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Science" href="http://science.energy.gov/"> <img class="DOElogo black" title="DOE Office of Science" src="/assets/global/images/logo-doe-black-200px.png" /> <img class="DOElogo white" title="DOE Office of Science" src="/assets/global/images/logo-doe-white-500px.png" /> </a> </div> </div> </div> </div> <div class="container_24" id="siteMenuContainer"> <div class="grid_24"> <ul id="siteMenu"> <li><a href="https://www.bnl.gov/cfn/">Home</a> <li> <a href="javascript:void(0);">Facilities</a> <ul> <li><a href="https://www.bnl.gov/cfn/facilities/optics.php">Advanced Optical Spectroscopy and Microscopy</a> <li><a href="https://www.bnl.gov/cfn/facilities/probes.php">Advanced UV and X-ray Probes</a> <li><a href="https://www.bnl.gov/cfn/facilities/microscopy.php">Electron Microscopy</a> <li><a href="https://www.bnl.gov/cfn/facilities/materialssynthesis.php">Materials Synthesis and Characterization</a> <li><a href="https://www.bnl.gov/cfn/facilities/nanofabrication.php">Nanofabrication</a> <li><a 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href="https://jobs.bnl.gov/search-jobs/cfn?orgIds=3437&kt=1">Jobs</a> <li><a href="https://www.bnl.gov/cfn/contact.php">Contact</a> <li><a href="https://www.bnl.gov/cfn/business/">Business</a> <li class="orange-menu-item"> <a href="javascript:void(0);">Becoming a User</a> <ul> <li><a href="https://www.bnl.gov/cfn/user/">User Program Overview</a> <li><a href="https://www.bnl.gov/cfn/user/proposal-review.php">Proposal Review Process</a> <li><a target="_blank" href="https://cpp.bnl.gov/">User Proposal System</a> <li><a href="https://www.bnl.gov/cfn/user/agreements.php">User Agreements</a> <li><a target="_blank" href="https://nsrcportal.sandia.gov/">Other Nanoscale Science Research Centers</a> </ul> <li><a href="https://brookhavenlab.sharepoint.com/sites/CFNIntranet" target="_blank">Intranet <i class="fas fa-lock"></i></a> </ul> </div> </div>  <div id="subStripe"> <div class="container_24"> <div class="grid_24"> <h1>Equipment Catalog</h1> </div> </div> </div> <div class="container_24"> <div class="grid_16"> <div id="tabs"> <ul> <li><a href="#tabs-1">By Facility</a></li> <li><a href="#tabs-2">By Category</a></li> <li><a href="#tabs-3">By Capability</a></li> </ul> <div id="tabs-1"> <div class="tabInnerShell"> <div id='accordion-facility' class='accordion'> <h3>Advanced Optical Spectroscopy and Microscopy</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300116'>Femtosecond Transient Absorption Spectrometer</a></h4><div class='shortDescription'><p style=""><strong>Transient Absorption/Reflectivity Helios Fire:</strong></p><p style="">Helios Fire commercial pump-probe broadband absorption/reflectivity spectrometer capable to measure transient absorption spectra with 100 femtoseconds resolution in UV-VIS-NIR (320nm-1600nm) using a 1 KHz (3mJ) regenerative amplifier and two TOPAS OPAs (290-2600nm). </p><p><strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300160'>High-speed multiphoton laser scanning confocal imaging/hyperspectral imaging microscope</a></h4><div class='shortDescription'><p><strong>Confocal Leica TCS SP5:</strong></p><p>The Leica TCS SP5 commercial inverted laser-scanning confocal fluorescence microscope (video rate) used for fluorescence, transmission and reflectivity imaging (400-800nm range). <strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300117'>Nanosecond Transient Absorption Spectrometer</a></h4><div class='shortDescription'><p style=""><strong>Transient Absorption/Reflectivity EOS:</strong></p><p style="">Commercial EOS pump-probe broadband transient absorption/reflectivity spectrometer capable to measure time-resolved spectra with nanosecond resolution in VIS and NIR in combination with a 1 KHz regenerative amplifier, two TOPAS OPAs (290nm-2600nm) and a supercontinuum Leukos laser for probing. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300157'>Time and Spectrally Resolved Confocal Photoluminescence and Electroluminescence Microscope </a></h4><div class='shortDescription'><p><strong>Confocal Olympus IX81:</strong></p><p>Home built Olympus IX81 inverted confocal PL microscope for FLIM imaging and probing, with single molecule/nanostructure sensitivity.<strong> </strong></p></div> </ul> </div> <div class='majorMinorOuter minorOuter'> <h3 class='equipmentTypeHead'>Minor Equipment</h3> <ul class='equipmentList minorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300162'>Fluorimeter</a></h4><div class='shortDescription'><p><strong>Horiba Nanolog Fluorimeter:</strong></p><p>Commercial Horiba Nanolog Fluorimeter: cuvette and thin film, cryostat (LN<sub>2</sub>) for thin film samples. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300183'>Nikon Eclipse Ti2 Confocal Hyperspectral dark field/bright field/fluorescence imaging microscope</a></h4><div class='shortDescription'><p><strong>Nikon Eclipse Ti2 Hyperspectral Dark Field:</strong></p><p>This is an inverted microscope used for recording scattering and fluorescence spectra, spectroelectrochemistry attachment, bright field imaging, chirality and polarization modes. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300166'>Scanning Photocurrent Microscope (SPCM)</a></h4><div class='shortDescription'></div> <li><h4><a href='/cfn/equipment/details.php?q=300161'>Time Correlated Single Photon Counting Spectrometer</a></h4><div class='shortDescription'><p><strong>Picoquant FT200:</strong> </p><p>Commercial Fluorescence/Phosphorescence Lifetime Spectrometer for time-resolved fluorescence decays in the UV-VIS-NIR (460-800nm, 850-1450nm). available lasers are 442nm and 532nm pulsed. </p></div> </ul> </div> </div> <h3>Advanced UV and X-ray Probes</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300165'>Complex Materials Scattering SAXS/WAXS beamline at NSLS-II</a></h4><div class='shortDescription'><p style=""><strong>CMS:</strong></p><p style="">The CMS beamline, operated through a partnership between CFN and the <a href="https://www.bnl.gov/ps/"><span style="color:#0066cc;">National Synchrotron Light Source II</span></a> (NSLS-II), is dedicated to structural studies of complex materials, including nanomaterials, soft matter, and biomolecular assemblies.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300168'>Soft Matter Interfaces SAXS/WAXS beamline at NSLS-II</a></h4><div class='shortDescription'><p style="text-align:left;"><strong>SMI:</strong></p><p style="">The CFN is a partner user on the Soft Matter Interfaces (SMI) beamline at Brookhaven's new, world-class synchrotron: the <a href="https://www.bnl.gov/ps/"><span style="color:#0066cc;">National Synchrotron Light Source II</span></a> (NSLS-II). The SMI beamline provides world-leading capabilities to study the structure, energetics, and assembly of soft and hybrid materials, in particular focusing on the critical role of interfaces </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300164'>XPEEM/LEEM Spectro-Microscopy Endstation</a></h4><div class='shortDescription'><p style=""><strong>Beamline 21-ID at NSLS-II:</strong></p><p style=""><strong></strong>The CFN XPEEM/LEEM facility at the Electron Spectro-Microscopy (ESM, 21-ID-2) beamline at the <a href="https://www.bnl.gov/ps/">National Synchrotron Light Source II</a>  (NSLS-II) has capabilities for full-field imaging at nanometer scale, as well as the micro-spot spectroscopy, including  uXPS, uXAS and uARPES. The microscope is best suited for micro- spectroscopic investigation of conductive, crystalline surfaces with few nanometers spatial resolution.  </p><p style="">Beamline 21-ID webpage: <a href="https://www.bnl.gov/nsls2/beamlines/beamline.php?r=21-ID" target="_blank">https://www.bnl.gov/nsls2/beamlines/beamline.php?r=21-ID</a></p></div> </ul> </div> </div> <h3>Electron Microscopy</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300104'>Analytical Bio/Soft Matter Transmission Electron Microscope (TEM)</a></h4><div class='shortDescription'><p style=""><strong>JEOL 1400 TEM:</strong></p><p style="">The JEOL JEM-1400 LaB6 120 kV transmission electron microscope is an easy-to-use, high contrast instrument with excellent imaging (TEM and STEM modes) and analytical (energy dispersive spectroscopy detector) capabilities. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300101'>Environmental Transmission Electron Microscope (E-TEM)</a></h4><div class='shortDescription'><p><strong>Titan 80-300:</strong></p><p style="">The E-TEM instrument (FEI Titan 80-300) is an 80 – 300 kV field-emission transmission electron microscope with an objective-lens aberration corrector at spatial resolution of 0.08 nm.  The instrument has scanning transmission imaging, magnetic imaging, and chemical analysis capabilities.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300163'>FEI TALOS Operando S/TEM</a></h4><div class='shortDescription'><p><strong>FEI TALOS:</strong></p><p style="">The FEI Talos F200X is a high-resolution analytical scanning/transmission electron microscope (S/TEM) that is routinely operated at 200 keV. This microscope is equipped with an X-FEG electron source module that gives a source brightness four times that of a Schottky FEG emitter. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300102'>Scanning Transmission Electron Microscope (STEM)</a></h4><div class='shortDescription'><p><strong>Hitachi 2700C:</strong></p><p style="">This instrument is ideal for probing structural and electronic properties of materials at the Angstrom level, allowing on to study the physical, chemical and electronic structure of oxide interfaces, catalysts and other functional nanomaterials.  </p></div> </ul> </div> </div> <h3>Materials Synthesis and Characterization</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300304'>2D material exfoliation</a></h4><div class='shortDescription'><span style="color:#000000;text-transform:none;text-indent:0px;letter-spacing:normal;font-family:Verdana, Geneva, sans-serif;font-size:12px;font-style:normal;font-weight:400;word-spacing:0px;float:none;display:inline !important;white-space:normal;orphans:2;widows:2;font-variant-ligatures:normal;font-variant-caps:normal;-webkit-text-stroke-width:0px;text-decoration-style:initial;text-decoration-color:initial;">Customized capabilities for exfoliating 2D (atomically-thin) monolayers from parent van der Walls crystals.</span></div> <li><h4><a href='/cfn/equipment/details.php?q=300169'>3-Tesla Cryogenic Micromanipulated Probe Station</a></h4><div class='shortDescription'><p style=""><strong>3-Tesla Cryogenic Micromanipulated Probe Station:</strong></p><p style="">The Janis ST-3T-2 is a continuous flow, vertical field, superconducting magnet micromanipulated probe station.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300292'>AJA Evaporator</a></h4><div class='shortDescription'><p><strong>AJA Orion:</strong></p><p style="">The tool is a compact magnetron sputtering system designed for the sputtering deposition of metal and dielectric thin films. It is equipped with four RF sputtering sources and supports co-deposition of two materials at the same time.