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<!DOCTYPE html><html lang="en"><head><meta charSet="utf-8"/><meta name="viewport" content="width=device-width"/><title>Measuring accuracy - Lithography principles | ASML</title><link rel="icon" href="https://www.asml.com/favicon.ico"/><meta name="title" content="Measuring accuracy - Lithography principles | ASML"/><meta name="description" content="ASML systems rely on data from sensors as well as diffraction-based and electron beam measurements to optimize chip production."/><meta name="theme-color" content="#10069F"/><meta name="robots" content="index,follow"/><meta property="og:type" content="website"/><meta property="og:url" content="https://www.asml.com/en/technology/lithography-principles/measuring-accuracy"/><meta property="og:site_name" content="ASML"/><meta property="og:title" content="How to measure the quality of a microchip"/><meta property="og:description" content="ASML systems rely on data from sensors as well as diffraction-based and electron beam measurements to optimize 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class="flex items-center text-color-white button--search block " title="" type="submit" aria-label=""><span class="fill-color-white h-full w-full"><span class="search-icon "></span></span></button></div></form></div></div></div></div></div></div></header><div id="content" class="grid grid-cols-12"><div class="hero-banner-container col-span-12" id="hero-banner"><div class="component hero-banner hero-banner--main hero-banner--large {38E4DCEC-7934-4768-ADFE-65E4A5C26274} "><div class="hero-banner-image-container"><div class="hero-banner-image-wrapper has-bg-img "><img alt="NXE3400 metrology" width="1920" height="1080" sizes="(max-width: 99px) 100px, (max-width: 319px) 320px, (max-width: 499px) 500px, (max-width: 575px) 576px, (max-width: 749px) 750px, (max-width: 767px) 768px, (max-width: 991px) 992px, (max-width: 999px) 1000px, (max-width: 1199px) 1200px, (max-width: 1599px) 1600px, 1920px" class="hero-banner-image page-image" title="NXE3400 metrology" style="object-position:50% 50%" layout="fill" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?mw=100 100w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?mw=320 320w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?mw=500 500w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?mw=576 576w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?mw=750 750w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?mw=768 768w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?mw=992 992w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?mw=1000 1000w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?mw=1200 1200w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?mw=1600 1600w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?mw=1920 1920w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?h=1080&iar=0&w=1920"/></div></div><div class="hero-banner-content-container has-quick-links "><div class="fluid-grid"><div class="hero-banner-content translate-y-0 opacity-100 "><div class="component breadcrumbs--hero-banner"><nav><ol><li class=" "><a title="Home" href="/en">Home</a><svg width="6" height="9" viewBox="0 0 6 9" xmlns="http://www.w3.org/2000/svg"><path d="M1.52 9.056 5.157 5.42h.001l.606-.606L1.521.57l-.606.606L4.55 4.814.915 8.45l.606.606Z" fill="currentColor" fill-rule="nonzero"></path></svg></li><li class=" "><a title="Technology" href="/en/technology">Technology</a><svg width="6" height="9" viewBox="0 0 6 9" xmlns="http://www.w3.org/2000/svg"><path d="M1.52 9.056 5.157 5.42h.001l.606-.606L1.521.57l-.606.606L4.55 4.814.915 8.45l.606.606Z" fill="currentColor" fill-rule="nonzero"></path></svg></li><li class="mobile-back-item "><svg width="6" height="9" viewBox="0 0 6 9" xmlns="http://www.w3.org/2000/svg"><path d="M4.52.571.887 4.208H.884l-.606.606 4.243 4.242.606-.606-3.635-3.636 3.635-3.637L4.52.571Z" fill="currentColor" fill-rule="nonzero"></path></svg><a title="Lithography principles" href="/en/technology/lithography-principles">Lithography principles</a><svg width="6" height="9" viewBox="0 0 6 9" xmlns="http://www.w3.org/2000/svg"><path d="M1.52 9.056 5.157 5.42h.001l.606-.606L1.521.57l-.606.606L4.55 4.814.915 8.45l.606.606Z" fill="currentColor" fill-rule="nonzero"></path></svg></li></ol></nav></div><h1 class="hero-banner-title page-title" role="heading">Measuring accuracy</h1><p role="heading" class="hero-banner-subtitle page-subtitle scrollbar-hide max-h-[198px]">The accuracy of every element of the lithography process is rigorously assessed. Because even the smallest errors can result in a defect chip</p><div class="hero-banner-comp"><div class="hero-banner-comp-line"><svg class="h-full w-full object-cover object-center " role="img" xlink:title="long arrow"><use href="/images/icons/long-arrow.svg#long-arrow"></use></svg></div><label class="hero-banner-comp-text"><span class="">01 / 80</span></label></div></div></div></div></div><div class="quick-link-list quick-link-list--large bg-dark"><div class="guttered-box"><div class="guttered"><h3 class="quick-link-list-title">More about...</h3><div class="quick-links-container"><div class="quick-link-container"><a title="" target="" class="quick-link " href="/en/technology/lithography-principles/measuring-accuracy#yieldstar"><p class="quick-link-text">Optical</p></a></div><div class="quick-link-container"><a title="" target="" class="quick-link " href="/en/technology/lithography-principles/measuring-accuracy#E-beam"><p class="quick-link-text">E-beam</p></a></div><div class="quick-link-container"><a title="" target="" class="quick-link " href="/en/technology/lithography-principles/measuring-accuracy#in-scanner"><p class="quick-link-text">In-scanner</p></a></div><div class="quick-link-container"><a title="" target="" class="quick-link " href="/en/technology/lithography-principles/measuring-accuracy#Patternfidelity"><p class="quick-link-text">Pattern fidelity</p></a></div></div></div></div></div></div><div class="component col-span-12 custom-container rte-container fluid-grid"><div class="component col-span-12 md:col-start-3 md:col-span-8 xl:col-start-4 xl:col-span-6 font-weight--light custom-rich-text "><div><h4 class="rte-align-center">Chipmakers use our products to print chip patterns and inspect those patterns using advanced metrology systems and software, allowing them to increase accuracy and yield.</h4></div></div></div><div class="component col-span-12 bg-color-gray-100 bg-light custom-container rte-container fluid-grid"><div class="component col-span-12 md:col-start-3 md:col-span-4 no-px no-pb no-pt custom-container rte-container fluid-grid"><div class="component col-span-12 mb-6 md:col-span-12 font-weight--medium custom-rich-text "><div><h4>Types of metrology and inspection</h4></div></div><div class="component col-span-12 mb-2 md:col-span-12 font-weight--light custom-rich-text "><div><h5>There are two ways to examine the quality of the printed features on a chip: diffraction-based optical measurement and e-beam inspection.</h5><h5><br /></h5><h5>Diffraction examines how light reflects from the wafer, while e-beam observes how electrons scatter when they come into contact with the wafer.</h5></div></div></div><div class="component col-span-12 md:col-start-8 md:col-span-3 custom-rich-text "><div><p>ASML uses both: our YieldStar systems use diffraction-based measuring to assess the pattern quality on the wafer, and HMI e-beam inspection systems help locate and analyze individual chip defects.</p><p><br /></p><p>Combined with sensor-based information from inside our lithography machines and a complex set of software algorithms, the YieldStar and HMI systems provide a wealth of data that chipmakers use to optimize their manufacturing process.</p></div></div></div><div id="yieldstar" class="component itb itb--default col-span-12 undefined" data-testid="yieldstar"><div class="itb-text-col component-wrapper"><div class="component col-span-12 mb-6 font-weight--medium custom-rich-text "><div><h4>Optical metrology</h4></div></div><div class="component col-span-12 mb-6 font-weight--light custom-rich-text "><div><h5>YieldStar</h5></div></div><div class="component col-span-12 custom-rich-text "><div><p>ASML's YieldStar systems do just what their name suggests: they help our customers increase their yield, or the proportion of functioning chips on the wafer. YieldStar allows manufacturers to track key production parameters such as overlay (the accuracy with which two layers of a chip are aligned). Our YieldStar systems are usually integrated into the production line so that they can measure quickly and accurately, looping the data back to the lithography system for real-time corrections to the manufacturing process.</p></div></div></div><div class="itb-media-col component-wrapper"><div class="itb-img"><img alt="YieldStar, ASML’s flagship optical metrology system, is integrated in the lithography cell." width="575" height="324" loading="lazy" title="YieldStar, ASML’s flagship optical metrology system, is integrated in the lithography cell." style="object-position:50% 50%" sizes="(max-width: 99px) 100px, (max-width: 319px) 320px, (max-width: 499px) 500px, (max-width: 575px) 575px, 1200px" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/news/stories/2020/the-future-of-metrology-is-algorithms/asml-yieldstar-optical-metrology-system.jpg?mw=100 100w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/news/stories/2020/the-future-of-metrology-is-algorithms/asml-yieldstar-optical-metrology-system.jpg?mw=320 320w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/news/stories/2020/the-future-of-metrology-is-algorithms/asml-yieldstar-optical-metrology-system.jpg?mw=500 500w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/news/stories/2020/the-future-of-metrology-is-algorithms/asml-yieldstar-optical-metrology-system.jpg?mw=576 576w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/news/stories/2020/the-future-of-metrology-is-algorithms/asml-yieldstar-optical-metrology-system.jpg?mw=1200 1200w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/news/stories/2020/the-future-of-metrology-is-algorithms/asml-yieldstar-optical-metrology-system.jpg?h=324&iar=0&w=575"/></div></div></div><div class="component read-more-panel rte-container col-span-12 pb-12"><div class="read-more-panel-title-container"><p class="read-more-panel-title">How it works</p></div><div class="read-more-panel-content-container hide"><div class="read-more-panel-button-container"><hr class="read-more-panel-button-line"/><button class="read-more-panel-button" aria-label="Unfold toggle"><svg class="h-full w-full object-cover object-center read-more-panel-button-icon" role="img"><use href="/images/icons/ui.svg#plus"></use></svg></button></div><div class="read-more-panel-content"><div class="read-more-panel-content-grid"><div class="component-wrapper fluid-grid"><div class="component col-span-12 md:col-start-2 md:col-span-8 lg:col-start-2 lg:col-span-6 no-px custom-container rte-container fluid-grid"><div class="component col-span-12 mb-2 font-weight--medium custom-rich-text "><div><h5>Diffraction</h5></div></div><div class="component col-span-12 mb-6 custom-rich-text "><div><p>YieldStar is a diffraction-based optical metrology system which applies the simple fact that an object’s shape determines how light reflects from it. For example, shine a beam of light onto a repeating pattern of lines on a wafer, and you can easily predict what the resulting pattern of scattered light should look like. If you collect the scattered light using a high-resolution digital camera, you can quickly determine how well the prediction matches reality and thus how well the pattern of lines has been printed.</p></div></div><div class="component col-span-12 mb-2 font-weight--medium custom-rich-text "><div><h5>Fast, accurate wafer metrology</h5></div></div><div class="component col-span-12 mb-6 custom-rich-text "><div><p>In wafer metrology, key manufacturing parameters such as overlay (the accuracy with which two layers of a chip are aligned) and focus (how sharp the image is) are monitored by measuring how well a particular repeating pattern (the ‘metrology target’) is printed on the wafer. These measurements are made at marked locations across the wafer.</p></div></div><div class="component col-span-12 mb-2 font-weight--medium custom-rich-text "><div><h5>Integrated into the production line</h5></div></div><div class="component col-span-12 mb-6 custom-rich-text "><div><p>Prior to YieldStar, wafers were taken out of the production line to be measured manually. By integrating our solution into the production line (or ‘track’), chipmakers can now use YieldStar to gather their metrology data quickly and accurately, offering better control over their production processes. Metrology data is analyzed using control software and fed back to the lithography system in real-time, enabling customers to tune the manufacturing process further for optimal yield.</p></div></div><div class="component col-span-12 mb-2 font-weight--medium custom-rich-text "><div><h5>From repeating patterns to real structures</h5></div></div><div class="component col-span-12 custom-rich-text "><div><p>Our latest developments in diffraction-based metrology feature new optics technologies to generate more accurate data, faster, measuring thousands of data points for each batch of wafers. YieldStar matches the productivity of our lithography systems for wafer-to-wafer control on the most advanced chip nodes. Additionally, YieldStar is used for after-etch metrology to inspect actual device structures with more accuracy and higher measuring speeds than our competitors’ scanning electron microscope (SEM) solutions.</p></div></div></div></div></div></div></div></div><div id="E-beam" class="component itb itb--default col-span-12 undefined" data-testid="E-beam"><div class="itb-text-col component-wrapper"><div class="component col-span-12 mb-6 font-weight--medium custom-rich-text "><div><h4>E-beam metrology and inspection</h4></div></div><div class="component col-span-12 mb-6 font-weight--light custom-rich-text "><div><h5><span style="color: rgb(15, 35, 140);">HMI e-beam solutions</span></h5></div></div><div class="component col-span-12 custom-rich-text "><div><p>For today’s advanced microchips, defects as small as a couple of nanometers can render the entire chip useless. With its 1-nanometer resolution, e-beam inspection offers just the right kind of eyes to spot those tiny misprints.