?q=300071'>Oxford Chlorine Etcher C (RIE-C)</a></h4><div class='shortDescription'><p style=""><strong>Oxford Metal Etcher:</strong></p><p style="">This ICP Reactive Ion Etching system (Oxford Instruments Plasmalab 100) has an inductively coupled plasma source for high-speed, anisotropic plasma etching.<strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300065'>Plasma Enhanced Chemical Vapor Deposition (PECVD) System</a></h4><div class='shortDescription'><p style=""><strong>Trion PECVD:</strong></p><p style="">This deposition system (Trion Orion III) provides plasma-enhanced chemical vapor deposition of thin films. Current capabilities include precursor gases for deposition of SiO2, Si3N4, and amorphous silicon films. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300097'>UV Mask Aligner</a></h4><div class='shortDescription'><p><strong>UV Mask Align:</strong></p><p style="">The system (Karl Suss MA-6 UV Mask Aligner) is capable of exposing photoresist patterns down to 1 micron resolution with UV light at two wavelengths (405 nm and 240m nm).</p></div> </ul> </div> </div> <div id="tabs-3"> <div class="tabInnerShell"> <ul class='equipmentList minorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300139'>Constant Temperature bath (-20掳C to 100掳C)</a></h4><div class='shortDescription'></div> <li><h4><a href='/cfn/equipment/details.php?q=300142'>Dektak 150 Stylus Profilometer</a></h4><div class='shortDescription'><p><strong>Dektak 150 Stylus Profilometer:</strong></p><p style="">Single scan contact profilometer with a scan length range 50 um to 55 mm and a sub 1 nm specified vertical resolution.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300096'>L-EDIT (CAD)</a></h4><div class='shortDescription'></div> <li><h4><a href='/cfn/equipment/details.php?q=300074'>Layout Beamer (pattern fracture & proximity effect correction)</a></h4><div class='shortDescription'></div> <li><h4><a href='/cfn/equipment/details.php?q=300072'>Liquid CO2 Critical Point Dryer (Autosamdri-815B)</a></h4><div class='shortDescription'><strong>CPD:</strong></div> </ul><ul class='equipmentList minorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300069'>Plasma Asher</a></h4><div class='shortDescription'><strong>Plasma Asher</strong></div> <li><h4><a href='/cfn/equipment/details.php?q=300146'>Reflectometer</a></h4><div class='shortDescription'><p><strong>Filmetric F20:</strong></p><p>This tool (Filmetrics F20) is a spectro-reflectometer which measures the thickness and reflective index of thin film deposited on flat substrate. It can handle samples with multilayer thin film.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300064'>Sputter Coater</a></h4><div class='shortDescription'><p style=""><strong>PVD75 Coater:</strong></p><p style="">Three separate physical vapor deposition systems (all Kurt J. Lesker PVD75) are available for thin-film sputter, thermal, and electron-beam deposition of a wide variety of materials.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300066'>Thermal/E-beam evaporator for electrical contacts</a></h4><div class='shortDescription'><p style="text-align:left;"><strong>Contacts Evaporator:</strong></p><p style="">Three separate <span>physical vapor deposition systems</span> (all <em>Kurt J. Lesker PVD75</em><span>) </span>are available for thin-film sputter, thermal, and electron-beam deposition of a wide variety of materials.<strong> </strong></p></div> </ul> </div> </div> </div> </div>  </div> </div> <div id="topOfPage"><span class="fa fa-chevron-circle-up fa-lg topOfPageTrigger"></span></div> <div class="footer" id="footer" > <div class="container_24"> <div class="grid_6"> <h3 id="BNL">Brookhaven National Laboratory</h3> <p>PO Box 5000<br/> Upton, NY 11973-5000<br/> (631) 344-8000</p> <p><a id="contactUs" class="extrasmall white button" href="https://www.bnl.gov/contact-us/">Contact us</a></p> <ul class="socialMediaIcons"> <li><a target="_blank" href="https://twitter.com/BrookhavenLab" title="Follow Us on 𝕏"><i class="fa-brands fa-square-x-twitter fa-2x"></i></a> <li><a target="_blank" href="https://www.facebook.com/brookhavenlab" title="Follow Us on Facebook"><span class="fa fa-facebook-square fa-2x"></span></a> <li><a target="_blank" href="https://www.instagram.com/brookhavenlab/" title="Follow Us on Instagram"><span class="fa fa-instagram fa-2x"></span></a> <li><a target="_blank" href="https://www.linkedin.com/company/brookhavenlab/" title="Follow Us on LinkedIn"><span class="fa fa-linkedin-square fa-2x"></span></a> <li><a target="_blank" href="https://www.youtube.com/BrookhavenLab" title="Follow Us on YouTube"><span class="fa fa-youtube-square fa-2x"></span></a> <li><a target="_blank" href="http://www.flickr.com/brookhavenlab/" title="Follow Us on Flickr"><span class="fa fa-flickr fa-2x"></span></a> </ul> </div> <div class="grid_3"> <ul class="linkList2"> <li><a href="https://www.bnl.gov/science/">Our Science</a></li> <li><a href="https://www.bnl.gov/about/">About</a></li> <li><a href="https://www.bnl.gov/about/history/">History</a></li> <li><a href="https://www.bnl.gov/about/org/">Leadership</a></li> <li><a href="https://www.bnl.gov/visiting/">Visiting the Lab</a></li> <li><a href="https://www.bnl.gov/siteindex/">Site Index</a></li> <li><a href="https://www.bnl.gov/directory/">Staff Directory</a></li> </ul> </div> <div class="grid_3"> <ul class="linkList2"> <li><a target="_blank" href="https://jobs.bnl.gov/">Careers</a></li> <li><a href="https://www.bnl.gov/science/facilities.php">Facilities</a></li> <li><a href="https://www.bnl.gov/guv/">Guest Center</a></li> <li><a href="https://www.bnl.gov/partner/">Partnerships</a></li> <li><a href="https://www.bnl.gov/ppm/">For Vendors</a></li> <li><a id="deptLink" href="javascript:void(0);">Departments</a></li> <li><a href="https://www.bnl.gov/visiting/events/">Public Events</a></li> </ul> </div> <div class="grid_4"> <ul class="linkList2 lastList"> <li><a href="https://www.bnl.gov/diversity/">Diversity, Equity & Inclusion</a></li> <li><a href="https://www.bnl.gov/techtransfer/">Technology Licensing</a></li> <li><a href="https://www.bnl.gov/externalaffairs/">Stakeholder Relations</a></li> <li><a href="https://www.bnl.gov/education/">Students & Educators</a></li> <li><a href="https://www.bnl.gov/about/sustainability/">Sustainability</a></li> <li><a href="https://www.bnl.gov/privacy/">Privacy and Security Notice</a></li> <li><a target="_blank" href="https://doe.responsibledisclosure.com/hc/en-us">Vulnerability Disclosure Program</a></li> </ul> </div> <div class="grid_7 prefix_1"> <h3 id="BSA">Brookhaven Science Associates</h3> <p>Brookhaven Science Associates manages and operates Brookhaven National Laboratory on behalf of the U.S. Department of Energy's Office of Science. 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