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300151'>Atomic Layer Deposition Tool (ALD) Savannah S100</a></h4><div class='shortDescription'><p><strong>Atomic Layer Deposition Tool:</strong></p><p>The tool (Cambridge Nanotech Savannah100) includes precursors for atomically precise growth of thin films of Al2O3, ZnO, TiO2, VOx, HfO2, and Pt, at growth temperatures as high as 300 °C. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300330'>Automated liquid handling workbench</a></h4><div class='shortDescription'><p><strong>Tecan Fluent 1080</strong></p><p>The automated liquid handling is an interconnected cluster of robotic instrumentation, driven by a customized Tecan Fluent 1080, with the goal of automated sample synthesis and characterization. The system consists of three arms, with disposable and fixed tip arms alongside a robotic gripper arm with three different finger options. All tips are capable of liquid level detection. The automated workbench is linked to a versatile robotic instrument cluster, including plate and tube-based centrifuges, column purification, gel electrophoresis, thermoshakers, vortexing, plate tilting, thermocyclers, plate heating/refrigeration, tube decappers, barcode readers, and a plate reader capable of UV/Vis and fluorescence measurements.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300293'>Electrospray Deposition</a></h4><div class='shortDescription'><p style=""><strong>Electrospray Deposition (ESD) System:</strong><span style="background:white;padding:0in;border:1pt windowtext;border-image:none;color:black;font-family:'Verdana',sans-serif;font-size:9pt;mso-fareast-font-family:'Times New Roman';mso-bidi-font-family:'Times New Roman';mso-border-alt:none windowtext 0in;"></span></p><p style="">This first-of-its kind instrument deposits soft and hybrid material thin films with programmable composition and/or thickness profiles by electrospraying from solution.  Up to three separate solutions can be sprayed simultaneously onto heated substrates to generate binary and ternary composition profiles.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300291'>Fiji Plasma Enhanced Atomic Layer Deposition System</a></h4><div class='shortDescription'><p style=""><strong>Veeco Fiji F200:</strong></p><p style="">The PEALD tool is capable to depositing uniform, conformal thin films of various metallic, metal oxide, and metal nitride. It supports both conventional thermal ALD and plasma enhanced ALD. It is equipped with a quartz crystal microbalance for in-situ monitoring of thin film growth rate and accumulated thickness and a mesh pocket holder for deposition on powdered samples.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300094'>Hall Effect Measurement System</a></h4><div class='shortDescription'><p><strong>Room-temperature Hall Effect Measurement System:</strong></p><p>This system is with available DC and AC measurement modes.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300106'>High Resolution Analytical Scanning Electron Microscope</a></h4><div class='shortDescription'><p style=""><strong>JEOL JSM-7600F</strong>:</p><p style="">The JEOL JSM-7600F is a state-of-the-art thermal FE-SEM combining high resolution imaging with optimized analytical functionality. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300091'>High Temp Electrical Probe Sta/Annealing oven MBE Komponenten A0500</a></h4><div class='shortDescription'><p style=""><strong>High-Temperature/Annealing Probe Station:</strong></p><p style="">This probe station can perform rapid thermal annealing (up to 500 °C) in vacuum (2 mbar) or in a gas mixture atmosphere.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300108'>In-situ electrical characterization</a></h4><div class='shortDescription'><p><strong></strong><strong>Helios Nanolab 600:</strong> </p><p style="">In-situ electrical characterization in SEM/FIB</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300127'>Miniflex X-Ray Diffractometer</a></h4><div class='shortDescription'><p><strong>Miniflex II:</strong></p><p>The Miniflex II is capable of characterizing thin films, bulk powders, and surfaces. <br /></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300320'>Motorized stacker for 2D heterostructures</a></h4><div class='shortDescription'><strong></strong>The stacker is a robotic motion system that precisely handles stamp-supported flakes and substrates for the stacking procedure to fabricate heterostructures.</div> <li><h4><a href='/cfn/equipment/details.php?q=300095'>Photovoltaic Dev Characterization Sys - customized electrical probe station w/150W solar simulator, calibrated Si solar cell std</a></h4><div class='shortDescription'><p style=""><strong>Solar Simulator:</strong></p><p>Photovoltaic and photoelectrochemical device measurement system.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300093'>Photovoltaic Extrnl Quantum Efficiency Measurement Sys w/300W xenon arc lamp, monochromator, Si diode power meter, & precision </a></h4><div class='shortDescription'><p><strong>PV EQE:</strong></p><p>External quantum efficiency measurement system.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300319'>Physical Property Measurement System (PPMS)</a></h4><div class='shortDescription'><p><strong>Dynacool 12T PPMS:</strong></p><p>The PPMS performs low voltage DC and low frequency AC (< 200 Hz) electrical measurements from 0.35 K to 400 K under 0-12 T magnetic field.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300148'>Physical Vapor Sputter/Thermal Evaporator</a></h4><div class='shortDescription'><p><strong>PVD:</strong></p><p style="">This thin film deposition system (Kurt J. Lesker PVD75) is used for the synthesis of inorganic thin films by thermal evaporation and DC magnetron sputtering.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300152'>Pulsed Laser Deposition System PLD/MBE 2300</a></h4><div class='shortDescription'><p><strong>PLD 2300:</strong></p><p style=""><span style="">The pulsed laser deposition system (PVD Products PLD-MBE 2300) is used for synthesis of complex metal oxides or nitride thin-films by laser ablation. </span></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300090'>Room Temperature Electrical Probe Station</a></h4><div class='shortDescription'><p style=""><strong>Room Temp Probe Station:</strong></p><p style="">The Signatone CM-170 has four high quality micromanipulated probes for DC and low-frequency electrical characterization.<strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300105'>Scanning Electron Microscope (SEM)</a></h4><div class='shortDescription'><p><strong>Hitachi SEM:</strong></p><p style="">This scanning electron microscope (Hitachi 4800 SEM) is a cold field emission instrument capable of 1.5 nm resolution at 15 kV and 2.5 nm resolution at 1 kV. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300130'>Small Angle X-Ray Scattering (SAXS/GISAXS/WAXS) with Cu rotating anode source</a></h4><div class='shortDescription'><p><strong>SaxsLabs SAXS:</strong></p><p style="">The SaxsLabs Small Angle X-ray Scattering instrument investigates the structure of materials from angstroms to ~200 nm length scales by providing SAXS/GISAXS and WAXS capabilities.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300317'>Thermal Atomic Layer Deposition (ALD)</a></h4><div class='shortDescription'><p style=""><strong>Thermal atomic layer deposition (ALD):</strong></p><p style="">System for ultrathin, conformal coatings of high-quality dielectric materials and electroactive metal oxides</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300153'>Variable Temperature Probe Station (70K-730K)</a></h4><div class='shortDescription'><p><strong>MMR:</strong></p><p>The MMR VTMP spans the temperature range from 70 to 730 Kelvin under controlled atmosphere and optical excitation.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300092'>Wedge Wire Bonder</a></h4><div class='shortDescription'><p style=""><strong>Wire Bonder:</strong></p><p style="">The wedge bonder Kulicke & Soffa 4526 has semi-automatic and manual operation modes, and also individual bond parameters.<strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300302'>Witec Optical and Raman Microscope</a></h4><div class='shortDescription'><span style="color:#000000;text-transform:none;text-indent:0px;letter-spacing:normal;font-family:Calibri, sans-serif;font-size:14.66px;font-style:normal;font-weight:400;word-spacing:0px;float:none;display:inline !important;white-space:normal;orphans:2;widows:2;font-variant-ligatures:normal;font-variant-caps:normal;-webkit-text-stroke-width:0px;text-decoration-style:initial;text-decoration-color:initial;">Detecting 2D material flakes automatically engaged with optical image, Raman and AFM</span></div> <li><h4><a href='/cfn/equipment/details.php?q=300128'>锘縎martLab Universal Diffractometer</a></h4><div class='shortDescription'><p><strong></strong><strong>SmartLab Universal Diffractometer:</strong></p><p>Rigaku SmartLab is a universal diffractometer capable of characterizing thin films, bulk powders, and surfaces.</p></div> </ul> </div> <div class='majorMinorOuter minorOuter'> <h3 class='equipmentTypeHead'>Minor Equipment</h3> <ul class='equipmentList minorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300325'>Automated Solvent Vapor Annealer (SVA)</a></h4><div class='shortDescription'>The solvent vapor annealer is an instrument design for controlled swelling of polymer and other soft matter thin films by solvent vapors (e.g., THF, acetone). Automated swelling profiles can be programmed based on feedback control of nitrogen purge gas or substrate temperature using customized software.</div> <li><h4><a href='/cfn/equipment/details.php?q=300154'>Battery Tester</a></h4><div class='shortDescription'><p><strong>Battery Tester:</strong></p><p style="">This is advanced testing equipment for research and development of energy storage or electrochemical devices, such as batteries, supercapacitors, and fuel cells. <strong></strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300132'>Biomolecular methods: cell culture, cold room, gel electrophoresis and DNA imaging</a></h4><div class='shortDescription'><p><strong>Bio Methods:</strong></p><p>Cell culture, cold room, gel electrophoresis and DNA imaging.</p><p><strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300136'>Centrifuges, shakers, mixers, sonicators</a></h4><div class='shortDescription'><p><strong>Centrifuges, shakers, mixers, sonicators:</strong></p><p>Available to provide fast separate substances and shaking or vortexing with tough metal housing at high speed, which is ideal for small volume liquid processing. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300123'>Circular Dichroism Spectrometer</a></h4><div class='shortDescription'><p><strong>Jasco J-815 Circular Dichroism (CD) Spectropolarimeter:</strong></p><p style="">Circular dichroism (CD) spectroscopy measures differences in the absorption of left-handed polarized light versus right-handed polarized light that arise due to structural asymmetry.<strong></strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300138'>Differential Scanning Calorimeter (DSC)</a></h4><div class='shortDescription'><p><strong>DSC:</strong></p><div><p style="">The Perkin-Elmer Pyris Diamond DSC is used to perform differential scanning calorimetry measurements under helium purging in the temperature range of -170 °C to 300 °C, or under nitrogen purging from room temperature to 55<span style="">0 °C.</span></p></div></div> <li><h4><a href='/cfn/equipment/details.php?q=300129'>Dynamic Light Scattering with Zeta Potential</a></h4><div class='shortDescription'><p style=""><strong>Malvern Zeta Sizer Nano Series:</strong></p><p style="">This instrument (Malvern Zetasizer Nano ZS and Zeta Potential) measures the size (0.6 nm to 6000 nm) and zeta potential of dispersed particles in solution using a 633 nm He-Ne laser.<strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300141'>Electrochemical workstation</a></h4><div class='shortDescription'>Solartron Analytical Apps-XM series potentiostat.</div> <li><h4><a href='/cfn/equipment/details.php?q=300294'>Environmental Atomic Force Microscope, Video-Rate Capability</a></h4><div class='shortDescription'><p><strong>Asylum Cypher AFM ES VRS:</strong></p><p>Atomic force microscope with environmental control and video-rate capabilities.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300089'>Epifluorescent and Polarized Imaging Microscope</a></h4><div class='shortDescription'><p><strong>Olympus Polarized Microscope:</strong></p><p>Upright microscope for routine epifluorescent, polarized and bright field or dark field imaging. </p> </div> <li><h4><a href='/cfn/equipment/details.php?q=300121'>FTIR Spectrometer</a></h4><div class='shortDescription'><p><strong>Nicolet 6700 FT-IR Spectrometer:</strong></p><p>Fourier Transform Infrared (FT-IR) Spectrometer. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300318'>Flow Coater</a></h4><div class='shortDescription'><p><strong>CFN Manufactured Flow Coater:</strong></p><p>The flow coater is a compact apparatus for casting uniform films of nanoparticles, molecules, or polymers from solution with user-designed film thickness increments or gradients.  </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300100'>Hybrid Rheometer</a></h4><div class='shortDescription'><p><strong>Discovery HR-3 Rheometer:</strong></p><p style="">The instrument is designed to measure mechanical/rheological properties of soft materials, including gels, liquids, and assemblies of macromolecules or nanoparticles at air-liquid interfaces.<strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300329'>Imaging Microplate Multimode Reader</a></h4><div class='shortDescription'><p><strong>BioTek Cytation 5 Imaging Multimode Reader</strong></p><p>The BioTek Cytation 5 Imaging Multimode Reader combines automated digital widefield microscopy with conventional multimode microplate reading. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300133'>LightCycler 480 instrument</a></h4><div class='shortDescription'><p style=""><strong>Real-Time PCR:</strong></p><p style="">The LightCycler<sup><span style="font-size:x-small;">®</span></sup> 480 system enables you to perform real-time, online PCR combined with rapid cycling of up to 96 or 384 samples.<strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300137'>Particle Sizing and Tracking</a></h4><div class='shortDescription'><p><strong>Nanosight:</strong></p><p>The instrument provides characterization of nanoparticle sizes and diffusion in liquids.<strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300122'>Photon Counting Spectrofluorometer</a></h4><div class='shortDescription'><p style=""><strong>ISS PC1 Fluorometer:</strong></p><p style="">This fluorometer (ISS PC1 Multifrequency Cross-Correlation Phase and Modulation Fluorometer) is capable of steady state and lifetime measurements (from 1 millisecond to 1 picosecond).<strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300147'>Reactive Ion Etcher (RIE)</a></h4><div class='shortDescription'><p style=""><strong>March RIE:</strong></p><p style="">This tool (March Plasma CS1701F) is used for radio frequency (RF) plasma etching of organic and inorganic thin films using combinations of six process gases (SF<sub>6</sub>, CF<sub>4</sub>, CHF<sub>3</sub>, O<sub>2</sub>, Ar, and CF<sub>3</sub>Br).<strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300143'>Spectroscopic Ellipsometer</a></h4><div class='shortDescription'><p style=""><strong>Woollam M2000:</strong></p><p style="">This ellipsometer (J.A. Woollam M-2000 Spectroscopic Ellipsometer) allows analysis and mapping of thin films and interfaces, with temperature control in air and liquids. <strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300150'>Spin Coater</a></h4><div class='shortDescription'><p><strong>Laurell WS-650-23 Spin Coater:</strong><strong></strong></p><p>This tool is used for forming organic thin films from solution. System includes a spin coater with variable spin speed/acceleration (between ~500-6000 RPM). It is located in the 6 foot wide hood (1L-10-1) (with HEPA filtration on the hood exhaust), suitable for nanomaterial processing.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300149'>Sputter/Coater</a></h4><div class='shortDescription'><p style=""><strong>Cressington 208HR Coater:</strong></p><p style="">This benchtop DC sputter coater deposits thin noble metal films (Au, AuPd, or Pt) by DC sputtering. It is typically used for preparing samples for scanning electron microscopy.<strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300140'>Thermo Gravimetric/Differential Thermal Analyzer (TGA/DTA)</a></h4><div class='shortDescription'><p style=""><strong>TGA/DTA:</strong></p><p style="">The Perkin-Elmer Pyris Diamond TGA/DTA is used to perform thermogravimetric and differential thermal analytic measurements.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300125'>Uv-Vis Spectrophotometer</a></h4><div class='shortDescription'><p><strong>PerkinElmer UV-Vis Lambda 25: </strong></p><p><strong></strong>UV/Vis Spectrophotometer</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300124'>Uv-Vis/NIR Spectrophotometer with 60mm integrating sphere</a></h4><div class='shortDescription'><p><strong>PerkinElmer Lambda 950:</strong></p><p style="">In addition to liquid sample measurements, the instrument is equipped for studies of films and powders in specular and diffuse scattering regimes. <strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300131'>Wet chemistry synthesis/functionalization of nano-scale and organic materials</a></h4><div class='shortDescription'><p><strong>Wet Chemistry:</strong></p><p>Capabilities required for the synthesis, fabrication and study of novel hybrid structures and functionalities.</p><p> </p></div> </ul> </div> </div> <h3>Nanofabrication</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300167'>3-D Laser Lithography System (Photonic Professional GT)</a></h4><div class='shortDescription'><p><strong>3-D Litho:</strong></p><p style="">This tool (Nanoscribe Photonic Professional GT) is an automatic 3-D nanolithography system/3-D printer capable of creating polymer patterns/models down to sub-200 nm resolution using two-photon polymerization technique.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300068'>Deep Reactive Ion Etcher, available w/Bosch process (DRIE)</a></h4><div class='shortDescription'><p><strong>Silicon DRIE:</strong></p><p style="">This system has demonstrated capability to etch vertical walls in silicon to a depth of 300 µm at etch rates of 3 µm / min with an aspect ratio (width of feature to etch depth) of 1:50. It has a laser interferometer endpoint detector (shared with the other Oxford ICP RIE tool) to help achieving an accurate etching depth. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300076'>Dual Beam Scanning Electron/Focused Ion Beam Microscope</a></h4><div class='shortDescription'><p><strong>Dual Beam:</strong></p><p style="">Dual Beam Scanning Electron/Focused Ion Beam Microscope (FEI Helios), capable of simultaneous focused ion beam milling and SEM imaging.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300063'>Electron Beam Deposition System</a></h4><div class='shortDescription'><p style=""><strong>Ebeam Deposit:</strong></p><p style="">Three separate physical vapor deposition systems (all Kurt J. Lesker PVD75) are available for thin-film sputter, thermal, and electron-beam deposition of a wide variety of materials. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300323'>Electron Beam Induced Current (EBIC) Imaging-Helios G5</a></h4><div class='shortDescription'><strong>Electron Beam Induced Current (EBIC) Imaging:</strong><br /><br />EBIC is an analysis technique in the SEM, which creates images using the electrical response of the sample as a function of the scanning position of the electron beam. </div> <li><h4><a href='/cfn/equipment/details.php?q=300073'>Electron Beam Lithography Tool (EBL)</a></h4><div class='shortDescription'><p style=""><strong>Ebeam Litho</strong><strong>:</strong></p><p style="">The JEOL JBX-6300FS is a state-of-the-art 100kV EBL tool providing high-speed patterning capabilities with feature sizes as small as 8 nm over mm-scale areas.<strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300070'>General purpose Reactive Ion Etcher</a></h4><div class='shortDescription'><p style=""><strong>Trion RIE:</strong></p><p style="">The general purpose plasma etch tool (Trion Phantom III) is used for etching thin films generally 1 µm or less in thickness.<strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300315'>Helios G5 Dual Beam SEM/FIB Microscope</a></h4><div class='shortDescription'><p><strong>Helios G5 Dual Beam SEM/FIB Microscope:</strong></p><p>Excellent electron and FIB imaging resolution (including at FIB energies below 2 keV). It possesses an array of imaging, analysis, device fabrication, electrical characterization, and TEM sample preparation capabilities.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300324'>In-Situ Electrical Characterization-Helios G5</a></h4><div class='shortDescription'>The Helios G5 has two ways to perform in-situ electrical characterization. One is to use the 7-pin SMA electrical feedthrough, which requires fixed wiring of the electrodes to the sample or device. The other is to perform two-terminal electrical probing (no need for fixed wiring) using two Kleindiek Nanotechnik robotic manipulators (fA-range current measurement resolution and nanometer scale positioning resolution). </div> <li><h4><a href='/cfn/equipment/details.php?q=300071'>Oxford Chlorine Etcher C (RIE-C)</a></h4><div class='shortDescription'><p style=""><strong>Oxford Metal Etcher:</strong></p><p style="">This ICP Reactive Ion Etching system (Oxford Instruments Plasmalab 100) has an inductively coupled plasma source for high-speed, anisotropic plasma etching.<strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300065'>Plasma Enhanced Chemical Vapor Deposition (PECVD) System</a></h4><div class='shortDescription'><p style=""><strong>Trion PECVD:</strong></p><p style="">This deposition system (Trion Orion III) provides plasma-enhanced chemical vapor deposition of thin films. Current capabilities include precursor gases for deposition of SiO2, Si3N4, and amorphous silicon films. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300097'>UV Mask Aligner</a></h4><div class='shortDescription'><p><strong>UV Mask Align:</strong></p><p style="">The system (Karl Suss MA-6 UV Mask Aligner) is capable of exposing photoresist patterns down to 1 micron resolution with UV light at two wavelengths (405 nm and 240m nm).</p></div> </ul> </div> <div class='majorMinorOuter minorOuter'> <h3 class='equipmentTypeHead'>Minor Equipment</h3> <ul class='equipmentList minorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300139'>Constant Temperature bath (-20掳C to 100掳C)</a></h4><div class='shortDescription'></div> <li><h4><a href='/cfn/equipment/details.php?q=300142'>Dektak 150 Stylus Profilometer</a></h4><div class='shortDescription'><p><strong>Dektak 150 Stylus Profilometer:</strong></p><p style="">Single scan contact profilometer with a scan length range 50 um to 55 mm and a sub 1 nm specified vertical resolution.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300096'>L-EDIT (CAD)</a></h4><div class='shortDescription'></div> <li><h4><a href='/cfn/equipment/details.php?q=300074'>Layout Beamer (pattern fracture & proximity effect correction)</a></h4><div class='shortDescription'></div> <li><h4><a href='/cfn/equipment/details.php?q=300072'>Liquid CO2 Critical Point Dryer (Autosamdri-815B)</a></h4><div class='shortDescription'><strong>CPD:</strong></div> <li><h4><a href='/cfn/equipment/details.php?q=300069'>Plasma Asher</a></h4><div class='shortDescription'><strong>Plasma Asher</strong></div> <li><h4><a href='/cfn/equipment/details.php?q=300146'>Reflectometer</a></h4><div class='shortDescription'><p><strong>Filmetric F20:</strong></p><p>This tool (Filmetrics F20) is a spectro-reflectometer which measures the thickness and reflective index of thin film deposited on flat substrate. It can handle samples with multilayer thin film.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300064'>Sputter Coater</a></h4><div class='shortDescription'><p style=""><strong>PVD75 Coater:</strong></p><p style="">Three separate physical vapor deposition systems (all Kurt J. Lesker PVD75) are available for thin-film sputter, thermal, and electron-beam deposition of a wide variety of materials.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300066'>Thermal/E-beam evaporator for electrical contacts</a></h4><div class='shortDescription'><p style="text-align:left;"><strong>Contacts Evaporator:</strong></p><p style="">Three separate <span>physical vapor deposition systems</span> (all <em>Kurt J. Lesker PVD75</em><span>) </span>are available for thin-film sputter, thermal, and electron-beam deposition of a wide variety of materials.<strong> </strong></p></div> </ul> </div> </div> <h3>Proximal Probes</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300170'>Ambient Pressure PES and IRRAS</a></h4><div class='shortDescription'><p style="">This instrument allows for surface chemical analysis via X-ray Photoelectron Spectroscopy (XPS) and Infrared Reflection Absorption Spectroscopy (IRRAS) at gas pressures up to ~ 2 mbar and variable temperatures.  Applications include in situ studies of surface chemistry, catalysis, separation, and energy storage processes, among others.<br /></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300084'>Low Energy Electron Microscope V (LEEM)</a></h4><div class='shortDescription'><p style=""><strong>LEEM V:</strong></p><p style="">A field-emission low-energy electron microscope (Elmitec LEEM V) allows for in-situ microscopic studies of dynamic surface processes.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300085'>Low-Temperature UHV Scanning Tunneling/Force Microscope</a></h4><div class='shortDescription'><p style=""><strong>Createc LT-STM/AFM:</strong></p><p style="">A upgraded Createc low-temperature UHV scanning tunneling microscope (STM) with atomic force microscope (NC-AFM/HR-AFM operation modes. Default operation at 5K STM and sample temperature. Using Q-Plus sensor (30kHz) with FIB shaped 25um PtIr tip wire. Full time support by CFN staff knowledgeable in various preparation methods for molecule structure imaging and beyond.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300184'>NanoIR/s-SNOM</a></h4><div class='shortDescription'><p style=""><strong>NanoIR/s-SNOM:</strong></p><p style="">The NanoIR instrument is capable of performing both scattering-type scanning near-field optical microscopy (s-SNOM) and photothermal infrared spectromicroscopy (PTIR) with a spatial resolution of 10nm in tapping mode and 50nm in contact mode. <span style="font-family:'Calibri',sans-serif;font-size:11pt;mso-fareast-font-family:Calibri;mso-fareast-theme-font:minor-latin;mso-ansi-language:EN-US;mso-fareast-language:EN-US;mso-bidi-language:AR-SA;"></span></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300088'>Reactor Scanning Tunneling Microscope (STM)</a></h4><div class='shortDescription'><p style=""><strong>Reactor STM:</strong></p><p style=""></p><p>The reactor-Scanning Tunneling Microscopy (r-STM) allows STM measurements of a surface from UHV to 3 atm. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300107'>Scanning Electron Microscope/Scanning Auger Microscopy/4-point Transport Measurement of Nanostructures</a></h4><div class='shortDescription'><p style=""><strong>Nanoprobe:</strong></p><p style="">This Nanoprobe system is capable of performing scanning electron microscopy (SEM), scanning Auger microscopy (nanoSAM), 4-point probe measurements, and low energy electron diffraction (LEED).</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300087'>UHV Multiprobe Surface Analysis System - STM/XPS/UPS/ISS/LEED/TPD</a></h4><div class='shortDescription'><p style=""><br /></p><p style="margin-bottom:12.0pt;line-height:normal;"><strong><span style="font-family:Roboto;color:#333333;border:none windowtext 1.0pt;padding:0in;background:white;">Multiprobe</span></strong></p><p style="margin-bottom:0in;line-height:normal;"><span style="font-family:Roboto;color:#333333;border:none windowtext 1.0pt;padding:0in;background:white;">UHV-MultiProbe Surface Analysis System (STM\XPS\UPS\ISS\LEED\TPD)</span><span style="font-family:Roboto;color:#333333;background:white;"> is </span><span style="font-family:Roboto;color:black;">capable of in-situ clean sample preparations, nanostructure fabrications, and complementary surface characterizations including atomic-resolution surface structures, chemical compositions/states, relative atomic concentrations, and physical and chemical properties, aimed at exploring structure-properties relationships.</span></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300321'>mIRage O-PTIR + Raman</a></h4><div class='shortDescription'>The mIRage optical-photothermal infrared (O-PTIR) plus Raman instrument provides sub-500nm spatially resolved infrared and Raman spectra on the same spot at the same time with the same spatial resolution.</div> </ul> </div> <div class='majorMinorOuter minorOuter'> <h3 class='equipmentTypeHead'>Minor Equipment</h3> <ul class='equipmentList minorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300120'>Bruker Vertex 80v Spectrometer w/UHV IRRAS and Powder Transmission Capabilities</a></h4><div class='shortDescription'><p style=""><strong>Bruker FTIR: </strong></p><p>For transmission and reflectance IR measurements from UHV to atmospheric pressure.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300156'>Park NX-20 Atomic Force Microscope</a></h4><div class='shortDescription'><p><strong>AFM:</strong></p><p style="margin-bottom:12.0pt;line-height:normal;"><span style="font-family:Roboto;color:black;">The Park NX-20 atomic force microscope is capable of surface imaging at ambient conditions at room temperature, as well as at elevated temperatures. </span></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300083'>WiTec Alpha Combination Microscope</a></h4><div class='shortDescription'><p style=""><strong>Raman:</strong></p><p style="margin-bottom:12.0pt;line-height:normal;"><span style="font-family:Roboto;color:black;">WiTec Alpha 300 combination microscope integrates confocal Raman microscopy, atomic force microscope, scanning near-field optical microscope, confocal microscope within the same field of view. </span></p></div> </ul> </div> </div> <h3>Theory and Computation</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300098'>Software and Computational Services</a></h4><div class='shortDescription'><p style=""><strong>Computer clusters, software and data storage:</strong></p><p style="">We have diverse software tools that include deep learning frameworks, density functional theory packages for solids, surface and quantum chemistry, molecular-dynamics packages, and specialized tools for electronic excitations and optical properties.<strong> </strong></p></div> </ul> </div> </div> </div> </div> </div> <div id="tabs-2"> <div class="tabInnerShell"> <div id='accordion-category' class='accordion'> <h3>Advanced Spectro-Microscopy</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300164'>XPEEM/LEEM Spectro-Microscopy Endstation</a></h4><div class='shortDescription'><p style=""><strong>Beamline 21-ID at NSLS-II:</strong></p><p style=""><strong></strong>The CFN XPEEM/LEEM facility at the Electron Spectro-Microscopy (ESM, 21-ID-2) beamline at the <a href="https://www.bnl.gov/ps/">National Synchrotron Light Source II</a>  (NSLS-II) has capabilities for full-field imaging at nanometer scale, as well as the micro-spot spectroscopy, including  uXPS, uXAS and uARPES. The microscope is best suited for micro- spectroscopic investigation of conductive, crystalline surfaces with few nanometers spatial resolution.  </p><p style="">Beamline 21-ID webpage: <a href="https://www.bnl.gov/nsls2/beamlines/beamline.php?r=21-ID" target="_blank">https://www.bnl.gov/nsls2/beamlines/beamline.php?r=21-ID</a></p></div> </ul> </div> </div> <h3>Deposition (Evaporators/Sputterers/Pecvd/Coaters)</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300292'>AJA Evaporator</a></h4><div class='shortDescription'><p><strong>AJA Orion:</strong></p><p style="">The tool is a compact magnetron sputtering system designed for the sputtering deposition of metal and dielectric thin films. It is equipped with four RF sputtering sources and supports co-deposition of two materials at the same time.