</p><p>ASML is at the forefront of developments in e-beam metrology and inspection. E-beam achieves a higher resolution than YieldStar, but it measures more slowly, which means that it’s typically used after the pattern is etched onto the wafer.</p></div></div></div><div class="itb-media-col component-wrapper"><div class="itb-img"><img alt="HMI eP5" width="1920" height="1434" loading="lazy" title="HMI eP5" style="object-position:50% 50%" sizes="(max-width: 99px) 100px, (max-width: 319px) 320px, (max-width: 499px) 500px, (max-width: 575px) 575px, 1200px" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/products/metrology-and-inspection/hmi-ep5-e-beam-metrology-system.jpg?mw=100 100w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/products/metrology-and-inspection/hmi-ep5-e-beam-metrology-system.jpg?mw=320 320w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/products/metrology-and-inspection/hmi-ep5-e-beam-metrology-system.jpg?mw=500 500w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/products/metrology-and-inspection/hmi-ep5-e-beam-metrology-system.jpg?mw=576 576w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/products/metrology-and-inspection/hmi-ep5-e-beam-metrology-system.jpg?mw=1200 1200w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/products/metrology-and-inspection/hmi-ep5-e-beam-metrology-system.jpg?h=1434&iar=0&w=1920"/></div></div></div><div class="component read-more-panel rte-container col-span-12 pb-12"><div class="read-more-panel-title-container"><p class="read-more-panel-title">How it works</p></div><div class="read-more-panel-content-container hide"><div class="read-more-panel-button-container"><hr class="read-more-panel-button-line"/><button class="read-more-panel-button" aria-label="Unfold toggle"><svg class="h-full w-full object-cover object-center read-more-panel-button-icon" role="img"><use href="/images/icons/ui.svg#plus"></use></svg></button></div><div class="read-more-panel-content"><div class="read-more-panel-content-grid"><div class="component-wrapper fluid-grid"><div class="component col-span-12 md:col-start-2 md:col-span-8 lg:col-span-6 lg:col-start-2 no-px custom-container rte-container fluid-grid"><div class="component col-span-12 mb-2 font-weight--medium custom-rich-text "><div><h5>‘E’ is for ‘electron’</h5></div></div><div class="component col-span-12 mb-6 custom-rich-text "><div><p>E-beam technology has been around for decades. The basic concept is that a metal wire is heated until it gives off electrons, which are accelerated and formed into a beam by electric and magnetic fields. Unlike visible and ultraviolet light (but just like extreme ultraviolet light) electron beams must travel in a vacuum so they are not deflected or absorbed before reaching the target.</p><p><br /></p><p>In metrology and inspection in the semiconductor industry, the e-beam scans across the wafer. The electrons strike the surface and penetrate a small distance into the material, generating new 'secondary electrons' before being scattered. Just as with diffraction-based measurements, measuring the scattering of secondary electrons allows us to build up a very high-resolution picture of the surface. The more focused the beam, the smaller the details that can be measured.</p></div></div><div class="component col-span-12 mb-2 font-weight--medium custom-rich-text "><div><h5>Speeding up e-beam imaging</h5></div></div><div class="component col-span-12 mb-6 custom-rich-text "><div><p>The tricky thing with e-beam measurements is that they’re quite slow. As a result, they have only typically been used in the early R&D phase of chip manufacturing, where time is less of an issue.</p><p><br /></p><p>ASML is leading the way in speeding up e-beam measurements so that manufacturers can enjoy their benefits in volume production. One way we do that is by developing solutions that focus e-beam measurements on specific hotspots where defects are more likely or more critical.</p></div></div><div class="component col-span-12 mb-2 font-weight--medium custom-rich-text "><div><h5>Multibeam inspection</h5></div></div><div class="component col-span-12 mb-6 custom-rich-text "><div><p>Our most recent e-beam system, the <a href="/en/products/metrology-and-inspection-systems/hmi-escan-1000" rel="noopener noreferrer">HMI eScan 1000</a>, combines high-resolution e-beam measurements with state-of-the-art computational modeling, machine learning algorithms and data from the lithography system.</p><p><br /></p><p>The HMI eScan 1000 uses multiple e-beams to inspect a greater surface area of the wafer faster. First shipped to customers in May, 2020, the eScan 1000 is a 3x3 multibeam system that can increase throughput by around a factor of nine. But we don't intend to stop there – we plan to increase the number of beams and beam resolution for future generations to align with chipmakers’ product roadmap requirements.</p></div></div><div class="component col-span-12 mb-2 font-weight--medium custom-rich-text "><div><h5>In-line wafer and reticle inspection</h5></div></div><div class="component col-span-12 custom-rich-text "><div><p>By speeding up the process and narrowing down the search to specific areas, e-beam can be used directly in the production line for wafer inspection while maintaining productivity levels.</p></div></div></div></div></div></div></div></div><div class="component video-banner col-span-12"><div class="relative block h-full w-full bg-color-white"><div class="absolute left-0 top-0 h-full w-full overflow-hidden bg-color-black/40"><img alt="ASML researcher Scott Middlebrooks explains pattern defectivity in a whiteboard session" width="1920" height="1080" sizes="(max-width: 99px) 100px, (max-width: 319px) 320px, (max-width: 499px) 500px, (max-width: 575px) 576px, (max-width: 749px) 750px, (max-width: 767px) 768px, (max-width: 991px) 992px, (max-width: 999px) 1000px, (max-width: 1199px) 1200px, (max-width: 1599px) 1600px, 1920px" class="video-banner-image" style="object-position:50% 50%" title="ASML researcher Scott Middlebrooks explains pattern defectivity in a whiteboard session" layout="fill" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/scott-middlebrooks-pattern-defectivity.png?mw=100 100w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/scott-middlebrooks-pattern-defectivity.png?mw=320 320w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/scott-middlebrooks-pattern-defectivity.png?mw=500 500w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/scott-middlebrooks-pattern-defectivity.png?mw=576 576w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/scott-middlebrooks-pattern-defectivity.png?mw=750 750w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/scott-middlebrooks-pattern-defectivity.png?mw=768 768w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/scott-middlebrooks-pattern-defectivity.png?mw=992 992w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/scott-middlebrooks-pattern-defectivity.png?mw=1000 1000w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/scott-middlebrooks-pattern-defectivity.png?mw=1200 1200w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/scott-middlebrooks-pattern-defectivity.png?mw=1600 1600w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/scott-middlebrooks-pattern-defectivity.png?mw=1920 1920w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/scott-middlebrooks-pattern-defectivity.png?h=1080&iar=0&w=1920"/></div><div class="video-banner-content-container "><div class="onetrust-overlay-container"><div class="onetrust-overlay"><script></script></div></div><button class="flex items-center text-color-white play-button relative " title="button" type="button" aria-label="button"><span class="fill-color-white h-full w-full"><svg class="h-full w-full object-cover object-center " role="img"><use href="/images/icons/ui.svg#play"></use></svg></span></button><span role="heading" class="video-banner-title ">Enable third party cookies to play this video</span><p role="heading" class="video-banner-description ">Below you can enable third party cookies. Your choice will be saved and the page will refresh.</p><div class="switch-button-container onetrust-cookie-toggle"><span class="switch-button-label">Disabled</span><label class="switch-button"><input type="checkbox" id="cookieSwitch"/><span class="slider" role="none"></span></label><span class="switch-button-label">Enabled</span></div></div></div></div><div id="in-scanner" class="component itb itb--default col-span-12 img--left" data-testid="in-scanner"><div class="itb-text-col component-wrapper"><div class="component col-span-12 mb-6 font-weight--medium custom-rich-text "><div><h4>In-scanner metrology</h4></div></div><div class="component col-span-12 custom-rich-text "><div><p>Precision and speed are paramount for today’s advanced chipmaking machines. But sub-nanometer inaccuracies inevitably creep in due to material imperfections, temperature fluctuations and atmospheric pressure changes. Scanner metrology software uses computational models of machine processes in machines to predict and coordinate how the powerful mechatronic modules within our lithography systems should behave to compensate for physical imperfections and maximize system performance. </p></div></div></div><div class="itb-media-col component-wrapper"><div class="itb-img"></div></div></div><div class="component read-more-panel rte-container col-span-12 pb-12"><div class="read-more-panel-title-container"><p class="read-more-panel-title">Read more</p></div><div class="read-more-panel-content-container hide"><div class="read-more-panel-button-container"><hr class="read-more-panel-button-line"/><button class="read-more-panel-button" aria-label="Unfold toggle"><svg class="h-full w-full object-cover object-center read-more-panel-button-icon" role="img"><use href="/images/icons/ui.svg#plus"></use></svg></button></div><div class="read-more-panel-content"><div class="read-more-panel-content-grid"><div class="component-wrapper fluid-grid"><div class="component col-span-12 md:col-start-2 md:col-span-8 lg:col-span-6 lg:col-start-2 no-px custom-container rte-container fluid-grid"><div class="component col-span-12 mb-2 custom-rich-text "><div><p><strong style="color: rgb(15, 35, 140);">Everything counts</strong></p></div></div><div class="component col-span-12 mb-6 custom-rich-text "><div><p>A lithography system (scanner) must work 24/7 with sub-nanometer precision, while accelerating mechatronic modules at incredible speeds. For example, the reticle stage accelerates at close to 16g and the wafer stage to 7g. That’s more acceleration than a jet fighter.</p><p><br /></p><p>It’s not possible to mechanically construct a machine capable of this level of alignment and precision, accelerating at those speeds, and with the level of reliability and repeatability required to make today’s computer chips without the help of in-scanner metrology.</p></div></div><div class="component col-span-12 mb-2 custom-rich-text "><div><p><strong style="color: rgb(15, 35, 140);">Chip by chip adjustments</strong></p></div></div><div class="component col-span-12 mb-6 custom-rich-text "><div><p>Lithography systems are the most ‘tweakable’ tool in the chipmaking process. There are a multitude of ‘knobs’ within the system that can be used to make small adjustments specific to each individual chip on each wafer.</p><p><br /></p><p>By constantly measuring the behavior of the lithography system, in-scanner metrology is used calculate and then coordinate the many tiny adjustments that need to be made by the physical components (the ‘knobs’) to optimize the pattern on every microchip.</p><p><br /></p><p>Hundreds of sensors, including position, temperature, energy and motion sensors, measure every aspect within the system. Advanced algorithms are used to interpret these large volumes of data and coordinate the necessary tweaks in very minor but detailed ways, at the sub-nanometer scale, using thousands of actuators.</p></div></div><div class="component col-span-12 mb-2 custom-rich-text "><div><p><strong style="color: rgb(15, 35, 140);">Enabling 3D chip architecture</strong></p></div></div><div class="component col-span-12 custom-rich-text "><div><p>In-scanner metrology plays a particularly critical role in ensuring the quality of a certain type of memory chip, known as 3D NAND. These are the flash memory chips used in SD cards, solid state hard drives and smartphones. Previously made in 2D, the introduction of 3D technology was a game-changer for memory chips.</p><p><br /></p><p>Stacking memory cells on top of each other greatly increases storage and enables the chips to run more efficiently and use less energy. But these chips are complex to make and a challenge to measure. 3D NAND chipmakers have to fabricate the intricate structures found on a 2D chip, and then line them up in the vertical plane, connecting them using tiny vertical channels.</p><p><br /></p><p>Many metrology systems can’t penetrate these 3D structures to look inside the chip to detect fabrication issues, so production relies heavily on in-scanner metrology software to optimize quality. By analyzing the vast amount of data generated while layers are added in the lithography system, the software feeds this back to optimize alignment and overlay.</p></div></div></div></div></div></div></div></div><div id="Patternfidelity" class="component itb itb--default col-span-12 img--left no-pb" data-testid="Patternfidelity"><div class="itb-text-col component-wrapper"><div class="component col-span-12 mb-6 font-weight--medium custom-rich-text "><div><h4>Pattern fidelity</h4></div></div><div class="component col-span-12 custom-rich-text "><div><p>Pattern fidelity control (PFC) is a new paradigm in chip manufacturing, aiming to deliver the full benefits of our holistic lithography approach. By drawing and analyzing the most precise data from a wider range of sources throughout the entire chip development and manufacturing process, it gives chipmakers unprecedented insights into the patterns they are actually printing on wafers. Powerful algorithms then translate those insights into actions. These actions are implemented in the lithography system to prevent pattern defects and enable high yields, even when producing the most complex chips.