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300151'>Atomic Layer Deposition Tool (ALD) Savannah S100</a></h4><div class='shortDescription'><p><strong>Atomic Layer Deposition Tool:</strong></p><p>The tool (Cambridge Nanotech Savannah100) includes precursors for atomically precise growth of thin films of Al2O3, ZnO, TiO2, VOx, HfO2, and Pt, at growth temperatures as high as 300 °C. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300063'>Electron Beam Deposition System</a></h4><div class='shortDescription'><p style=""><strong>Ebeam Deposit:</strong></p><p style="">Three separate physical vapor deposition systems (all Kurt J. Lesker PVD75) are available for thin-film sputter, thermal, and electron-beam deposition of a wide variety of materials. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300293'>Electrospray Deposition</a></h4><div class='shortDescription'><p style=""><strong>Electrospray Deposition (ESD) System:</strong><span style="background:white;padding:0in;border:1pt windowtext;border-image:none;color:black;font-family:'Verdana',sans-serif;font-size:9pt;mso-fareast-font-family:'Times New Roman';mso-bidi-font-family:'Times New Roman';mso-border-alt:none windowtext 0in;"></span></p><p style="">This first-of-its kind instrument deposits soft and hybrid material thin films with programmable composition and/or thickness profiles by electrospraying from solution.  Up to three separate solutions can be sprayed simultaneously onto heated substrates to generate binary and ternary composition profiles.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300291'>Fiji Plasma Enhanced Atomic Layer Deposition System</a></h4><div class='shortDescription'><p style=""><strong>Veeco Fiji F200:</strong></p><p style="">The PEALD tool is capable to depositing uniform, conformal thin films of various metallic, metal oxide, and metal nitride. It supports both conventional thermal ALD and plasma enhanced ALD. It is equipped with a quartz crystal microbalance for in-situ monitoring of thin film growth rate and accumulated thickness and a mesh pocket holder for deposition on powdered samples.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300148'>Physical Vapor Sputter/Thermal Evaporator</a></h4><div class='shortDescription'><p><strong>PVD:</strong></p><p style="">This thin film deposition system (Kurt J. Lesker PVD75) is used for the synthesis of inorganic thin films by thermal evaporation and DC magnetron sputtering.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300065'>Plasma Enhanced Chemical Vapor Deposition (PECVD) System</a></h4><div class='shortDescription'><p style=""><strong>Trion PECVD:</strong></p><p style="">This deposition system (Trion Orion III) provides plasma-enhanced chemical vapor deposition of thin films. Current capabilities include precursor gases for deposition of SiO2, Si3N4, and amorphous silicon films. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300152'>Pulsed Laser Deposition System PLD/MBE 2300</a></h4><div class='shortDescription'><p><strong>PLD 2300:</strong></p><p style=""><span style="">The pulsed laser deposition system (PVD Products PLD-MBE 2300) is used for synthesis of complex metal oxides or nitride thin-films by laser ablation. </span></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300317'>Thermal Atomic Layer Deposition (ALD)</a></h4><div class='shortDescription'><p style=""><strong>Thermal atomic layer deposition (ALD):</strong></p><p style="">System for ultrathin, conformal coatings of high-quality dielectric materials and electroactive metal oxides</p></div> </ul> </div> <div class='majorMinorOuter minorOuter'> <h3 class='equipmentTypeHead'>Minor Equipment</h3> <ul class='equipmentList minorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300318'>Flow Coater</a></h4><div class='shortDescription'><p><strong>CFN Manufactured Flow Coater:</strong></p><p>The flow coater is a compact apparatus for casting uniform films of nanoparticles, molecules, or polymers from solution with user-designed film thickness increments or gradients.  </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300150'>Spin Coater</a></h4><div class='shortDescription'><p><strong>Laurell WS-650-23 Spin Coater:</strong><strong></strong></p><p>This tool is used for forming organic thin films from solution. System includes a spin coater with variable spin speed/acceleration (between ~500-6000 RPM). It is located in the 6 foot wide hood (1L-10-1) (with HEPA filtration on the hood exhaust), suitable for nanomaterial processing.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300064'>Sputter Coater</a></h4><div class='shortDescription'><p style=""><strong>PVD75 Coater:</strong></p><p style="">Three separate physical vapor deposition systems (all Kurt J. Lesker PVD75) are available for thin-film sputter, thermal, and electron-beam deposition of a wide variety of materials.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300149'>Sputter/Coater</a></h4><div class='shortDescription'><p style=""><strong>Cressington 208HR Coater:</strong></p><p style="">This benchtop DC sputter coater deposits thin noble metal films (Au, AuPd, or Pt) by DC sputtering. It is typically used for preparing samples for scanning electron microscopy.<strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300066'>Thermal/E-beam evaporator for electrical contacts</a></h4><div class='shortDescription'><p style="text-align:left;"><strong>Contacts Evaporator:</strong></p><p style="">Three separate <span>physical vapor deposition systems</span> (all <em>Kurt J. Lesker PVD75</em><span>) </span>are available for thin-film sputter, thermal, and electron-beam deposition of a wide variety of materials.<strong> </strong></p></div> </ul> </div> </div> <h3>Electrical Probing</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300169'>3-Tesla Cryogenic Micromanipulated Probe Station</a></h4><div class='shortDescription'><p style=""><strong>3-Tesla Cryogenic Micromanipulated Probe Station:</strong></p><p style="">The Janis ST-3T-2 is a continuous flow, vertical field, superconducting magnet micromanipulated probe station.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300094'>Hall Effect Measurement System</a></h4><div class='shortDescription'><p><strong>Room-temperature Hall Effect Measurement System:</strong></p><p>This system is with available DC and AC measurement modes.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300091'>High Temp Electrical Probe Sta/Annealing oven MBE Komponenten A0500</a></h4><div class='shortDescription'><p style=""><strong>High-Temperature/Annealing Probe Station:</strong></p><p style="">This probe station can perform rapid thermal annealing (up to 500 °C) in vacuum (2 mbar) or in a gas mixture atmosphere.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300324'>In-Situ Electrical Characterization-Helios G5</a></h4><div class='shortDescription'>The Helios G5 has two ways to perform in-situ electrical characterization. One is to use the 7-pin SMA electrical feedthrough, which requires fixed wiring of the electrodes to the sample or device. The other is to perform two-terminal electrical probing (no need for fixed wiring) using two Kleindiek Nanotechnik robotic manipulators (fA-range current measurement resolution and nanometer scale positioning resolution). </div> <li><h4><a href='/cfn/equipment/details.php?q=300108'>In-situ electrical characterization</a></h4><div class='shortDescription'><p><strong></strong><strong>Helios Nanolab 600:</strong> </p><p style="">In-situ electrical characterization in SEM/FIB</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300095'>Photovoltaic Dev Characterization Sys - customized electrical probe station w/150W solar simulator, calibrated Si solar cell std</a></h4><div class='shortDescription'><p style=""><strong>Solar Simulator:</strong></p><p>Photovoltaic and photoelectrochemical device measurement system.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300093'>Photovoltaic Extrnl Quantum Efficiency Measurement Sys w/300W xenon arc lamp, monochromator, Si diode power meter, & precision </a></h4><div class='shortDescription'><p><strong>PV EQE:</strong></p><p>External quantum efficiency measurement system.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300319'>Physical Property Measurement System (PPMS)</a></h4><div class='shortDescription'><p><strong>Dynacool 12T PPMS:</strong></p><p>The PPMS performs low voltage DC and low frequency AC (< 200 Hz) electrical measurements from 0.35 K to 400 K under 0-12 T magnetic field.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300090'>Room Temperature Electrical Probe Station</a></h4><div class='shortDescription'><p style=""><strong>Room Temp Probe Station:</strong></p><p style="">The Signatone CM-170 has four high quality micromanipulated probes for DC and low-frequency electrical characterization.<strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300153'>Variable Temperature Probe Station (70K-730K)</a></h4><div class='shortDescription'><p><strong>MMR:</strong></p><p>The MMR VTMP spans the temperature range from 70 to 730 Kelvin under controlled atmosphere and optical excitation.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300092'>Wedge Wire Bonder</a></h4><div class='shortDescription'><p style=""><strong>Wire Bonder:</strong></p><p style="">The wedge bonder Kulicke & Soffa 4526 has semi-automatic and manual operation modes, and also individual bond parameters.<strong> </strong></p></div> </ul> </div> <div class='majorMinorOuter minorOuter'> <h3 class='equipmentTypeHead'>Minor Equipment</h3> <ul class='equipmentList minorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300154'>Battery Tester</a></h4><div class='shortDescription'><p><strong>Battery Tester:</strong></p><p style="">This is advanced testing equipment for research and development of energy storage or electrochemical devices, such as batteries, supercapacitors, and fuel cells. <strong></strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300166'>Scanning Photocurrent Microscope (SPCM)</a></h4><div class='shortDescription'></div> </ul> </div> </div> <h3>Electron Microscopy</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300104'>Analytical Bio/Soft Matter Transmission Electron Microscope (TEM)</a></h4><div class='shortDescription'><p style=""><strong>JEOL 1400 TEM:</strong></p><p style="">The JEOL JEM-1400 LaB6 120 kV transmission electron microscope is an easy-to-use, high contrast instrument with excellent imaging (TEM and STEM modes) and analytical (energy dispersive spectroscopy detector) capabilities. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300076'>Dual Beam Scanning Electron/Focused Ion Beam Microscope</a></h4><div class='shortDescription'><p><strong>Dual Beam:</strong></p><p style="">Dual Beam Scanning Electron/Focused Ion Beam Microscope (FEI Helios), capable of simultaneous focused ion beam milling and SEM imaging.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300323'>Electron Beam Induced Current (EBIC) Imaging-Helios G5</a></h4><div class='shortDescription'><strong>Electron Beam Induced Current (EBIC) Imaging:</strong><br /><br />EBIC is an analysis technique in the SEM, which creates images using the electrical response of the sample as a function of the scanning position of the electron beam. </div> <li><h4><a href='/cfn/equipment/details.php?q=300101'>Environmental Transmission Electron Microscope (E-TEM)</a></h4><div class='shortDescription'><p><strong>Titan 80-300:</strong></p><p style="">The E-TEM instrument (FEI Titan 80-300) is an 80 – 300 kV field-emission transmission electron microscope with an objective-lens aberration corrector at spatial resolution of 0.08 nm.  The instrument has scanning transmission imaging, magnetic imaging, and chemical analysis capabilities.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300163'>FEI TALOS Operando S/TEM</a></h4><div class='shortDescription'><p><strong>FEI TALOS:</strong></p><p style="">The FEI Talos F200X is a high-resolution analytical scanning/transmission electron microscope (S/TEM) that is routinely operated at 200 keV. This microscope is equipped with an X-FEG electron source module that gives a source brightness four times that of a Schottky FEG emitter. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300315'>Helios G5 Dual Beam SEM/FIB Microscope</a></h4><div class='shortDescription'><p><strong>Helios G5 Dual Beam SEM/FIB Microscope:</strong></p><p>Excellent electron and FIB imaging resolution (including at FIB energies below 2 keV). It possesses an array of imaging, analysis, device fabrication, electrical characterization, and TEM sample preparation capabilities.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300106'>High Resolution Analytical Scanning Electron Microscope</a></h4><div class='shortDescription'><p style=""><strong>JEOL JSM-7600F</strong>:</p><p style="">The JEOL JSM-7600F is a state-of-the-art thermal FE-SEM combining high resolution imaging with optimized analytical functionality. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300105'>Scanning Electron Microscope (SEM)</a></h4><div class='shortDescription'><p><strong>Hitachi SEM:</strong></p><p style="">This scanning electron microscope (Hitachi 4800 SEM) is a cold field emission instrument capable of 1.5 nm resolution at 15 kV and 2.5 nm resolution at 1 kV. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300107'>Scanning Electron Microscope/Scanning Auger Microscopy/4-point Transport Measurement of Nanostructures</a></h4><div class='shortDescription'><p style=""><strong>Nanoprobe:</strong></p><p style="">This Nanoprobe system is capable of performing scanning electron microscopy (SEM), scanning Auger microscopy (nanoSAM), 4-point probe measurements, and low energy electron diffraction (LEED).</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300102'>Scanning Transmission Electron Microscope (STEM)</a></h4><div class='shortDescription'><p><strong>Hitachi 2700C:</strong></p><p style="">This instrument is ideal for probing structural and electronic properties of materials at the Angstrom level, allowing on to study the physical, chemical and electronic structure of oxide interfaces, catalysts and other functional nanomaterials.  </p></div> </ul> </div> </div> <h3>Etching and Ashing</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300068'>Deep Reactive Ion Etcher, available w/Bosch process (DRIE)</a></h4><div class='shortDescription'><p><strong>Silicon DRIE:</strong></p><p style="">This system has demonstrated capability to etch vertical walls in silicon to a depth of 300 µm at etch rates of 3 µm / min with an aspect ratio (width of feature to etch depth) of 1:50. It has a laser interferometer endpoint detector (shared with the other Oxford ICP RIE tool) to help achieving an accurate etching depth. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300070'>General purpose Reactive Ion Etcher</a></h4><div class='shortDescription'><p style=""><strong>Trion RIE:</strong></p><p style="">The general purpose plasma etch tool (Trion Phantom III) is used for etching thin films generally 1 µm or less in thickness.<strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300071'>Oxford Chlorine Etcher C (RIE-C)</a></h4><div class='shortDescription'><p style=""><strong>Oxford Metal Etcher:</strong></p><p style="">This ICP Reactive Ion Etching system (Oxford Instruments Plasmalab 100) has an inductively coupled plasma source for high-speed, anisotropic plasma etching.<strong> </strong></p></div> </ul> </div> <div class='majorMinorOuter minorOuter'> <h3 class='equipmentTypeHead'>Minor Equipment</h3> <ul class='equipmentList minorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300072'>Liquid CO2 Critical Point Dryer (Autosamdri-815B)</a></h4><div class='shortDescription'><strong>CPD:</strong></div> <li><h4><a href='/cfn/equipment/details.php?q=300069'>Plasma Asher</a></h4><div class='shortDescription'><strong>Plasma Asher</strong></div> <li><h4><a href='/cfn/equipment/details.php?q=300147'>Reactive Ion Etcher (RIE)</a></h4><div class='shortDescription'><p style=""><strong>March RIE:</strong></p><p style="">This tool (March Plasma CS1701F) is used for radio frequency (RF) plasma etching of organic and inorganic thin films using combinations of six process gases (SF<sub>6</sub>, CF<sub>4</sub>, CHF<sub>3</sub>, O<sub>2</sub>, Ar, and CF<sub>3</sub>Br).<strong> </strong></p></div> </ul> </div> </div> <h3>Lithography</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300167'>3-D Laser Lithography System (Photonic Professional GT)</a></h4><div class='shortDescription'><p><strong>3-D Litho:</strong></p><p style="">This tool (Nanoscribe Photonic Professional GT) is an automatic 3-D nanolithography system/3-D printer capable of creating polymer patterns/models down to sub-200 nm resolution using two-photon polymerization technique.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300076'>Dual Beam Scanning Electron/Focused Ion Beam Microscope</a></h4><div class='shortDescription'><p><strong>Dual Beam:</strong></p><p style="">Dual Beam Scanning Electron/Focused Ion Beam Microscope (FEI Helios), capable of simultaneous focused ion beam milling and SEM imaging.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300073'>Electron Beam Lithography Tool (EBL)</a></h4><div class='shortDescription'><p style=""><strong>Ebeam Litho</strong><strong>:</strong></p><p style="">The JEOL JBX-6300FS is a state-of-the-art 100kV EBL tool providing high-speed patterning capabilities with feature sizes as small as 8 nm over mm-scale areas.<strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300315'>Helios G5 Dual Beam SEM/FIB Microscope</a></h4><div class='shortDescription'><p><strong>Helios G5 Dual Beam SEM/FIB Microscope:</strong></p><p>Excellent electron and FIB imaging resolution (including at FIB energies below 2 keV). It possesses an array of imaging, analysis, device fabrication, electrical characterization, and TEM sample preparation capabilities.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300097'>UV Mask Aligner</a></h4><div class='shortDescription'><p><strong>UV Mask Align:</strong></p><p style="">The system (Karl Suss MA-6 UV Mask Aligner) is capable of exposing photoresist patterns down to 1 micron resolution with UV light at two wavelengths (405 nm and 240m nm).</p></div> </ul> </div> <div class='majorMinorOuter minorOuter'> <h3 class='equipmentTypeHead'>Minor Equipment</h3> <ul class='equipmentList minorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300096'>L-EDIT (CAD)</a></h4><div class='shortDescription'></div> <li><h4><a href='/cfn/equipment/details.php?q=300074'>Layout Beamer (pattern fracture & proximity effect correction)</a></h4><div class='shortDescription'></div> </ul> </div> </div> <h3>Optical Microscopy</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300160'>High-speed multiphoton laser scanning confocal imaging/hyperspectral imaging microscope</a></h4><div class='shortDescription'><p><strong>Confocal Leica TCS SP5:</strong></p><p>The Leica TCS SP5 commercial inverted laser-scanning confocal fluorescence microscope (video rate) used for fluorescence, transmission and reflectivity imaging (400-800nm range). <strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300157'>Time and Spectrally Resolved Confocal Photoluminescence and Electroluminescence Microscope </a></h4><div class='shortDescription'><p><strong>Confocal Olympus IX81:</strong></p><p>Home built Olympus IX81 inverted confocal PL microscope for FLIM imaging and probing, with single molecule/nanostructure sensitivity.<strong> </strong></p></div> </ul> </div> <div class='majorMinorOuter minorOuter'> <h3 class='equipmentTypeHead'>Minor Equipment</h3> <ul class='equipmentList minorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300089'>Epifluorescent and Polarized Imaging Microscope</a></h4><div class='shortDescription'><p><strong>Olympus Polarized Microscope:</strong></p><p>Upright microscope for routine epifluorescent, polarized and bright field or dark field imaging. </p> </div> <li><h4><a href='/cfn/equipment/details.php?q=300183'>Nikon Eclipse Ti2 Confocal Hyperspectral dark field/bright field/fluorescence imaging microscope</a></h4><div class='shortDescription'><p><strong>Nikon Eclipse Ti2 Hyperspectral Dark Field:</strong></p><p>This is an inverted microscope used for recording scattering and fluorescence spectra, spectroelectrochemistry attachment, bright field imaging, chirality and polarization modes. </p></div> </ul> </div> </div> <h3>Proximal Probes</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300170'>Ambient Pressure PES and IRRAS</a></h4><div class='shortDescription'><p style="">This instrument allows for surface chemical analysis via X-ray Photoelectron Spectroscopy (XPS) and Infrared Reflection Absorption Spectroscopy (IRRAS) at gas pressures up to ~ 2 mbar and variable temperatures.  Applications include in situ studies of surface chemistry, catalysis, separation, and energy storage processes, among others.