</p></div></div></div><div class="itb-media-col component-wrapper"><div class="itb-img"><img alt="A closeup of a silicon wafer containing colorful chips" width="1920" height="1282" loading="lazy" title="A closeup of a silicon wafer containing colorful chips" style="object-position:50% 50%" sizes="(max-width: 99px) 100px, (max-width: 319px) 320px, (max-width: 499px) 500px, (max-width: 575px) 575px, 1200px" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-elements/47137-wafer-close-up.jpg?mw=100 100w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-elements/47137-wafer-close-up.jpg?mw=320 320w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-elements/47137-wafer-close-up.jpg?mw=500 500w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-elements/47137-wafer-close-up.jpg?mw=576 576w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-elements/47137-wafer-close-up.jpg?mw=1200 1200w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-elements/47137-wafer-close-up.jpg?h=1282&iar=0&w=1920"/></div></div></div><div class="component read-more-panel rte-container col-span-12 pb-12"><div class="read-more-panel-title-container"><p class="read-more-panel-title">Read more</p></div><div class="read-more-panel-content-container hide"><div class="read-more-panel-button-container"><hr class="read-more-panel-button-line"/><button class="read-more-panel-button" aria-label="Unfold toggle"><svg class="h-full w-full object-cover object-center read-more-panel-button-icon" role="img"><use href="/images/icons/ui.svg#plus"></use></svg></button></div><div class="read-more-panel-content"><div class="read-more-panel-content-grid"><div class="component-wrapper fluid-grid"><div class="component col-span-12 md:col-start-2 md:col-span-8 lg:col-span-6 lg:col-start-2 no-px custom-container rte-container fluid-grid"><div class="component col-span-12 mb-2 custom-rich-text "><div><p><strong style="color: rgb(15, 35, 140);">Delivering the data</strong></p></div></div><div class="component col-span-12 mb-6 custom-rich-text "><div><p>A single lithography system can generate up 31 terabytes of data per week from its sensors alone – that’s three times more than the Hubble Space Telescope gathers in a year.</p><p><br /></p><p>The vision for PFC is to draw relevant data from wherever possible in the microchip development and production processes. To do that, we work together with other semiconductor equipment makers in the fab to bring the most benefit to chipmakers.</p><p><br /></p><p>We gather and use data from systems including the YieldStar metrology systems, e-beam inspection tools and wafer mapping within our lithography systems. We also leverage information from our <a href="/en/products/computational-lithography" rel="noopener noreferrer">computational lithography solutions</a>, as well as any non-ASML equipment on the production line. Finally, we are developing a range of pattern fidelity metrology options that harness the high resolution of e-beam measurements in ways that can be integrated into the production line.</p></div></div><div class="component col-span-12 mb-2 custom-rich-text "><div><p><strong style="color: rgb(15, 35, 140);">Data analysis</strong></p></div></div><div class="component col-span-12 custom-rich-text "><div><p>Working with domain experts in specialist fields such as overlay performance or illumination configuration, the vast amount of data we collect is first manually pre-processed to remove any spurious relationships (where the domain experts see a correlation but know there is no causal relationship). That data is then analyzed with advanced computer models and machine learning algorithms to uncover interactions between the many factors that contribute to defects, affecting the performance of the finished microchip. Finally, we calculate suitable corrections, which are then applied in the lithography system. This will deliver the advanced control that manufacturers need for sub-10 nm features.</p></div></div></div></div></div></div></div></div><div class="component carousel col-span-12 " role="link" tabindex="0"><div class="carousel-wrapper "><div class="carousel-desktop"><div class="carousel-heading"><hgroup><p class="carousel-subtitle">Lithography principle</p><span class="carousel-title ">The science behind the chip</span></hgroup></div><div class="carousel-mobile"><div class="z-10 flex w-fit items-center gap-4 rounded-28px bg-color-black-900/70 px-8 py-3 absolute left-58.75 top-16 max-md:hidden animate-show-icon opacity-100"><span class="h-2.5 w-2.5 fill-color-white" role="presentation"><svg xmlns="http://www.w3.org/2000/svg" width="10" height="10" viewBox="0 0 10 10" fill="none"><path fill-rule="evenodd" clip-rule="evenodd" d="M4.94975 0.0502621L5.65686 0.757369L1.41423 4.99999L5.65687 9.24262L4.94976 9.94973L0.707128 5.7071L0.707112 5.70712L5.03015e-06 5.00001L2.12145e-05 4.99999L1.17736e-05 4.99998L0.707118 4.29288L0.707128 4.29289L4.94975 0.0502621Z" fill="white"></path></svg></span><span class="my-0.25 h-7.5 w-8 fill-color-yellow" role="presentation"><svg class="h-full w-full object-cover object-center animate-move-swipe-gesture" role="img"><use href="/images/icons/ui.svg#grab-action"></use></svg></span><span class="h-2.5 w-2.5 fill-color-white" role="presentation"><svg xmlns="http://www.w3.org/2000/svg" width="11" height="10" viewBox="0 0 11 10" fill="none"><path fill-rule="evenodd" clip-rule="evenodd" d="M5.84923 9.94974L5.14212 9.24263L9.38475 5.00001L5.14212 0.757376L5.84922 0.0502692L10.0919 4.2929L10.0919 4.29288L10.799 4.99999L10.799 5.00001L10.799 5.00002L10.0919 5.70712L10.0919 5.70711L5.84923 9.94974Z" fill="white"></path></svg></span></div><div class="inline-block h-95 w-65 md:h-125 md:w-73.25"><a title="" target="" class="group relative mr-px block h-full max-w-full text-color-white" href="/en/technology/lithography-principles/rayleigh-criterion"><div class="h-full w-full "><div class="relative h-full w-full"><img alt="Experience Center Veldhoven" width="1920" height="1281" sizes="(max-width: 768px) 507px, 667px" class="h-full w-full object-cover object-center md:h-125" title="Experience Center Veldhoven" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/40868-experience-center-veldhoven.jpg?mw=507 507w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/40868-experience-center-veldhoven.jpg?mw=667 667w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/40868-experience-center-veldhoven.jpg?h=1281&iar=0&w=1920"/><div class="bg-gradient-transparent-black opacity-50 pointer-events-none absolute left-0 top-0 h-full w-full group-hover:bg-gradient-black opacity-100 transition-opacity duration-300 ease-in-out group-hover:opacity-100"></div></div></div><div class="absolute bottom-0 left-0 w-full whitespace-normal px-8 pb-12.25 xl:pb-[57px]"><span class="mb-2 block text-h5">The Rayleigh criterion</span><div class="absolute bottom-7.5 left-8 xl:bottom-10"><div class="underline-yellow after:h-0.75 group-hover:after:w-full "><p class="font-medium opacity-0 transition-opacity ease-out-300 group-hover:opacity-100">Read more</p></div></div><div class="ease-in-out-300-all overflow-hidden rte-container max-h-0 group-hover:max-h-75"><div class="mb-8 whitespace-normal leading-normal"><p>The equation that determines just how small the features on a microchip can be.</p></div></div></div></a></div><div class="inline-block h-95 w-65 md:h-125 md:w-73.25"><a title="" target="" class="group relative mr-px block h-full max-w-full text-color-white" href="/en/technology/lithography-principles/light-and-lasers"><div class="h-full w-full "><div class="relative h-full w-full"><img alt="asml lab" width="1920" height="1280" sizes="(max-width: 768px) 507px, 667px" class="h-full w-full object-cover object-center md:h-125" title="asml lab" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/47099-asml-lab.jpg?mw=507 507w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/47099-asml-lab.jpg?mw=667 667w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/47099-asml-lab.jpg?h=1280&iar=0&w=1920"/><div class="bg-gradient-transparent-black opacity-50 pointer-events-none absolute left-0 top-0 h-full w-full group-hover:bg-gradient-black opacity-100 transition-opacity duration-300 ease-in-out group-hover:opacity-100"></div></div></div><div class="absolute bottom-0 left-0 w-full whitespace-normal px-8 pb-12.25 xl:pb-[57px]"><span class="mb-2 block text-h5">Light & lasers</span><div class="absolute bottom-7.5 left-8 xl:bottom-10"><div class="underline-yellow after:h-0.75 group-hover:after:w-full "><p class="font-medium opacity-0 transition-opacity ease-out-300 group-hover:opacity-100">Read more</p></div></div><div class="ease-in-out-300-all overflow-hidden rte-container max-h-0 group-hover:max-h-75"><div class="mb-8 whitespace-normal leading-normal"><p>Our lithography machines keep innovation in light and lasers moving forward.</p></div></div></div></a></div><div class="inline-block h-95 w-65 md:h-125 md:w-73.25"><a title="" target="" class="group relative mr-px block h-full max-w-full text-color-white" href="/en/technology/lithography-principles/lenses-and-mirrors"><div class="h-full w-full "><div class="relative h-full w-full"><img alt="duv lens element" width="1920" height="1280" sizes="(max-width: 768px) 507px, 667px" class="h-full w-full object-cover object-center md:h-125" title="duv lens element" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/duv-lens-element.jpg?mw=507 507w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/duv-lens-element.jpg?mw=667 667w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/duv-lens-element.jpg?h=1280&iar=0&w=1920"/><div class="bg-gradient-transparent-black opacity-50 pointer-events-none absolute left-0 top-0 h-full w-full group-hover:bg-gradient-black opacity-100 transition-opacity duration-300 ease-in-out group-hover:opacity-100"></div></div></div><div class="absolute bottom-0 left-0 w-full whitespace-normal px-8 pb-12.25 xl:pb-[57px]"><span class="mb-2 block text-h5">Lenses & mirrors</span><div class="absolute bottom-7.5 left-8 xl:bottom-10"><div class="underline-yellow after:h-0.75 group-hover:after:w-full "><p class="font-medium opacity-0 transition-opacity ease-out-300 group-hover:opacity-100">Read more</p></div></div><div class="ease-in-out-300-all overflow-hidden rte-container max-h-0 group-hover:max-h-75"><div class="mb-8 whitespace-normal leading-normal"><p>Learn about the role of lenses and mirrors in ASML’s lithography machines.</p></div></div></div></a></div><div class="inline-block h-95 w-65 md:h-125 md:w-73.25"><a title="" target="" class="group relative mr-px block h-full max-w-full text-color-white" href="/en/technology/lithography-principles/mechanics-and-mechatronics"><div class="h-full w-full "><div class="relative h-full w-full"><img alt="Inside NXE3400 - The wafer handler bringing a wafer into the machine" width="1920" height="1080" sizes="(max-width: 768px) 507px, 667px" class="h-full w-full object-cover object-center md:h-125" title="Inside NXE3400 - The wafer handler bringing a wafer into the machine" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/inside-nxe3400---the-wafer-handler-bringing-a-wafer-into-the-machine_43682.jpg?mw=507 507w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/inside-nxe3400---the-wafer-handler-bringing-a-wafer-into-the-machine_43682.jpg?mw=667 667w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/inside-nxe3400---the-wafer-handler-bringing-a-wafer-into-the-machine_43682.jpg?h=1080&iar=0&w=1920"/><div class="bg-gradient-transparent-black opacity-50 pointer-events-none absolute left-0 top-0 h-full w-full group-hover:bg-gradient-black opacity-100 transition-opacity duration-300 ease-in-out group-hover:opacity-100"></div></div></div><div class="absolute bottom-0 left-0 w-full whitespace-normal px-8 pb-12.25 xl:pb-[57px]"><span class="mb-2 block text-h5">Mechanics and mechatronics</span><div class="absolute bottom-7.5 left-8 xl:bottom-10"><div class="underline-yellow after:h-0.75 group-hover:after:w-full "><p class="font-medium opacity-0 transition-opacity ease-out-300 group-hover:opacity-100">Read more</p></div></div><div class="ease-in-out-300-all overflow-hidden rte-container max-h-0 group-hover:max-h-75"><div class="mb-8 whitespace-normal leading-normal"><p>Speed and precision meet in ASML’s advanced lithography machines.</p></div></div></div></a></div><div class="inline-block h-95 w-65 md:h-125 md:w-73.25"><a title="" target="" class="group relative mr-px block h-full max-w-full text-color-white" href="/en/technology/lithography-principles/pushing-k1-further"><div class="h-full w-full "><div class="relative h-full w-full"><img alt="wafer and DUV reticle mask" width="1920" height="1238" sizes="(max-width: 768px) 507px, 667px" class="h-full w-full object-cover object-center md:h-125" title="wafer and DUV reticle mask" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-elements/47147-wafer-and-duv-reticle-mask.jpg?mw=507 507w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-elements/47147-wafer-and-duv-reticle-mask.jpg?mw=667 667w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-elements/47147-wafer-and-duv-reticle-mask.jpg?h=1238&iar=0&w=1920"/><div class="bg-gradient-transparent-black opacity-50 pointer-events-none absolute left-0 top-0 h-full w-full group-hover:bg-gradient-black opacity-100 transition-opacity duration-300 ease-in-out group-hover:opacity-100"></div></div></div><div class="absolute bottom-0 left-0 w-full whitespace-normal px-8 pb-12.25 xl:pb-[57px]"><span class="mb-2 block text-h5">Pushing 1k further</span><div class="absolute bottom-7.5 left-8 xl:bottom-10"><div class="underline-yellow after:h-0.75 group-hover:after:w-full "><p class="font-medium opacity-0 transition-opacity ease-out-300 group-hover:opacity-100">Read more</p></div></div><div class="ease-in-out-300-all overflow-hidden rte-container max-h-0 group-hover:max-h-75"><div class="mb-8 whitespace-normal leading-normal"><p>ASML is pushing fundamental physical concepts to their absolute limit.</p></div></div></div></a></div></div></div></div></div><div class="component col-span-12 bg-color-primary bg-dark no-pb custom-container rte-container fluid-grid"><div class="component col-span-12 mb-2 md:col-start-3 md:col-span-7 lg:col-span-5 lg:col-start-3 custom-rich-text "><div><h4>More about ASML technology</h4></div></div></div><div class="component custom-container--respy content-cards col-span-12 bg-color-primary bg-dark no-pt"><div class="content-cards-wrapper"><div class="content-card "><img alt="EUV lithography systems" width="1920" height="1080" sizes="(max-width: 99px) 100px, 320px" class="content-card-image" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/products/euv-lithography-systems/twinscan-nxe3400c.png?mw=100 100w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/products/euv-lithography-systems/twinscan-nxe3400c.png?mw=320 320w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/products/euv-lithography-systems/twinscan-nxe3400c.png?h=1080&iar=0&w=1920"/><span class="content-card-title">EUV lithography systems</span><div class="content-card-text rte-container break-words"><p>Providing highest resolution in high-volume manufacturing, ASML’s extreme ultraviolet lithography machines are pushing Moore’s Law forward.</p></div></div><div class="content-card "><img alt="DUV lithography systems" width="1920" height="1080" sizes="(max-width: 99px) 100px, 320px" class="content-card-image" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/products/duv-lithography-systems/twinscan-nxt2000i.png?mw=100 100w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/products/duv-lithography-systems/twinscan-nxt2000i.png?mw=320 320w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/products/duv-lithography-systems/twinscan-nxt2000i.png?h=1080&iar=0&w=1920"/><span class="content-card-title">DUV lithography systems</span><div class="content-card-text rte-container break-words"><p>ASML's deep ultraviolet (DUV) lithography systems dive deep into the UV spectrum to print the tiny features that form the basis of the microchip.</p></div></div><div class="content-card "><img alt="Metrology & inspection systems" width="1920" height="1080" sizes="(max-width: 99px) 100px, 320px" class="content-card-image" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?mw=100 100w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?mw=320 320w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?h=1080&iar=0&w=1920"/><span class="content-card-title">Metrology & inspection systems</span><div class="content-card-text rte-container break-words"><p>Delivering speed and accuracy, our metrology and inspection portfolio covers every step manufacturing processes, from R&D to mass production.</p></div></div><div class="content-card "><img alt="Computational lithography" width="1920" height="1280" sizes="(max-width: 99px) 100px, 320px" class="content-card-image" srcSet="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-elements/47149-lithography-elements-wafer-reticle.jpg?mw=100 100w, https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-elements/47149-lithography-elements-wafer-reticle.jpg?mw=320 320w" src="https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-elements/47149-lithography-elements-wafer-reticle.jpg?h=1280&iar=0&w=1920"/><span class="content-card-title">Computational lithography</span><div class="content-card-text rte-container break-words"><p>ASML's industry-leading computational lithography products enable accurate lithography simulations that help to improve chip yield and quality.</p></div></div></div></div></div></main><footer class="footer-bg--medium relative block w-full"><div id="footer" class="grid grid-cols-12"><div class="component breadcrumbs--footer "><nav><ol><li><a title="Home" class="breadcrumb-item" href="/en">Home</a></li><li><a title="Technology" class="breadcrumb-item" href="/en/technology">Technology</a></li><li><a title="Lithography principles" class="breadcrumb-item" href="/en/technology/lithography-principles">Lithography principles</a></li><li><a title="Measuring accuracy" class="breadcrumb-item" href="/en/technology/lithography-principles/measuring-accuracy">Measuring accuracy</a></li></ol></nav></div><div class="component col-span-12 px-1 custom-container rte-container fluid-grid"><div class="component link-list--default col-span-12 md:col-span-4 md:col-start-3 lg:col-span-2 lg:col-start-3"><span class="link-list-title">Learn</span><div class="link-list-items-container"><a title="ASML at a glance" target="" class="link-list-item" 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Design":null,"Subtitle":{"value":""},"Summary":{"value":"ASML systems use sensor data, diffraction and electron beams to optimize chip production."},"Image":{"value":{"src":"https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?h=1080\u0026iar=0\u0026w=1920","alt":"NXE3400 metrology","width":"1920","height":"1080"}},"Title":{"value":"Measuring accuracy"},"invertColor":{"value":false},"hideFooter":{"value":false},"metaDescription":{"value":"ASML systems rely on data from sensors as well as diffraction-based and electron beam measurements to optimize chip production."},"metaPageTitle":{"value":"Measuring accuracy - Lithography principles | ASML"},"pageImage":{"value":{"src":"https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?h=1080\u0026iar=0\u0026w=1920","alt":"NXE3400 metrology","width":"1920","height":"1080"}},"ogDescription":{"value":"ASML systems rely on data from sensors as well as diffraction-based and electron beam measurements to optimize chip production."},"ogTitle":{"value":"How to measure the quality of a microchip"},"ogImage":{"value":{"src":"https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?h=1080\u0026iar=0\u0026w=1920","alt":"NXE3400 metrology","width":"1920","height":"1080"}},"noFollow":{"value":false},"noIndex":{"value":false},"twitterTitle":{"value":"How to measure the quality of a microchip"},"twitterDescription":{"value":"ASML systems rely on data from sensors as well as diffraction-based and electron beam measurements to optimize chip production."},"twitterImage":{"value":{}},"canonicalUrl":{"value":{"href":""}},"EnableSocialSharingForChildren":{"value":true},"searchKeywords":{"value":""},"includeInSearchResults":{"value":true},"ExpirationDateTime":{"value":"0001-01-01T00:00:00Z"},"ValidFromDateTime":{"value":"0001-01-01T00:00:00Z"},"AccessKey":{"value":""},"IsSecured":{"value":false}},"databaseName":"master","deviceId":"fe5d7fdf-89c0-4d99-9aa3-b5fbd009c9f3","itemId":"3675bbf0-e087-496f-b5e2-70623d062a61","itemLanguage":"en","itemVersion":1,"layoutId":"98c5f7f0-bf53-4b19-b772-da52160a4174","templateId":"b9a587f6-542a-4188-bb2c-a51bab17f8b4","templateName":"Generic Page","placeholders":{"headless-header":[{"uid":"23d92a72-cfe2-4421-9d24-6de0d84673e3","componentName":"PartialDesignDynamicPlaceholder","dataSource":"","params":{"sid":"{23D92A72-CFE2-4421-9D24-6DE0D84673E3}","ph":"headless-header","sig":"sxa-header"},"placeholders":{"sxa-header":[{"uid":"a1c14581-c11b-4dc7-ab4d-09768c65a276","componentName":"MainHeader","dataSource":"/sitecore/content/asmlcom/asmlcom/Presentation/Partial Designs/Header/Data/Main Header","params":{"CacheClearingBehavior":"Clear on publish"},"fields":{"data":{"datasource":{"homeLink":{"data":{"value":{"text":"ASML Homepage","anchor":"","linktype":"internal","class":"","title":"","target":"","querystring":"","id":"{622E7D53-2A93-4503-890B-BF503CECD06A}","href":"/en/"}}},"savedJobsBtn":{"data":{"value":{"class":"","id":"{1C4138D0-1382-4E22-B07A-3D30BBB89FA3}","querystring":"","anchor":"","target":"","title":"","linktype":"internal","text":"Saved jobs","url":"/asmlcom/asmlcom/Home/careers/Saved Jobs","href":"/en/careers/saved-jobs"}}}},"contextItem":{"invertColor":{"data":{"value":false}}}}},"placeholders":{"main-navigation-items":[{"uid":"eb7cacba-7b32-4bdf-8961-f15cc43d83fe","componentName":"MenuItem","dataSource":"6a594f02-f575-430c-9aba-418e223fac23","params":{"CacheClearingBehavior":"Clear on publish","GridParameters":"col-span-12","DynamicPlaceholderId":"1","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Company","anchor":"","linktype":"internal","class":"","title":"Company","target":"","querystring":"","id":"{12FB62EA-36E7-4805-99DB-0D9B1E0974A4}","href":"/en/company"}}},"placeholders":{"sub-navigation-items":[{"uid":"b883dbd5-1e58-4636-9616-fd0972e643e5","componentName":"MenuItem","dataSource":"7487aa2c-4117-4307-80f1-ee63df162431","params":{"CacheClearingBehavior":"Clear on publish","GridParameters":"col-span-12","DynamicPlaceholderId":"4","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Company overview","anchor":"","linktype":"internal","class":"","title":"Company overview","target":"","querystring":"","id":"{12FB62EA-36E7-4805-99DB-0D9B1E0974A4}","href":"/en/company"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"3f3f583c-9956-4b09-a55c-e812956427cd","componentName":"MenuItem","dataSource":"2c377b41-a567-42df-b0c2-58fe05c078ae","params":{"GridParameters":"col-span-12","FieldNames":"Default","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"14"},"fields":{"link":{"value":{"text":"About ASML","anchor":"","linktype":"internal","class":"","title":"About ASML","target":"","querystring":"","id":"{ADC5EF6E-57A4-46A8-B08A-B6CEC7A8F550}","href":"/en/company/about-asml"}}},"placeholders":{"sub-navigation-items":[{"uid":"1d320afd-1b33-4f0d-8f5b-eaa7d031f4e5","componentName":"MenuItem","dataSource":"eed2c5f0-1db5-494e-94e4-30693a5b0734","params":{"GridParameters":"col-span-12","FieldNames":"Default","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"15"},"fields":{"link":{"value":{"text":"About ASML overview","anchor":"","linktype":"internal","class":"","title":"About ASML overview","target":"","querystring":"","id":"{ADC5EF6E-57A4-46A8-B08A-B6CEC7A8F550}","href":"/en/company/about-asml"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"25aa0c83-ea87-44e2-80b4-779c78e54ffc","componentName":"MenuItem","dataSource":"5c423310-fd91-4bde-8370-7c467be268e3","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"25","FieldNames":"Default"},"fields":{"link":{"value":{"text":"ASML at a glance","anchor":"","linktype":"internal","class":"","title":"ASML at a glance","target":"","querystring":"","id":"{AC94EE61-87D1-49CE-AE57-A2C38CBADBFF}","href":"/en/company/about-asml/asml-at-a-glance"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"58f76feb-66d0-4708-a2d1-630f9f2446ea","componentName":"MenuItem","dataSource":"b6122621-b3c6-48eb-8f29-5c866d750c82","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"26","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Vision \u0026 mission","anchor":"","linktype":"internal","class":"","title":"Vision \u0026 mission","target":"","querystring":"","id":"{D588C35C-1E27-47E2-8836-5A7F61134647}","href":"/en/company/about-asml/vision-and-mission"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"13c668e4-446b-43ca-a9b9-a6b4b22358fe","componentName":"MenuItem","dataSource":"d6ce3086-b7b9-4ef3-bc7e-f48bf980b4ee","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"27","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Organization","anchor":"","linktype":"internal","class":"","title":"Organization","target":"","querystring":"","id":"{7ACB9FCA-B03F-4F54-A3BA-9FA634CD6091}","href":"/en/company/about-asml/organization"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"1631b7a5-c401-4e13-9c63-0dfbdf524617","componentName":"MenuItem","dataSource":"de32bbff-9f38-419f-a9ab-248255ec9bf1","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"28","FieldNames":"Default"},"fields":{"link":{"value":{"text":"History","anchor":"","linktype":"internal","class":"","title":"History","target":"","querystring":"","id":"{C4BDD45F-37D2-4C30-8465-F804B4F00779}","href":"/en/company/about-asml/history"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"4b5df49a-6394-468b-acdd-d5825fd7a2bf","componentName":"MenuItem","dataSource":"d14fdc7f-246a-454b-962c-337632ec70ab","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"29","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Locations","anchor":"","linktype":"internal","class":"","title":"Locations","target":"","querystring":"","id":"{C64D829A-7395-4052-B8AD-0C67F9B1D188}","href":"/en/company/about-asml/locations"}}},"placeholders":{"sub-navigation-items":[]}}]}},{"uid":"4e66c0c9-691a-4e60-870a-44b5917e2c31","componentName":"MenuItem","dataSource":"0836d38f-109c-4e64-b743-b27cbdad2f7d","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"22","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Governance","anchor":"","linktype":"internal","class":"","title":"Governance","target":"","querystring":"","id":"{887A9559-5786-42EF-AF42-190E2576BB59}","href":"/en/company/governance"}}},"placeholders":{"sub-navigation-items":[{"uid":"65fa62b9-deab-445e-8813-39bf7d2325c0","componentName":"MenuItem","dataSource":"98dc8048-fa1f-4f07-acfb-8b20e797f675","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"30","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Governance overview","anchor":"","linktype":"internal","class":"","title":"Governance overview","target":"","querystring":"","id":"{887A9559-5786-42EF-AF42-190E2576BB59}","href":"/en/company/governance"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"3f0db825-e077-402a-9091-38d3db7df783","componentName":"MenuItem","dataSource":"2436a4c7-4637-432b-9ae0-c35e3eb11825","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"31","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Board of Management","anchor":"","linktype":"internal","class":"","title":"Board of Management","target":"","querystring":"","id":"{9DAFAE34-950E-451C-9863-FB1BD45C33D7}","href":"/en/company/governance/board-of-management"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"536d8d66-1cef-4068-8911-56a62444dae2","componentName":"MenuItem","dataSource":"c7dd1b9e-ae7b-470f-8f95-dc0f0287b9ad","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"32","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Supervisory