<br /></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300184'>NanoIR/s-SNOM</a></h4><div class='shortDescription'><p style=""><strong>NanoIR/s-SNOM:</strong></p><p style="">The NanoIR instrument is capable of performing both scattering-type scanning near-field optical microscopy (s-SNOM) and photothermal infrared spectromicroscopy (PTIR) with a spatial resolution of 10nm in tapping mode and 50nm in contact mode. <span style="font-family:'Calibri',sans-serif;font-size:11pt;mso-fareast-font-family:Calibri;mso-fareast-theme-font:minor-latin;mso-ansi-language:EN-US;mso-fareast-language:EN-US;mso-bidi-language:AR-SA;"></span></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300087'>UHV Multiprobe Surface Analysis System - STM/XPS/UPS/ISS/LEED/TPD</a></h4><div class='shortDescription'><p style=""><br /></p><p style="margin-bottom:12.0pt;line-height:normal;"><strong><span style="font-family:Roboto;color:#333333;border:none windowtext 1.0pt;padding:0in;background:white;">Multiprobe</span></strong></p><p style="margin-bottom:0in;line-height:normal;"><span style="font-family:Roboto;color:#333333;border:none windowtext 1.0pt;padding:0in;background:white;">UHV-MultiProbe Surface Analysis System (STM\XPS\UPS\ISS\LEED\TPD)</span><span style="font-family:Roboto;color:#333333;background:white;"> is </span><span style="font-family:Roboto;color:black;">capable of in-situ clean sample preparations, nanostructure fabrications, and complementary surface characterizations including atomic-resolution surface structures, chemical compositions/states, relative atomic concentrations, and physical and chemical properties, aimed at exploring structure-properties relationships.</span></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300321'>mIRage O-PTIR + Raman</a></h4><div class='shortDescription'>The mIRage optical-photothermal infrared (O-PTIR) plus Raman instrument provides sub-500nm spatially resolved infrared and Raman spectra on the same spot at the same time with the same spatial resolution.</div> </ul> </div> <div class='majorMinorOuter minorOuter'> <h3 class='equipmentTypeHead'>Minor Equipment</h3> <ul class='equipmentList minorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300120'>Bruker Vertex 80v Spectrometer w/UHV IRRAS and Powder Transmission Capabilities</a></h4><div class='shortDescription'><p style=""><strong>Bruker FTIR: </strong></p><p>For transmission and reflectance IR measurements from UHV to atmospheric pressure.</p></div> </ul> </div> </div> <h3>Rheology</h3> <div> <div class='majorMinorOuter minorOuter'> <h3 class='equipmentTypeHead'>Minor Equipment</h3> <ul class='equipmentList minorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300100'>Hybrid Rheometer</a></h4><div class='shortDescription'><p><strong>Discovery HR-3 Rheometer:</strong></p><p style="">The instrument is designed to measure mechanical/rheological properties of soft materials, including gels, liquids, and assemblies of macromolecules or nanoparticles at air-liquid interfaces.<strong> </strong></p></div> </ul> </div> </div> <h3>Scanning and Probing Microscopy</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300084'>Low Energy Electron Microscope V (LEEM)</a></h4><div class='shortDescription'><p style=""><strong>LEEM V:</strong></p><p style="">A field-emission low-energy electron microscope (Elmitec LEEM V) allows for in-situ microscopic studies of dynamic surface processes.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300085'>Low-Temperature UHV Scanning Tunneling/Force Microscope</a></h4><div class='shortDescription'><p style=""><strong>Createc LT-STM/AFM:</strong></p><p style="">A upgraded Createc low-temperature UHV scanning tunneling microscope (STM) with atomic force microscope (NC-AFM/HR-AFM operation modes. Default operation at 5K STM and sample temperature. Using Q-Plus sensor (30kHz) with FIB shaped 25um PtIr tip wire. Full time support by CFN staff knowledgeable in various preparation methods for molecule structure imaging and beyond.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300088'>Reactor Scanning Tunneling Microscope (STM)</a></h4><div class='shortDescription'><p style=""><strong>Reactor STM:</strong></p><p style=""></p><p>The reactor-Scanning Tunneling Microscopy (r-STM) allows STM measurements of a surface from UHV to 3 atm. </p></div> </ul> </div> <div class='majorMinorOuter minorOuter'> <h3 class='equipmentTypeHead'>Minor Equipment</h3> <ul class='equipmentList minorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300294'>Environmental Atomic Force Microscope, Video-Rate Capability</a></h4><div class='shortDescription'><p><strong>Asylum Cypher AFM ES VRS:</strong></p><p>Atomic force microscope with environmental control and video-rate capabilities.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300156'>Park NX-20 Atomic Force Microscope</a></h4><div class='shortDescription'><p><strong>AFM:</strong></p><p style="margin-bottom:12.0pt;line-height:normal;"><span style="font-family:Roboto;color:black;">The Park NX-20 atomic force microscope is capable of surface imaging at ambient conditions at room temperature, as well as at elevated temperatures. </span></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300083'>WiTec Alpha Combination Microscope</a></h4><div class='shortDescription'><p style=""><strong>Raman:</strong></p><p style="margin-bottom:12.0pt;line-height:normal;"><span style="font-family:Roboto;color:black;">WiTec Alpha 300 combination microscope integrates confocal Raman microscopy, atomic force microscope, scanning near-field optical microscope, confocal microscope within the same field of view. </span></p></div> </ul> </div> </div> <h3>Solution Based and Biomolecular Methods</h3> <div> <div class='majorMinorOuter minorOuter'> <h3 class='equipmentTypeHead'>Minor Equipment</h3> <ul class='equipmentList minorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300132'>Biomolecular methods: cell culture, cold room, gel electrophoresis and DNA imaging</a></h4><div class='shortDescription'><p><strong>Bio Methods:</strong></p><p>Cell culture, cold room, gel electrophoresis and DNA imaging.</p><p><strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300136'>Centrifuges, shakers, mixers, sonicators</a></h4><div class='shortDescription'><p><strong>Centrifuges, shakers, mixers, sonicators:</strong></p><p>Available to provide fast separate substances and shaking or vortexing with tough metal housing at high speed, which is ideal for small volume liquid processing. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300133'>LightCycler 480 instrument</a></h4><div class='shortDescription'><p style=""><strong>Real-Time PCR:</strong></p><p style="">The LightCycler<sup><span style="font-size:x-small;">®</span></sup> 480 system enables you to perform real-time, online PCR combined with rapid cycling of up to 96 or 384 samples.<strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300137'>Particle Sizing and Tracking</a></h4><div class='shortDescription'><p><strong>Nanosight:</strong></p><p>The instrument provides characterization of nanoparticle sizes and diffusion in liquids.<strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300131'>Wet chemistry synthesis/functionalization of nano-scale and organic materials</a></h4><div class='shortDescription'><p><strong>Wet Chemistry:</strong></p><p>Capabilities required for the synthesis, fabrication and study of novel hybrid structures and functionalities.</p><p> </p></div> </ul> </div> </div> <h3>Spectroscopic and Time-Resolved Probing</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300116'>Femtosecond Transient Absorption Spectrometer</a></h4><div class='shortDescription'><p style=""><strong>Transient Absorption/Reflectivity Helios Fire:</strong></p><p style="">Helios Fire commercial pump-probe broadband absorption/reflectivity spectrometer capable to measure transient absorption spectra with 100 femtoseconds resolution in UV-VIS-NIR (320nm-1600nm) using a 1 KHz (3mJ) regenerative amplifier and two TOPAS OPAs (290-2600nm). </p><p><strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300117'>Nanosecond Transient Absorption Spectrometer</a></h4><div class='shortDescription'><p style=""><strong>Transient Absorption/Reflectivity EOS:</strong></p><p style="">Commercial EOS pump-probe broadband transient absorption/reflectivity spectrometer capable to measure time-resolved spectra with nanosecond resolution in VIS and NIR in combination with a 1 KHz regenerative amplifier, two TOPAS OPAs (290nm-2600nm) and a supercontinuum Leukos laser for probing. </p></div> </ul> </div> <div class='majorMinorOuter minorOuter'> <h3 class='equipmentTypeHead'>Minor Equipment</h3> <ul class='equipmentList minorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300123'>Circular Dichroism Spectrometer</a></h4><div class='shortDescription'><p><strong>Jasco J-815 Circular Dichroism (CD) Spectropolarimeter:</strong></p><p style="">Circular dichroism (CD) spectroscopy measures differences in the absorption of left-handed polarized light versus right-handed polarized light that arise due to structural asymmetry.<strong></strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300121'>FTIR Spectrometer</a></h4><div class='shortDescription'><p><strong>Nicolet 6700 FT-IR Spectrometer:</strong></p><p>Fourier Transform Infrared (FT-IR) Spectrometer. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300162'>Fluorimeter</a></h4><div class='shortDescription'><p><strong>Horiba Nanolog Fluorimeter:</strong></p><p>Commercial Horiba Nanolog Fluorimeter: cuvette and thin film, cryostat (LN<sub>2</sub>) for thin film samples. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300122'>Photon Counting Spectrofluorometer</a></h4><div class='shortDescription'><p style=""><strong>ISS PC1 Fluorometer:</strong></p><p style="">This fluorometer (ISS PC1 Multifrequency Cross-Correlation Phase and Modulation Fluorometer) is capable of steady state and lifetime measurements (from 1 millisecond to 1 picosecond).<strong> </strong></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300161'>Time Correlated Single Photon Counting Spectrometer</a></h4><div class='shortDescription'><p><strong>Picoquant FT200:</strong> </p><p>Commercial Fluorescence/Phosphorescence Lifetime Spectrometer for time-resolved fluorescence decays in the UV-VIS-NIR (460-800nm, 850-1450nm). available lasers are 442nm and 532nm pulsed. </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300125'>Uv-Vis Spectrophotometer</a></h4><div class='shortDescription'><p><strong>PerkinElmer UV-Vis Lambda 25: </strong></p><p><strong></strong>UV/Vis Spectrophotometer</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300124'>Uv-Vis/NIR Spectrophotometer with 60mm integrating sphere</a></h4><div class='shortDescription'><p><strong>PerkinElmer Lambda 950:</strong></p><p style="">In addition to liquid sample measurements, the instrument is equipped for studies of films and powders in specular and diffuse scattering regimes. <strong> </strong></p></div> </ul> </div> </div> <h3>Theory Computation & Software</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300098'>Software and Computational Services</a></h4><div class='shortDescription'><p style=""><strong>Computer clusters, software and data storage:</strong></p><p style="">We have diverse software tools that include deep learning frameworks, density functional theory packages for solids, surface and quantum chemistry, molecular-dynamics packages, and specialized tools for electronic excitations and optical properties.