Board","anchor":"","linktype":"internal","class":"","title":"Supervisory Board","target":"","querystring":"","id":"{D6127F20-8FA0-407D-AB4F-CEB1D7EA528C}","href":"/en/company/governance/supervisory-board"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"7ea3ca93-c178-4e63-bad4-a4d59172cf78","componentName":"MenuItem","dataSource":"3f6c1ef1-d7a7-4442-9daa-357e963e314c","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"33","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Shareholders","anchor":"","linktype":"internal","class":"","title":"Shareholders","target":"","querystring":"","id":"{BDCC1A6E-5B8C-410C-912B-0C732E178A62}","href":"/en/company/governance/shareholders"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"605e820f-2cfd-45c0-b0ab-364dbe56b238","componentName":"MenuItem","dataSource":"4e6000ec-8ec0-49d6-9b6f-a2cb2d086481","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"34","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Code of Conduct","anchor":"","linktype":"internal","class":"","title":"Code of Conduct","target":"","querystring":"","id":"{BD639469-531E-497C-A09C-858D0D200518}","href":"/en/company/governance/code-of-conduct"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"58748a69-795c-47ed-b450-70a2da52ecab","componentName":"MenuItem","dataSource":"403be5f3-c61e-44aa-92c1-1c99d1bfa0e0","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"35","FieldNames":"Default"},"fields":{"link":{"value":{"text":"How we manage risk","anchor":"","linktype":"internal","class":"","title":"How we manage risk","target":"","querystring":"","id":"{5B2C6A6C-6EF6-4677-86F2-7817D3D287CE}","href":"/en/company/governance/risk"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"98934b47-de2a-4a10-a965-630820e663f8","componentName":"MenuItem","dataSource":"d8324e7a-9d13-4dfa-a367-f09dfccc2261","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"36","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Auditors","anchor":"","linktype":"internal","class":"","title":"Auditors","target":"","querystring":"","id":"{8FCCC421-242A-44D0-9766-826A7D2FFA18}","href":"/en/company/governance/auditors"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"16bb00c5-7416-4801-b778-9ed39d43c103","componentName":"MenuItem","dataSource":"faca3c49-6fdd-4724-8bf3-4c01ce7045b5","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"37","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Governance downloads","anchor":"","linktype":"internal","class":"","title":"Governance downloads","target":"","querystring":"","id":"{087E69D0-B20F-4745-9658-D9EAACFB6945}","href":"/en/company/governance/governance-downloads"}}},"placeholders":{"sub-navigation-items":[]}}]}},{"uid":"0c14400c-1565-41ea-968d-20ef9f9ef27a","componentName":"MenuItem","dataSource":"957ac9da-c650-477d-bcbd-c7297e34cafc","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"23","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Sustainability","anchor":"","linktype":"internal","class":"","title":"Sustainability","target":"","querystring":"","id":"{0665865A-2730-4031-95F9-8FCA24770918}","href":"/en/company/sustainability"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"2ebc10df-e000-48f8-9605-cf34a0820b83","componentName":"MenuItem","dataSource":"ce96736f-94e2-4005-8afa-df98fc95f4a0","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"24","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Community engagement","anchor":"","linktype":"internal","class":"","title":"Community engagement","target":"","querystring":"","id":"{DC22F33D-A2A5-44E1-BFF8-C0C86806FE67}","href":"/en/company/community-engagement"}}},"placeholders":{"sub-navigation-items":[]}}]}},{"uid":"2fa1ec9e-19f1-4f04-93f6-c4bb5cc91f08","componentName":"MenuItem","dataSource":"0343716f-37f2-4080-9e79-967f65cd5ec1","params":{"CacheClearingBehavior":"Clear on publish","GridParameters":"col-span-12","DynamicPlaceholderId":"2","FieldNames":"Default"},"fields":{"link":{"value":{"class":"","id":"b2d4499f-dd27-4c7f-b78e-badd651ad9c6","querystring":"","anchor":"","target":"","title":"Careers","linktype":"internal","text":"Careers","url":"/asmlcom/asmlcom/Home/careers","href":"/en/careers"}}},"placeholders":{"sub-navigation-items":[{"uid":"43a2026f-66aa-4949-b457-3ecf970f0edb","componentName":"MenuItem","dataSource":"47f23b90-f93b-4c3b-8a0b-32cee9d80b29","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"10","FieldNames":"Default"},"fields":{"link":{"value":{"class":"","id":"b2d4499f-dd27-4c7f-b78e-badd651ad9c6","querystring":"","anchor":"","target":"","title":"Careers overview","linktype":"internal","text":"Careers overview","url":"/asmlcom/asmlcom/Home/careers","href":"/en/careers"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"c81e6c7b-1da1-4841-b610-63c65e52519d","componentName":"MenuItem","dataSource":"635a5596-8c05-472a-b0b4-a466541b2371","params":{"GridParameters":"col-span-12","FieldNames":"Default","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"13"},"fields":{"link":{"value":{"class":"","id":"2188a6a6-fa98-476c-b698-e3ac66eb1151","querystring":"","anchor":"","target":"","title":"Search jobs","linktype":"internal","text":"Search jobs","url":"/asmlcom/asmlcom/Home/careers/Find Your Job","href":"/en/careers/find-your-job"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"b12ec5cb-2adb-4fca-951c-6c571b70b128","componentName":"MenuItem","dataSource":"1d6e922c-bd96-49b3-ae86-e6528d86ccfb","params":{"GridParameters":"col-span-12","FieldNames":"Default","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"16"},"fields":{"link":{"value":{"class":"","id":"03eb44bb-29ea-4305-a1db-48f7cc6c768d","querystring":"","anchor":"","target":"","title":"Interviewing at ASML","linktype":"internal","text":"Interviewing at ASML","url":"/asmlcom/asmlcom/Home/careers/interview tips","href":"/en/careers/interview-tips"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"22a6e194-2a06-462c-b1bf-dc0aff3632a5","componentName":"MenuItem","dataSource":"4b20f481-6311-4bb3-90be-48d60f3477da","params":{"GridParameters":"col-span-12","FieldNames":"Default","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"17"},"fields":{"link":{"value":{"class":"","id":"27cd6edb-ca7f-4f89-831e-f163b9a95fa1","querystring":"","anchor":"","target":"","title":"Working at ASML","linktype":"internal","text":"Working at ASML","url":"/asmlcom/asmlcom/Home/careers/working at asml","href":"/en/careers/working-at-asml"}}},"placeholders":{"sub-navigation-items":[{"uid":"1f147a80-ad00-4e06-9ba5-72a8a5100c59","componentName":"MenuItem","dataSource":"cbc5e911-3c6c-4859-8329-9244c42aec5e","params":{"GridParameters":"col-span-12","FieldNames":"Default","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"18"},"fields":{"link":{"value":{"class":"","id":"27cd6edb-ca7f-4f89-831e-f163b9a95fa1","querystring":"","anchor":"","target":"","title":"Working at ASML overview","linktype":"internal","text":"Working at ASML overview","url":"/asmlcom/asmlcom/Home/careers/working at asml","href":"/en/careers/working-at-asml"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"f29b8993-341a-4e62-a0b3-cdba18a21041","componentName":"MenuItem","dataSource":"d4c86e4d-88a3-4997-895b-05821a5fa084","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"56","FieldNames":"Default"},"fields":{"link":{"value":{"class":"","id":"036e81f5-b77c-4716-8da9-4a9209b97164","querystring":"","anchor":"","target":"","title":"The Netherlands","linktype":"internal","text":"The Netherlands","url":"/asmlcom/asmlcom/Home/careers/working at asml/Netherlands","href":"/en/careers/working-at-asml/netherlands"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"14a1a620-1ec8-40ca-83ac-8ce31a86ea8e","componentName":"MenuItem","dataSource":"49850c3f-58ba-4c08-8ee6-62bebec41126","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"55","FieldNames":"Default"},"fields":{"link":{"value":{"class":"","id":"76ad0ac8-f213-42c5-879a-60ea0e59df58","querystring":"","anchor":"","target":"","title":"United States","linktype":"internal","text":"United States","url":"/asmlcom/asmlcom/Home/careers/working at asml/united states","href":"/en/careers/working-at-asml/united-states"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"431467f8-f678-4958-b94e-70a1015728c6","componentName":"MenuItem","dataSource":"2fcafc23-efba-4626-b558-a62aeecd48bc","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"57","FieldNames":"Default"},"fields":{"link":{"value":{"class":"","id":"9450bfcc-8c07-4093-8761-874dea13a067","querystring":"","anchor":"","target":"","title":"Taiwan","linktype":"internal","text":"Taiwan","url":"/asmlcom/asmlcom/Home/careers/working at asml/Taiwan","href":"/en/careers/working-at-asml/taiwan"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"03549e6b-a2eb-433c-b616-52cdf540856b","componentName":"MenuItem","dataSource":"afc41880-3d24-47b5-bd2a-03cae08d96a5","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"58","FieldNames":"Default"},"fields":{"link":{"value":{"class":"","id":"3a0c2512-96b8-4032-8a68-4ec97649e865","querystring":"","anchor":"","target":"","title":"South Korea","linktype":"internal","text":"South Korea","url":"/asmlcom/asmlcom/Home/careers/working at asml/South Korea","href":"/en/careers/working-at-asml/south-korea"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"54651e4e-cf6c-4a03-99ad-b763884b3140","componentName":"MenuItem","dataSource":"0537022a-306f-4f86-854d-9bde4b0f76a3","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"59","FieldNames":"Default"},"fields":{"link":{"value":{"class":"","id":"f6245b81-f272-42fa-838c-5525872b33b3","querystring":"","anchor":"","target":"","title":"China","linktype":"internal","text":"China","url":"/asmlcom/asmlcom/Home/careers/working at asml/china","href":"/en/careers/working-at-asml/china"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"b6082c0c-7a24-44fc-80cb-9d06519698db","componentName":"MenuItem","dataSource":"cc5f406d-cc7f-4527-9c70-5d2b5c76ec53","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"60","FieldNames":"Default"},"fields":{"link":{"value":{"class":"","id":"4889e954-55f3-4ed0-994b-2e9b81c8d779","querystring":"","anchor":"","target":"","title":"Japan","linktype":"internal","text":"Japan","url":"/asmlcom/asmlcom/Home/careers/working at asml/japan","href":"/en/careers/working-at-asml/japan"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"e37dd33b-e315-4d8a-b19d-b4709358e11d","componentName":"MenuItem","dataSource":"6184b575-7eda-4e5f-a61b-831c117a772a","params":{"GridParameters":"col-span-12","DynamicPlaceholderId":"117","FieldNames":"Default"},"fields":{"link":{"value":{"linktype":"internal","id":"a1e0042c-77b1-430b-a379-89756c80929a","anchor":"","querystring":"","target":"","class":"","text":"Germany","title":"Germany","href":"/en/careers/working-at-asml/germany"}}},"placeholders":{"sub-navigation-items":[]}}]}},{"uid":"a3d82ff1-d134-4cbd-ae64-25bb730a0045","componentName":"MenuItem","dataSource":"703c3755-f357-4b4c-a509-8e309f36693a","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"47","FieldNames":"Default"},"fields":{"link":{"value":{"class":"","id":"da7a826c-894c-4f1f-aa58-3d3c3151a3e4","querystring":"","anchor":"","target":"","title":"Technical fields","linktype":"internal","text":"Technical fields","url":"/asmlcom/asmlcom/Home/careers/technical fields","href":"/en/careers/technical-fields"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"5456a97c-9255-47d4-9780-edd3c5a45424","componentName":"MenuItem","dataSource":"1978e7da-37a4-49e5-bef7-cd8d9cdc8ab0","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"48","FieldNames":"Default"},"fields":{"link":{"value":{"class":"","id":"1540111b-edee-4f33-bec9-0448cb5368c0","querystring":"","anchor":"","target":"","title":"Teams","linktype":"internal","text":"Teams","url":"/asmlcom/asmlcom/Home/careers/teams","href":"/en/careers/teams"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"0429f155-2e51-4151-944f-1260d9c0fb9a","componentName":"MenuItem","dataSource":"b551fc16-b104-447c-bba7-d3c320d4cc63","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"49","FieldNames":"Default"},"fields":{"link":{"value":{"class":"","querystring":"","id":"74ea6119-8e82-49a7-bf3c-c417e0e38141","anchor":"","target":"","title":"Students \u0026 graduates","linktype":"internal","text":"Students \u0026 graduates","url":"/asmlcom/asmlcom/Home/careers/students new graduates","href":"/en/careers/students-new-graduates"}}},"placeholders":{"sub-navigation-items":[{"uid":"9299f5ed-e034-493e-b001-734b50f63818","componentName":"MenuItem","dataSource":"0734305e-ce8b-4ceb-84ba-1c2f499a8eea","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"51","FieldNames":"Default"},"fields":{"link":{"value":{"class":"","querystring":"","id":"74ea6119-8e82-49a7-bf3c-c417e0e38141","anchor":"","target":"","title":"Students \u0026 graduates overview","linktype":"internal","text":"Students \u0026 graduates overview","url":"/asmlcom/asmlcom/Home/careers/students new graduates","href":"/en/careers/students-new-graduates"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"94bf4471-767b-4802-b8fc-72fc7e1e68c4","componentName":"MenuItem","dataSource":"bb8aac88-e504-428c-af56-a0bb6f9913b6","params":{"GridParameters":"col-span-12","DynamicPlaceholderId":"114","FieldNames":"Default"},"fields":{"link":{"value":{"linktype":"internal","id":"6eba8197-87e3-4179-8666-61636f68b97f","anchor":"","querystring":"","target":"","class":"","text":"Early careers","title":"","href":"/en/careers/students-new-graduates/programs-for-graduates/early-career-programs"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"ab9b658c-3886-496e-9456-913aa81487d2","componentName":"LinkList","dataSource":"draftid-1715764289636","params":{"GridParameters":"col-span-12","FieldNames":"Default"},"fields":{"data":{"datasource":null}}},{"uid":"299d996d-0ab9-494a-a109-ec104e5de6a6","componentName":"MenuItem","dataSource":"d584d000-9564-47e3-adef-33f55866077d","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"52","FieldNames":"Default"},"fields":{"link":{"value":{"class":"","querystring":"","id":"ea3731a5-55b1-4162-a6e8-b73e73baeecd","anchor":"","target":"","title":"","linktype":"internal","text":"The Netherlands","url":"/asmlcom/asmlcom/Home/careers/students new graduates/Netherlands","href":"/en/careers/students-new-graduates/netherlands"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"d9516b49-7293-432a-9c3b-87aea6693ae4","componentName":"MenuItem","dataSource":"3472c042-a2b3-4be7-b6c0-7d07b7632063","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"53","FieldNames":"Default"},"fields":{"link":{"value":{"class":"","querystring":"","id":"caf362b7-d89d-4574-b573-62643d58e511","anchor":"","target":"","title":"","linktype":"internal","text":"United States","url":"/asmlcom/asmlcom/Home/careers/students new graduates/us","href":"/en/careers/students-new-graduates/us"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"8c07186a-2d74-435e-af5c-7385f83a33f3","componentName":"MenuItem","dataSource":"1a2c8b7a-27f0-4dbf-84e8-4a1b38f52d98","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"54","FieldNames":"Default"},"fields":{"link":{"value":{"class":"","querystring":"","id":"e19c2360-9390-47dc-9ce1-f89b1f6ed3f8","anchor":"","target":"","title":"","linktype":"internal","text":"Taiwan","url":"/asmlcom/asmlcom/Home/careers/students new graduates/taiwan","href":"/en/careers/students-new-graduates/taiwan"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"d1cc5bdb-364b-44ba-8f16-dc47ecf14da3","componentName":"MenuItem","dataSource":"1e46114c-c67a-4439-aa28-5fdc690cafea","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"111","FieldNames":"Default"},"fields":{"link":{"value":{"class":"","querystring":"","id":"82a79524-04ef-49f5-9979-0cc95948b4ac","anchor":"","target":"","title":"","linktype":"internal","text":"South Korea","url":"/asmlcom/asmlcom/Home/careers/students new graduates/South Korea","href":"/en/careers/students-new-graduates/south-korea"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"d45afeed-d4c5-491c-b6ea-6f2c06f41467","componentName":"MenuItem","dataSource":"243c5972-f7eb-4503-b779-65c551ec74ff","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"112","FieldNames":"Default"},"fields":{"link":{"value":{"class":"","querystring":"","id":"0e8961cf-eab1-4548-b1e3-46f7d52a5eef","anchor":"","target":"","title":"","linktype":"internal","text":"China","url":"/asmlcom/asmlcom/Home/careers/students new graduates/China","href":"/en/careers/students-new-graduates/china"}}},"placeholders":{"sub-navigation-items":[]}}]}}]}},{"uid":"30397f94-16bd-4550-a3e3-69dd69f0ea02","componentName":"MenuItem","dataSource":"929c466c-73a3-4c74-82aa-ef92984fa3ad","params":{"CacheClearingBehavior":"Clear on publish","GridParameters":"col-span-12","DynamicPlaceholderId":"3","FieldNames":"Default"},"fields":{"link":{"value":{"linktype":"internal","id":"c44c4f02-b75d-43ab-a2f0-a85b119c6e64","anchor":"","querystring":"","target":"","class":"","text":"Technology","title":"","href":"/en/technology"}}},"placeholders":{"sub-navigation-items":[{"uid":"e43d0f50-ee03-4412-a738-a86b72059ede","componentName":"MenuItem","dataSource":"a2fa8921-81a4-4ea4-8229-23cc2c80a89d","params":{"CacheClearingBehavior":"Clear on publish","GridParameters":"col-span-12","DynamicPlaceholderId":"5","FieldNames":"Default"},"fields":{"link":{"value":{"linktype":"internal","id":"c44c4f02-b75d-43ab-a2f0-a85b119c6e64","anchor":"","querystring":"","target":"","class":"","text":"Technology overview","title":"","href":"/en/technology"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"caa05317-7254-4356-9832-021dcc614ef8","componentName":"MenuItem","dataSource":"c0aa659f-1622-4f40-a75a-fcdeb247f542","params":{"CacheClearingBehavior":"Clear on publish","GridParameters":"col-span-12","DynamicPlaceholderId":"6","FieldNames":"Default"},"fields":{"link":{"value":{"linktype":"internal","id":"b1563541-93a6-44c9-bca8-04f5f3f65b84","anchor":"","querystring":"","target":"","class":"","text":"All about chips","title":"","href":"/en/technology/all-about-microchips"}}},"placeholders":{"sub-navigation-items":[{"uid":"c2cb9c63-f30e-4c57-9960-99dbb714ad92","componentName":"MenuItem","dataSource":"8b6d1007-ad95-4d95-aa51-cd4389cc879d","params":{"CacheClearingBehavior":"Clear on publish","GridParameters":"col-span-12","DynamicPlaceholderId":"7","FieldNames":"Default"},"fields":{"link":{"value":{"text":"All about chips overview","anchor":"","linktype":"internal","class":"","title":"All about chips overview","target":"","querystring":"","id":"{B1563541-93A6-44C9-BCA8-04F5F3F65B84}","href":"/en/technology/all-about-microchips"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"61108b1a-a208-413f-a523-d86b0a8d7c0b","componentName":"MenuItem","dataSource":"f4c1b75f-6638-4443-a785-cdc0fb96c6c7","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"41","FieldNames":"Default"},"fields":{"link":{"value":{"text":"The basics","anchor":"","linktype":"internal","class":"","title":"The basics","target":"","querystring":"","id":"{D192897A-A4D7-4A2E-98D4-5BE0893A107B}","href":"/en/technology/all-about-microchips/microchip-basics"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"bfe5475c-033a-44ef-a957-03e446129fc3","componentName":"MenuItem","dataSource":"24253145-5fc3-4e3c-ad25-e04e9c8c1096","params":{"GridParameters":"col-span-12","FieldNames":"Default","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"19"},"fields":{"link":{"value":{"text":"How microchips are made","anchor":"","linktype":"internal","class":"","title":"How microchips are made","target":"","querystring":"","id":"{406034A5-82BA-4D88-84D8-9C024F24EB83}","href":"/en/technology/all-about-microchips/how-microchips-are-made"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"f14c43f6-e069-419a-b9af-e22b4c0976e3","componentName":"MenuItem","dataSource":"c9216856-5e87-4b7c-b460-ded6876ee713","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"42","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Moore's Law","anchor":"","linktype":"internal","class":"","title":"Moore's Law","target":"","querystring":"","id":"{ACF951D7-F1AB-4A9D-9B32-6FFCBA1BDF71}","href":"/en/technology/all-about-microchips/moores-law"}}},"placeholders":{"sub-navigation-items":[]}}]}},{"uid":"0ec78c47-6520-4659-9e60-be40b1d6ce9b","componentName":"MenuItem","dataSource":"1fde510d-2605-4d97-bed3-732897cd6e25","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"38","FieldNames":"Default"},"fields":{"link":{"value":{"linktype":"internal","id":"8d739f03-09ae-4455-a8b2-6d335ba44789","anchor":"","querystring":"","target":"","class":"","text":"Lithography principles","title":"","href":"/en/technology/lithography-principles"}}},"placeholders":{"sub-navigation-items":[{"uid":"8487195d-b85c-4387-bb87-af774293418f","componentName":"MenuItem","dataSource":"bdf4eba3-e15a-479e-94aa-7dc95ad66aa5","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"43","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Lithography principles overview","anchor":"","linktype":"internal","class":"","title":"Lithography principles overview","target":"","querystring":"","id":"{8D739F03-09AE-4455-A8B2-6D335BA44789}","href":"/en/technology/lithography-principles"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"d4fadbf5-20b4-49e4-8251-3dea856f3982","componentName":"MenuItem","dataSource":"4d21ff9d-beba-4364-b4ad-283ae3c918bc","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"44","FieldNames":"Default"},"fields":{"link":{"value":{"text":"The Rayleigh criterion","anchor":"","linktype":"internal","class":"","title":"The Rayleigh criterion","target":"","querystring":"","id":"{7D5CB1F4-5F4B-40F4-A43D-A9CDA5B72B1D}","href":"/en/technology/lithography-principles/rayleigh-criterion"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"d7693fc3-17bc-4bf7-92c1-e7fdeeb536bd","componentName":"MenuItem","dataSource":"69cb54fb-cc2b-4279-993d-dd2a72145364","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"45","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Light \u0026 lasers","anchor":"","linktype":"internal","class":"","title":"Light \u0026 lasers","target":"","querystring":"","id":"{7FA7CFED-C648-4516-B65F-266C41806A40}","href":"/en/technology/lithography-principles/light-and-lasers"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"2f32f66f-e19f-4b62-aa08-7b7df94e0d17","componentName":"MenuItem","dataSource":"d5056f32-fe68-4116-98a7-2c2d6f43974c","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"46","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Lenses \u0026 mirrors","anchor":"","linktype":"internal","class":"","title":"Lenses \u0026 mirrors","target":"","querystring":"","id":"{2516D5CC-AB5F-4DB5-929D-DDBF8F6E30B1}","href":"/en/technology/lithography-principles/lenses-and-mirrors"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"68df1dbb-dba5-4046-ba4e-d06e04998c4e","componentName":"MenuItem","dataSource":"61fe4298-38ce-4a6f-bd40-9ce2409d0ca2","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"61","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Mechanics \u0026 mechatronics","anchor":"","linktype":"internal","class":"","title":"Mechanics \u0026 mechatronics","target":"","querystring":"","id":"{E01A6C2D-E4B5-4B94-861F-A64B87B8DBD6}","href":"/en/technology/lithography-principles/mechanics-and-mechatronics"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"677e4594-adb6-4195-8768-e9a386738b27","componentName":"MenuItem","dataSource":"6ce0496c-c87e-491e-bd34-21eeeeeffeff","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"63","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Measuring accuracy","anchor":"","linktype":"internal","class":"","title":"Measuring accuracy","target":"","querystring":"","id":"{3675BBF0-E087-496F-B5E2-70623D062A61}","href":"/en/technology/lithography-principles/measuring-accuracy"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"db86540b-4129-4ce8-847b-00987c3cbfdb","componentName":"MenuItem","dataSource":"f6b911a4-4956-4380-8658-78990681fb36","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"62","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Pushing k1 further","anchor":"","linktype":"internal","class":"","title":"Pushing k1 further","target":"","querystring":"","id":"{55815FB2-7F01-42CF-97E6-0AAC031710FB}","href":"/en/technology/lithography-principles/pushing-k1-further"}}},"placeholders":{"sub-navigation-items":[]}}]}},{"uid":"98f89df2-8654-4319-85d2-67e5fa77e000","componentName":"MenuItem","dataSource":"2e7e577e-8ec2-4cca-8ad2-819158e29ab2","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"39","FieldNames":"Default"},"fields":{"link":{"value":{"linktype":"internal","id":"e64e98ab-59c0-4278-a740-d54e25ecc868","anchor":"","querystring":"","target":"","class":"","text":"How we innovate","title":"","href":"/en/technology/how-we-innovate"}}},"placeholders":{"sub-navigation-items":[{"uid":"da802fd7-f348-4567-a859-9e3b55bbcbe0","componentName":"MenuItem","dataSource":"8884b70a-664c-4af5-b9ac-3fa066a4e27b","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"64","FieldNames":"Default"},"fields":{"link":{"value":{"text":"How we innovate overview","anchor":"","linktype":"internal","class":"","title":"How we innovate overview","target":"","querystring":"","id":"{E64E98AB-59C0-4278-A740-D54E25ECC868}","href":"/en/technology/how-we-innovate"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"a98bc5b2-96f3-4c13-ab38-dc4124e75772","componentName":"MenuItem","dataSource":"8313402f-4cf4-4332-bfc8-714973eb95fb","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"65","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Fellows","anchor":"","linktype":"internal","class":"","title":"Fellows","target":"","querystring":"","id":"{8DE80EB6-9D58-465F-ADD8-5ECA847B6ACA}","href":"/en/technology/how-we-innovate/fellows"}}},"placeholders":{"sub-navigation-items":[]}}]}},{"uid":"9b793f5a-1cef-40e5-a24f-cd49fbb10e2b","componentName":"MenuItem","dataSource":"885a7870-a97c-48ae-8f48-fbb6379c05e9","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"40","FieldNames":"Default"},"fields":{"link":{"value":{"linktype":"internal","id":"81a31519-d227-400b-94cd-ae5e5d70d3dc","anchor":"","querystring":"","target":"","class":"","text":"Software","title":"","href":"/en/technology/software"}}},"placeholders":{"sub-navigation-items":[]}}]}},{"uid":"dfb630f8-d97b-4440-bcdb-9fe305a71732","componentName":"MenuItem","dataSource":"47727e6d-092e-4aab-a0db-3ad36c6106c4","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"8","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Products","anchor":"","linktype":"internal","class":"","title":"Products","target":"","querystring":"","id":"{37755A48-C01C-40F6-9ED0-04C28C96EC48}","href":"/en/products"}}},"placeholders":{"sub-navigation-items":[{"uid":"465e158c-cb17-4826-9a26-ba2b39b7ac18","componentName":"MenuItem","dataSource":"fb9af851-9f4a-4895-9984-a1ac62f15891","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"9","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Products overview","anchor":"","linktype":"internal","class":"","title":"Products overview","target":"","querystring":"","id":"{37755A48-C01C-40F6-9ED0-04C28C96EC48}","href":"/en/products"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"661d42df-7382-4fe5-b5f0-e546f1c0aa3b","componentName":"MenuItem","dataSource":"f4a3b65e-f03e-4637-939b-94107a7ba288","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"66","FieldNames":"Default"},"fields":{"link":{"value":{"text":"EUV lithography","anchor":"","linktype":"internal","class":"","title":"EUV lithography","target":"","querystring":"","id":"{F39AFFA8-49D2-4AD7-B5AC-AC34DD543746}","href":"/en/products/euv-lithography-systems"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"1d2cdc69-5503-4916-acd2-f28c0e6ebfa7","componentName":"MenuItem","dataSource":"0951ff58-1606-4692-850c-c8cdc69a3155","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"67","FieldNames":"Default"},"fields":{"link":{"value":{"text":"DUV lithography","anchor":"","linktype":"internal","class":"","title":"DUV