<strong> </strong></p></div> </ul> </div> </div> <h3>Thermal Analysis, Annealing and Electrochemistry</h3> <div> <div class='majorMinorOuter minorOuter'> <h3 class='equipmentTypeHead'>Minor Equipment</h3> <ul class='equipmentList minorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300325'>Automated Solvent Vapor Annealer (SVA)</a></h4><div class='shortDescription'>The solvent vapor annealer is an instrument design for controlled swelling of polymer and other soft matter thin films by solvent vapors (e.g., THF, acetone). Automated swelling profiles can be programmed based on feedback control of nitrogen purge gas or substrate temperature using customized software.</div> <li><h4><a href='/cfn/equipment/details.php?q=300139'>Constant Temperature bath (-20掳C to 100掳C)</a></h4><div class='shortDescription'></div> <li><h4><a href='/cfn/equipment/details.php?q=300138'>Differential Scanning Calorimeter (DSC)</a></h4><div class='shortDescription'><p><strong>DSC:</strong></p><div><p style="">The Perkin-Elmer Pyris Diamond DSC is used to perform differential scanning calorimetry measurements under helium purging in the temperature range of -170 °C to 300 °C, or under nitrogen purging from room temperature to 55<span style="">0 °C.</span></p></div></div> <li><h4><a href='/cfn/equipment/details.php?q=300141'>Electrochemical workstation</a></h4><div class='shortDescription'>Solartron Analytical Apps-XM series potentiostat.</div> <li><h4><a href='/cfn/equipment/details.php?q=300140'>Thermo Gravimetric/Differential Thermal Analyzer (TGA/DTA)</a></h4><div class='shortDescription'><p style=""><strong>TGA/DTA:</strong></p><p style="">The Perkin-Elmer Pyris Diamond TGA/DTA is used to perform thermogravimetric and differential thermal analytic measurements.</p></div> </ul> </div> </div> <h3>Thin Film Metrology</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300128'>锘縎martLab Universal Diffractometer</a></h4><div class='shortDescription'><p><strong></strong><strong>SmartLab Universal Diffractometer:</strong></p><p>Rigaku SmartLab is a universal diffractometer capable of characterizing thin films, bulk powders, and surfaces.</p></div> </ul> </div> <div class='majorMinorOuter minorOuter'> <h3 class='equipmentTypeHead'>Minor Equipment</h3> <ul class='equipmentList minorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300142'>Dektak 150 Stylus Profilometer</a></h4><div class='shortDescription'><p><strong>Dektak 150 Stylus Profilometer:</strong></p><p style="">Single scan contact profilometer with a scan length range 50 um to 55 mm and a sub 1 nm specified vertical resolution.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300146'>Reflectometer</a></h4><div class='shortDescription'><p><strong>Filmetric F20:</strong></p><p>This tool (Filmetrics F20) is a spectro-reflectometer which measures the thickness and reflective index of thin film deposited on flat substrate. It can handle samples with multilayer thin film.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300143'>Spectroscopic Ellipsometer</a></h4><div class='shortDescription'><p style=""><strong>Woollam M2000:</strong></p><p style="">This ellipsometer (J.A. Woollam M-2000 Spectroscopic Ellipsometer) allows analysis and mapping of thin films and interfaces, with temperature control in air and liquids. <strong> </strong></p></div> </ul> </div> </div> <h3>X-Ray and Light Scattering</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300165'>Complex Materials Scattering SAXS/WAXS beamline at NSLS-II</a></h4><div class='shortDescription'><p style=""><strong>CMS:</strong></p><p style="">The CMS beamline, operated through a partnership between CFN and the <a href="https://www.bnl.gov/ps/"><span style="color:#0066cc;">National Synchrotron Light Source II</span></a> (NSLS-II), is dedicated to structural studies of complex materials, including nanomaterials, soft matter, and biomolecular assemblies.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300127'>Miniflex X-Ray Diffractometer</a></h4><div class='shortDescription'><p><strong>Miniflex II:</strong></p><p>The Miniflex II is capable of characterizing thin films, bulk powders, and surfaces. <br /></p></div> <li><h4><a href='/cfn/equipment/details.php?q=300130'>Small Angle X-Ray Scattering (SAXS/GISAXS/WAXS) with Cu rotating anode source</a></h4><div class='shortDescription'><p><strong>SaxsLabs SAXS:</strong></p><p style="">The SaxsLabs Small Angle X-ray Scattering instrument investigates the structure of materials from angstroms to ~200 nm length scales by providing SAXS/GISAXS and WAXS capabilities.</p></div> <li><h4><a href='/cfn/equipment/details.php?q=300168'>Soft Matter Interfaces SAXS/WAXS beamline at NSLS-II</a></h4><div class='shortDescription'><p style="text-align:left;"><strong>SMI:</strong></p><p style="">The CFN is a partner user on the Soft Matter Interfaces (SMI) beamline at Brookhaven's new, world-class synchrotron: the <a href="https://www.bnl.gov/ps/"><span style="color:#0066cc;">National Synchrotron Light Source II</span></a> (NSLS-II). The SMI beamline provides world-leading capabilities to study the structure, energetics, and assembly of soft and hybrid materials, in particular focusing on the critical role of interfaces </p></div> <li><h4><a href='/cfn/equipment/details.php?q=300128'>锘縎martLab Universal Diffractometer</a></h4><div class='shortDescription'><p><strong></strong><strong>SmartLab Universal Diffractometer:</strong></p><p>Rigaku SmartLab is a universal diffractometer capable of characterizing thin films, bulk powders, and surfaces.</p></div> </ul> </div> <div class='majorMinorOuter minorOuter'> <h3 class='equipmentTypeHead'>Minor Equipment</h3> <ul class='equipmentList minorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300129'>Dynamic Light Scattering with Zeta Potential</a></h4><div class='shortDescription'><p style=""><strong>Malvern Zeta Sizer Nano Series:</strong></p><p style="">This instrument (Malvern Zetasizer Nano ZS and Zeta Potential) measures the size (0.6 nm to 6000 nm) and zeta potential of dispersed particles in solution using a 633 nm He-Ne laser.<strong> </strong></p></div> </ul> </div> </div> </div> </div> </div> <div id="tabs-3"> <div class="tabInnerShell"> <div id='accordion-capability' class='accordion'> <h3>3D Surface Metrology in SEM</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300106'>High Resolution Analytical Scanning Electron Microscope</a></h4><div class='shortDescription'><p style=""><strong>JEOL JSM-7600F</strong>:</p><p style="">The JEOL JSM-7600F is a state-of-the-art thermal FE-SEM combining high resolution imaging with optimized analytical functionality. </p></div> </ul> </div> </div> <h3>Focused Ion Beam</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300076'>Dual Beam Scanning Electron/Focused Ion Beam Microscope</a></h4><div class='shortDescription'><p><strong>Dual Beam:</strong></p><p style="">Dual Beam Scanning Electron/Focused Ion Beam Microscope (FEI Helios), capable of simultaneous focused ion beam milling and SEM imaging.</p></div> </ul> </div> </div> <h3>Low Angle Backscattered Electron Detector (LABE)</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300106'>High Resolution Analytical Scanning Electron Microscope</a></h4><div class='shortDescription'><p style=""><strong>JEOL JSM-7600F</strong>:</p><p style="">The JEOL JSM-7600F is a state-of-the-art thermal FE-SEM combining high resolution imaging with optimized analytical functionality. </p></div> </ul> </div> </div> <h3>STEM imaging</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300106'>High Resolution Analytical Scanning Electron Microscope</a></h4><div class='shortDescription'><p style=""><strong>JEOL JSM-7600F</strong>:</p><p style="">The JEOL JSM-7600F is a state-of-the-art thermal FE-SEM combining high resolution imaging with optimized analytical functionality. </p></div> </ul> </div> </div> <h3>X-ray Energy Dispersive Spectroscopy (EDS)-Oxford Inca Energy</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300106'>High Resolution Analytical Scanning Electron Microscope</a></h4><div class='shortDescription'><p style=""><strong>JEOL JSM-7600F</strong>:</p><p style="">The JEOL JSM-7600F is a state-of-the-art thermal FE-SEM combining high resolution imaging with optimized analytical functionality. </p></div> </ul> </div> </div> <h3>X-ray Wavelength Dispersive Spectroscopy (WDS)-Oxford Inca Wave</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300106'>High Resolution Analytical Scanning Electron Microscope</a></h4><div class='shortDescription'><p style=""><strong>JEOL JSM-7600F</strong>:</p><p style="">The JEOL JSM-7600F is a state-of-the-art thermal FE-SEM combining high resolution imaging with optimized analytical functionality. </p></div> </ul> </div> </div> <h3>ion-beam/electron-beam induced deposition of TEOS (insulator)</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300076'>Dual Beam Scanning Electron/Focused Ion Beam Microscope</a></h4><div class='shortDescription'><p><strong>Dual Beam:</strong></p><p style="">Dual Beam Scanning Electron/Focused Ion Beam Microscope (FEI Helios), capable of simultaneous focused ion beam milling and SEM imaging.</p></div> </ul> </div> </div> <h3>ion-beam/electron-beam induced deposition of platinum</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300076'>Dual Beam Scanning Electron/Focused Ion Beam Microscope</a></h4><div class='shortDescription'><p><strong>Dual Beam:</strong></p><p style="">Dual Beam Scanning Electron/Focused Ion Beam Microscope (FEI Helios), capable of simultaneous focused ion beam milling and SEM imaging.</p></div> </ul> </div> </div> <h3>low-kV e-beam lithography with NPGS</h3> <div> <div class='majorMinorOuter majorOuter'> <h3 class='equipmentTypeHead'>Major Equipment</h3> <ul class='equipmentList majorEquipmentList'> <li><h4><a href='/cfn/equipment/details.php?q=300076'>Dual Beam Scanning Electron/Focused Ion Beam Microscope</a></h4><div class='shortDescription'><p><strong>Dual Beam:</strong></p><p style="">Dual Beam Scanning Electron/Focused Ion Beam Microscope (FEI Helios), capable of simultaneous focused ion beam milling and SEM imaging.</p></div> </ul> </div> </div> </div> </div> </div> </div> </div>  </div> </div> <div id="topOfPage"><span class="fa fa-chevron-circle-up fa-lg topOfPageTrigger"></span></div> <div class="footer" id="footer" > <div class="container_24"> <div class="grid_6"> <h3 id="BNL">Brookhaven National Laboratory</h3> <p>PO Box 5000<br/> Upton, NY 11973-5000<br/> (631) 344-8000</p> <p><a id="contactUs" class="extrasmall white button" href="https://www.bnl.gov/contact-us/">Contact us</a></p> <ul class="socialMediaIcons"> <li><a target="_blank" href="https://twitter.com/BrookhavenLab" title="Follow Us on 𝕏"><i class="fa-brands fa-square-x-twitter fa-2x"></i></a> <li><a 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