lithography","target":"","querystring":"","id":"{529857A5-1B9C-4F40-B936-CED40C2B4BD7}","href":"/en/products/duv-lithography-systems"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"4798e5a7-8e7b-469a-a044-e5766bf7ab0b","componentName":"MenuItem","dataSource":"71c57a91-f937-4c5f-8fcb-7b8cb95b428e","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"71","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Refurbished systems","anchor":"","linktype":"internal","class":"","title":"Refurbished systems","target":"","querystring":"","id":"{472B5DE2-E53F-4472-800F-4607AD41161C}","href":"/en/products/refurbished-systems"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"b1aa5ec3-d846-4b73-9ae7-abc0af67a6fe","componentName":"MenuItem","dataSource":"ece73f5e-9c3e-429a-84ea-e38ac43e8c86","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"68","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Metrology \u0026 inspection","anchor":"","linktype":"internal","class":"","title":"Metrology \u0026 inspection","target":"","querystring":"","id":"{27961EBB-E9FC-4D6E-8BEC-E1DD6B85F183}","href":"/en/products/metrology-and-inspection-systems"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"7d692249-cfab-49b0-bc80-018c93417b74","componentName":"MenuItem","dataSource":"6d3bdf74-faa1-4237-b4fe-993ddcf895dc","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"69","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Computational lithography","anchor":"","linktype":"internal","class":"","title":"Computational lithography","target":"","querystring":"","id":"{22ED1A8F-374E-4B91-8DF4-3C8A03737A66}","href":"/en/products/computational-lithography"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"36b3389a-713b-4841-a1b9-e97fdc25f6a0","componentName":"MenuItem","dataSource":"afe88275-1d92-498d-bd5f-6cb320c852c2","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"70","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Customer support","anchor":"","linktype":"internal","class":"","title":"Customer support","target":"","querystring":"","id":"{4D47346D-FE32-4ADF-A78F-52BC77FD41BE}","href":"/en/products/customer-support"}}},"placeholders":{"sub-navigation-items":[]}}]}},{"uid":"ea8d7c53-c8d6-450c-b147-d918a453bc12","componentName":"MenuItem","dataSource":"5107b738-931f-4151-a035-ee802748108e","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"20","FieldNames":"Default"},"fields":{"link":{"value":{"text":"News","anchor":"","linktype":"internal","class":"","title":"","target":"","querystring":"","id":"{275F21FA-E198-482D-9FE2-3DDBE17E3A5E}","href":"/en/news"}}},"placeholders":{"sub-navigation-items":[{"uid":"f09b2f1d-5fde-4738-b471-68cd75ff7abd","componentName":"MenuItem","dataSource":"33c08c43-63f5-4a61-bcf5-152ecb563b7c","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"72","FieldNames":"Default"},"fields":{"link":{"value":{"text":"News overview","anchor":"","linktype":"internal","class":"","title":"News overview","target":"","querystring":"","id":"{275F21FA-E198-482D-9FE2-3DDBE17E3A5E}","href":"/en/news"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"d214036c-a427-4ce7-a762-824e0d8ef24f","componentName":"MenuItem","dataSource":"bcbd8eb2-0e59-472f-84c5-7068737a6e60","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"73","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Press releases \u0026 announcements","anchor":"","linktype":"internal","class":"","title":"Press releases \u0026 announcements","target":"","querystring":"","id":"{6A83C831-1E89-41E6-9A70-093B8679C8F0}","href":"/en/news/press-releases"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"78a642d0-f799-43cf-b6f7-84de298141e5","componentName":"MenuItem","dataSource":"4f927f25-f4ab-461d-8a46-67b043b2700e","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"74","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Stories","anchor":"","linktype":"internal","class":"","title":"Stories","target":"","querystring":"","id":"{B6D602A4-9EB6-41B7-A28C-800217B4C343}","href":"/en/news/stories"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"9eb6a703-874f-440b-9644-b334c14e6a21","componentName":"MenuItem","dataSource":"69e2b167-90c2-4bc0-a712-379000a02e4d","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"75","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Share buyback","anchor":"","linktype":"internal","class":"","title":"Share buyback","target":"","querystring":"","id":"{6E6F1918-71A7-4C6A-8BE8-01255386C741}","href":"/en/news/share-buyback"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"5f0d6bc5-74ad-4143-8d4c-d33634ed269d","componentName":"MenuItem","dataSource":"e5f5db6a-5ee2-44d9-b1db-0ead4d34bab9","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"76","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Media library","anchor":"","linktype":"internal","class":"","title":"Media library","target":"","querystring":"","id":"{DAAE4D2D-D152-46F8-8490-23D618B507F5}","href":"/en/news/media-library"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"4d734021-b9f3-4f9e-a074-650fcfff5fde","componentName":"MenuItem","dataSource":"2d4bb8cf-cdb8-45c7-bd1e-84222406bf9d","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"77","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Contact Media Relations","anchor":"","linktype":"internal","class":"","title":"Contact Media Relations","target":"","querystring":"","id":"{FFDD3747-5D0F-4800-907B-2300256E9DBB}","href":"/en/news/contact-media-relations"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"6f870a60-c5e5-4001-b07d-b011d59114e0","componentName":"MenuItem","dataSource":"608a329a-6a86-45c3-9f4f-db03ba6cd85c","params":{"GridParameters":"col-span-12","DynamicPlaceholderId":"113","FieldNames":"Default"},"fields":{"link":{"value":{"text":"News alerts","anchor":"","linktype":"internal","class":"","title":"News alerts","target":"","querystring":"","id":"{E3B65CDE-C165-4A65-AD96-E5BB595934A5}","href":"/en/news/news-subscription"}}},"placeholders":{"sub-navigation-items":[]}}]}},{"uid":"44db2a5c-0ae7-4bfa-98d2-81371007a45b","componentName":"MenuItem","dataSource":"267ad21b-9a04-43cc-9c96-86310d58c689","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"21","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Investors","anchor":"","linktype":"internal","class":"","title":"","target":"","querystring":"","id":"{3E5B14EB-AABC-43D3-AB52-1A47A332CA3A}","href":"/en/investors"}}},"placeholders":{"sub-navigation-items":[{"uid":"a9e14e48-c31a-481e-91ac-6ee1e5677dba","componentName":"MenuItem","dataSource":"61615944-5793-4f4b-a62b-83b3426192a5","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"79","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Investors overview","anchor":"","linktype":"internal","class":"","title":"Investors overview","target":"","querystring":"","id":"{3E5B14EB-AABC-43D3-AB52-1A47A332CA3A}","href":"/en/investors"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"7a397442-a1e3-4f74-b36e-df6f09b147ae","componentName":"MenuItem","dataSource":"3b283bce-57cc-4ae0-9f11-99e203e63ac2","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"82","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Why invest in ASML","anchor":"","linktype":"internal","class":"","title":"Why invest in ASML","target":"","querystring":"","id":"{8ED633EE-BFC9-489E-B12B-DA0A2CE082E2}","href":"/en/investors/why-invest-in-asml"}}},"placeholders":{"sub-navigation-items":[{"uid":"542b9df0-6911-459e-8412-6847d280750e","componentName":"MenuItem","dataSource":"b08dd1ae-3d08-4c13-b573-31b5b85606a1","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"89","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Why invest in ASML overview","anchor":"","linktype":"internal","class":"","title":"Why invest in ASML overview","target":"","querystring":"","id":"{8ED633EE-BFC9-489E-B12B-DA0A2CE082E2}","href":"/en/investors/why-invest-in-asml"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"1ccf2309-71be-46a2-91a5-dbab9a3be73d","componentName":"MenuItem","dataSource":"698580f9-4480-4e9a-8536-08a335e401d6","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"88","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Financial strategy","anchor":"","linktype":"internal","class":"","title":"Financial strategy","target":"","querystring":"","id":"{AC30075E-8FBE-4B4E-9344-69FAB1123EB6}","href":"/en/investors/why-invest-in-asml/financial-strategy"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"af9cc9df-11f4-43c9-b1aa-d6df3bef9ffc","componentName":"MenuItem","dataSource":"21d7ff68-3f5c-4c3e-ae4a-bc5a1f20175a","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"90","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Capital return \u0026 financing","anchor":"","linktype":"internal","class":"","title":"Capital return \u0026 financing","target":"","querystring":"","id":"{6F1255FA-8665-4001-B019-EA6C1CA9771E}","href":"/en/investors/why-invest-in-asml/capital-return-and-financing"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"adb30ef3-ab2f-4b8a-bd0a-a7610a2aee50","componentName":"MenuItem","dataSource":"0ef95383-9d46-4f3b-a0f9-82ae1ff44992","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"91","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Share buyback","anchor":"","linktype":"internal","class":"","title":"Share buyback","target":"","querystring":"","id":"{D67FA5DE-8F36-44EB-A2E7-5CD71DB44C11}","href":"/en/investors/why-invest-in-asml/share-buyback"}}},"placeholders":{"sub-navigation-items":[]}}]}},{"uid":"3ccdc26b-eca3-4310-b4e3-d85f37406f01","componentName":"MenuItem","dataSource":"8e37d4e1-8dbd-44f2-92b3-f405d03f3a76","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"80","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Annual reports","anchor":"","linktype":"internal","class":"","title":"","target":"","querystring":"","id":"{015ACE77-3E91-4ADF-AEA4-49BCF8EC1E08}","href":"/en/investors/annual-report"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"7afaee70-70db-4600-8129-51a57f21caad","componentName":"MenuItem","dataSource":"5bd5bdc0-1471-4919-bbb7-064b183e2427","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"83","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Financial results","anchor":"","linktype":"internal","class":"","title":"Financial results","target":"","querystring":"","id":"{89934261-03E4-4E1E-81A9-B4E2C585ED58}","href":"/en/investors/financial-results"}}},"placeholders":{"sub-navigation-items":[{"uid":"244b19fb-732e-4ec1-a51b-13c5d13f55ab","componentName":"MenuItem","dataSource":"26ba89e8-2dc3-4a0e-ac2b-ae3fa47b99d3","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"92","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Financial results overview","anchor":"","linktype":"internal","class":"","title":"Financial results overview","target":"","querystring":"","id":"{89934261-03E4-4E1E-81A9-B4E2C585ED58}","href":"/en/investors/financial-results"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"d3c64bd9-de76-4959-bd22-6f40acae9304","componentName":"MenuItem","dataSource":"d65c0f89-e71a-44d3-a231-daaba2133b8b","params":{"GridParameters":"col-span-12","DynamicPlaceholderId":"116","FieldNames":"Default"},"fields":{"link":{"value":{"linktype":"internal","id":"6608ae1a-1c90-48e4-9ec7-44cdb30875df","anchor":"","querystring":"","target":"","class":"","text":"Q3 2024","title":"","href":"/en/investors/financial-results/q3-2024-572fba47762609d4"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"d7570d4f-9f8c-4195-a822-2bbfb76732ee","componentName":"MenuItem","dataSource":"750d22c3-1c44-44f0-bb1f-6e1cdbdaaca8","params":{"GridParameters":"col-span-12","DynamicPlaceholderId":"115","FieldNames":"Default"},"fields":{"link":{"value":{"class":"","id":"fcfa874c-c1b5-4a22-9c5f-e2231bbd01fb","querystring":"","anchor":"","target":"","title":"","linktype":"internal","text":"Q2 2024","url":"/asmlcom/asmlcom/Home/Investors/Financial Results/Q2 2024","href":"/en/investors/financial-results/q2-2024"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"e098a95d-a5b4-420b-94d2-89a917b64ad4","componentName":"MenuItem","dataSource":"343201ee-41d7-42e4-b7f9-3edd4806ea94","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"96","FieldNames":"Default"},"fields":{"link":{"value":{"linktype":"internal","id":"{09CB6840-7C31-469F-8D31-79C8B25D867D}","anchor":"","querystring":"","target":"","class":"","text":"Q1 2024","title":"","href":"/en/investors/financial-results/q1-2024"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"d19771c0-a1ef-4b89-9cef-73bbbf8d7fe0","componentName":"MenuItem","dataSource":"68fe6987-76ba-47f9-a1c8-ec37595751b7","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"97","FieldNames":"Default"},"fields":{"link":{"value":{"linktype":"internal","id":"{EA63742C-E5D3-49BD-BEDD-9DE138759248}","anchor":"","querystring":"","target":"","class":"","text":"Q4 2023","title":"","href":"/en/investors/financial-results/q4-2023"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"0b48d73f-074e-47d4-8c7f-01080c02fcb1","componentName":"MenuItem","dataSource":"897fe2a3-3c59-4f68-a43e-2e60ae57ac9c","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"110","FieldNames":"Default"},"fields":{"link":{"value":{"linktype":"internal","id":"{C3B81757-54B4-4AB1-AAD1-52589C515196}","anchor":"","querystring":"","target":"","class":"","text":"Q3 2023","title":"","href":"/en/investors/financial-results/q3-2023"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"229694f2-b7a1-4112-9a23-7570a80ef78a","componentName":"MenuItem","dataSource":"bb74031d-91c2-4c1b-9308-e18550b775b5","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"93","FieldNames":"Default"},"fields":{"link":{"value":{"linktype":"internal","id":"{77FCB5F5-0F2C-4295-8959-99F112980BD6}","anchor":"","querystring":"","target":"","class":"","text":"Q2 2023","title":"","href":"/en/investors/financial-results/q2-2023"}}},"placeholders":{"sub-navigation-items":[]}}]}},{"uid":"e1cf51a5-eee9-43f8-a019-60a1ba4fbd3a","componentName":"MenuItem","dataSource":"d842ebd0-fda5-4f62-a438-1917ff9e5ef1","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"85","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Financial overview","anchor":"","linktype":"internal","class":"","title":"Financial overview","target":"","querystring":"","id":"{0836C895-93D1-45DF-B9B3-D130F20C715C}","href":"/en/investors/financial-overview"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"99491182-0456-43bc-b5d1-f2cfdc2974f2","componentName":"MenuItem","dataSource":"1c76af2a-ae73-477a-9da1-ea1d8ee53a3f","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"86","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Shares","anchor":"","linktype":"internal","class":"","title":"Shares","target":"","querystring":"","id":"{2564C540-F159-4901-A9F9-B141EA007C72}","href":"/en/investors/shares"}}},"placeholders":{"sub-navigation-items":[{"uid":"47bf5e1b-54d3-4790-b535-a61ea8d04e13","componentName":"MenuItem","dataSource":"de4a5e3e-2eb1-4604-9074-d011b44ddcda","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"99","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Shares overview","anchor":"","linktype":"internal","class":"","title":"Shares overview","target":"","querystring":"","id":"{2564C540-F159-4901-A9F9-B141EA007C72}","href":"/en/investors/shares"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"22a10d5c-885c-4353-aa08-6ac6b7388bea","componentName":"MenuItem","dataSource":"455b0952-ae04-46f9-97bc-3370567e2db0","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"100","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Share price","anchor":"","linktype":"internal","class":"","title":"Share price","target":"","querystring":"","id":"{EEBAAA49-631F-433D-B346-F4112E32703A}","href":"/en/investors/shares/share-price"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"b773954f-aae1-4901-a014-45cc4db0c06e","componentName":"MenuItem","dataSource":"2fb01d25-5c8d-439f-bbe2-04c8abbce4bc","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"101","FieldNames":"Default"},"fields":{"link":{"value":{"text":"SEC filings","anchor":"","linktype":"internal","class":"","title":"SEC filings","target":"","querystring":"","id":"{D1290023-D9C2-42AB-82AA-C13459241EF5}","href":"/en/investors/shares/sec-filings"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"1ebe9855-505d-4ca5-a64b-1acacaecd412","componentName":"MenuItem","dataSource":"d6d3978c-e856-4f89-9d9c-f8d2d9934a6d","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"102","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Analyst coverage","anchor":"","linktype":"internal","class":"","title":"Analyst coverage","target":"","querystring":"","id":"{C8E99EBC-A024-4970-9B12-E26506925C93}","href":"/en/investors/shares/analyst-coverage"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"b8afcc2b-0f37-4fba-be66-93fd2910ae2b","componentName":"MenuItem","dataSource":"f53ba64d-b0d0-4a14-b8a3-3a7000a33905","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"103","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Shareholder meetings","anchor":"","linktype":"internal","class":"","title":"Shareholder meetings","target":"","querystring":"","id":"{C5BA3EFE-AE48-4E49-8A32-53385BA58605}","href":"/en/investors/shares/shareholder-meetings"}}},"placeholders":{"sub-navigation-items":[]}}]}},{"uid":"9aaf51d8-dee2-447f-ab37-e1fba17c4ad6","componentName":"MenuItem","dataSource":"908505b2-b3a5-46a8-8ca8-037fc5da839b","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"87","FieldNames":"Default"},"fields":{"link":{"value":{"linktype":"internal","id":"{E8E378D9-9962-4EE5-B6B7-B9B1A07AC5C3}","target":"","class":"","text":"Investor days","title":"Investor days","href":"/en/investors/investor-days"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"3acedf06-b1c5-4472-8ce9-3dc4dcb10b44","componentName":"MenuItem","dataSource":"31b6c1c5-d5c4-44d7-bf2b-8e0058f516a6","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"84","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Financial calendar","anchor":"","linktype":"internal","class":"","title":"Financial calendar","target":"","querystring":"","id":"{685E2E39-92A0-46A2-B482-795727DC263B}","href":"/en/investors/financial-calendar"}}},"placeholders":{"sub-navigation-items":[]}},{"uid":"2485fdd3-3700-441c-998e-32aaf13716aa","componentName":"MenuItem","dataSource":"e2466845-be3c-42e0-bcc3-a21095634929","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"81","FieldNames":"Default"},"fields":{"link":{"value":{"text":"Contact Investor Relations","anchor":"","linktype":"internal","class":"","title":"Contact Investor Relations","target":"","querystring":"","id":"{59EB3841-4006-47F9-9372-592ED2F485AD}","href":"/en/investors/contact-investor-relations"}}},"placeholders":{"sub-navigation-items":[]}}]}}],"meta-navigation":[{"uid":"154e4a0e-6c2d-4073-a4e1-7286d5d34294","componentName":"HeaderMetaNavigation","dataSource":"/sitecore/content/asmlcom/asmlcom/Presentation/Partial Designs/Header/Data/Main Header/Header Meta Navigation","params":{"CacheClearingBehavior":"Clear on publish"},"fields":{"data":{"datasource":{"children":{"results":[{"field":{"link":{"value":{"text":"Contact us","anchor":"","linktype":"internal","class":"","title":"Contact us","target":"","querystring":"","id":"{51C4D8C9-4A8E-4453-9814-C16FD44DA48D}","href":"/en/contact-us"}}}},{"field":{"link":{"value":{"text":"SupplierNet","anchor":"","linktype":"internal","class":"","title":"SupplierNet","target":"","querystring":"","id":"{D847C60C-DB17-424F-BA09-C6A4407B9B48}","href":"/en/products/supplier-net"}}}},{"field":{"link":{"value":{"text":"CustomerNet","anchor":"","linktype":"internal","class":"","title":"CustomerNet","target":"","querystring":"","id":"{65DF5A50-A7BB-4FE2-8DED-32A4D2BA6D27}","href":"/en/products/customernet"}}}},{"field":{"link":{"value":{"text":"ASML Foundation","anchor":"","linktype":"internal","class":"","title":"ASML Foundation","target":"","querystring":"","id":"{8FF9ED59-5325-4333-98FB-36AB646E0AF6}","href":"/en/company/asml-foundation"}}}}]}}}}}],"search-panel":[{"uid":"82040ea4-185e-44a5-9232-56c3ab9e8024","componentName":"SearchBar","dataSource":"9f2025b5-ff44-40bd-af78-77b96a17f5e1","params":{"GridParameters":"col-span-12","tag":"span","FieldNames":"Header","CacheClearingBehavior":"Clear on publish","DynamicPlaceholderId":"12"},"fields":{"label":{"value":"Search"},"placeholderText":{"value":"Search the site"},"searchPage":{"value":{"href":"https://www.asml.com/en/search","linktype":"external","url":"https://www.asml.com/en/search","target":"","class":"","text":"","title":""}}}}]}}]}}],"hero-banner":[{"uid":"32a62eae-563b-4886-a73c-88cbe1205ab8","componentName":"HeroBanner","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/measuring accuracy/Data/Hero Banner","params":{"GridParameters":"col-span-12","FieldNames":"Large","Styles":"{38E4DCEC-7934-4768-ADFE-65E4A5C26274}"},"fields":{"backgroundImage":{"value":{"src":"https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?h=1080\u0026iar=0\u0026w=1920","alt":"NXE3400 metrology","width":"1920","height":"1080"}},"backgroundImageFocalPoint":{"Top":"50%","Left":"50%"},"cta":{"value":{"href":""}},"subtitle":{"value":"The accuracy of every element of the lithography process is rigorously assessed. Because even the smallest errors can result in a defect chip"},"title":{"value":"Measuring accuracy"}},"placeholders":{"hero-banner-quick-link-list":[{"uid":"c43492ff-f761-440d-96bc-fbf1a2589864","componentName":"QuickLinks","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/measuring accuracy/Data/Quick links","params":{"GridParameters":"col-span-12","tag":"h3","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"title":{"value":"More about..."}},"placeholders":{"quick-links":[{"uid":"667b6fa0-a013-4aa8-9d9a-93ab1f9dcbc0","componentName":"QuickLinksItem","dataSource":"da3f0a2a-2cf6-48a7-b052-8d8d5498f7b4","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","FieldNames":"Default"},"fields":{"link":{"value":{"linktype":"internal","id":"3675bbf0-e087-496f-b5e2-70623d062a61","anchor":"yieldstar","querystring":"","target":"","class":"","text":"Optical","title":"","href":"/en/technology/lithography-principles/measuring-accuracy"}}}},{"uid":"fa48f971-1506-41dd-8e1a-20ee4ae1d4f7","componentName":"QuickLinksItem","dataSource":"efe711e6-83d7-498e-851c-d7abad441c0b","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","FieldNames":"Default"},"fields":{"link":{"value":{"linktype":"internal","id":"3675bbf0-e087-496f-b5e2-70623d062a61","anchor":"E-beam","querystring":"","target":"","class":"","text":"E-beam","title":"","href":"/en/technology/lithography-principles/measuring-accuracy"}}}},{"uid":"fd024bd0-474f-409e-820d-619421ae576b","componentName":"QuickLinksItem","dataSource":"ff315410-cdae-4767-9b66-0b382d86e7f0","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","FieldNames":"Default"},"fields":{"link":{"value":{"linktype":"internal","id":"3675bbf0-e087-496f-b5e2-70623d062a61","anchor":"in-scanner","querystring":"","target":"","class":"","text":"In-scanner","title":"","href":"/en/technology/lithography-principles/measuring-accuracy"}}}},{"uid":"ebe28db7-f0e5-4541-a97d-71f01e936e34","componentName":"QuickLinksItem","dataSource":"c92eb37c-d5a9-4a9a-89c6-47471030bca1","params":{"GridParameters":"col-span-12","CacheClearingBehavior":"Clear on publish","FieldNames":"Default"},"fields":{"link":{"value":{"linktype":"internal","id":"3675bbf0-e087-496f-b5e2-70623d062a61","anchor":"Patternfidelity","querystring":"","target":"","class":"","text":"Pattern fidelity","title":"","href":"/en/technology/lithography-principles/measuring-accuracy"}}}}]}}],"hero-banner-breadcrumb":[{"uid":"347efc5e-34ce-44b7-a63a-a2c9987a4865","componentName":"Breadcrumbs","dataSource":"","params":{"FieldNames":"Default"},"fields":{"data":{"contextItem":{"navigationTitle":{"value":"Measuring accuracy"},"hideFooter":{"data":{"value":false}},"url":{"path":"/en/technology/lithography-principles/measuring-accuracy"},"ancestors":[{"navigationTitle":{"value":"Lithography principles"},"url":{"path":"/en/technology/lithography-principles"}},{"navigationTitle":{"value":"Technology"},"url":{"path":"/en/technology"}},{"navigationTitle":{"value":"Home"},"url":{"path":"/en/"}}],"parentItem":null}}}}]}}],"headless-main":[{"uid":"e1dda53c-4f4e-4bed-aedc-e788ba057617","componentName":"CustomContainer","dataSource":"","params":{"GridParameters":"col-span-12","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"placeholders":{"content-component-placeholder":[{"uid":"2c22a1b1-5986-48ac-808c-2977f6325e92","componentName":"CustomRichText","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/measuring accuracy/Data/RT - Intro","params":{"GridParameters":"col-span-12 md:col-start-3 md:col-span-8 xl:col-start-4 xl:col-span-6","FieldNames":"Default","Styles":"font-weight--light","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003ch4 class=\"rte-align-center\"\u003eChipmakers use our products to print chip patterns and inspect those patterns using advanced metrology systems and software, allowing them to increase accuracy and yield.\u003c/h4\u003e"}}}]}},{"uid":"44c9440f-025e-48fc-9b9b-114b6c8efb50","componentName":"CustomContainer","dataSource":"","params":{"GridParameters":"col-span-12","FieldNames":"Default","Styles":"bg-color-gray-100 bg-light","CacheClearingBehavior":"Clear on publish"},"placeholders":{"content-component-placeholder":[{"uid":"18f51260-4899-4b23-ab7d-4240a8d1e7d5","componentName":"CustomContainer","dataSource":"","params":{"GridParameters":"col-span-12 md:col-start-3 md:col-span-4","FieldNames":"Default","Styles":"no-px no-pb no-pt","CacheClearingBehavior":"Clear on publish"},"placeholders":{"content-component-placeholder":[{"uid":"d4c1426c-71bd-4bb7-a1af-f0e7aa5d7723","componentName":"CustomRichText","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/measuring accuracy/Data/RT - Types of metrology 1","params":{"GridParameters":"col-span-12 mb-6 md:col-span-12","FieldNames":"Default","Styles":"font-weight--medium","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003ch4\u003eTypes of metrology and inspection\u003c/h4\u003e"}}},{"uid":"11008bec-dafe-4647-81c6-3c361f5f9385","componentName":"CustomRichText","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/measuring accuracy/Data/RT - Types of metrology 2","params":{"GridParameters":"col-span-12 mb-2 md:col-span-12","FieldNames":"Default","Styles":"font-weight--light","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003ch5\u003eThere are two ways to examine the quality of the printed features on a chip: diffraction-based optical measurement and e-beam inspection.\u003c/h5\u003e\u003ch5\u003e\u003cbr /\u003e\u003c/h5\u003e\u003ch5\u003eDiffraction examines how light reflects from the wafer, while e-beam observes how electrons scatter when they come into contact with the wafer.\u003c/h5\u003e"}}}]}},{"uid":"1484a122-07ea-48bd-972d-ed6d10b8643c","componentName":"CustomRichText","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/measuring accuracy/Data/RT - Types of metrology 3","params":{"GridParameters":"col-span-12 md:col-start-8 md:col-span-3","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003eASML uses both: our YieldStar systems use diffraction-based measuring to assess the pattern quality on the wafer, and HMI e-beam inspection systems help locate and analyze individual chip defects.\u003c/p\u003e\u003cp\u003e\u003cbr /\u003e\u003c/p\u003e\u003cp\u003eCombined with sensor-based information from inside our lithography machines and a complex set of software algorithms, the YieldStar and HMI systems provide a wealth of data that chipmakers use to optimize their manufacturing process.\u003c/p\u003e"}}}]}},{"uid":"0e2d9f41-c807-4551-8af7-aa1dded8cd8b","componentName":"ImageTextBlock","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/measuring accuracy/Data/ITB - Optical metrology","params":{"GridParameters":"col-span-12","FieldNames":"Default","CacheClearingBehavior":"Clear on publish","RenderingIdentifier":"yieldstar"},"fields":{"text":{"value":""},"title":{"value":""},"image":{"value":{"src":"https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/news/stories/2020/the-future-of-metrology-is-algorithms/asml-yieldstar-optical-metrology-system.jpg?h=324\u0026iar=0\u0026w=575","alt":"YieldStar, ASML’s flagship optical metrology system, is integrated in the lithography cell.","width":"575","height":"324"}},"imageFocalPoint":{"Top":"50%","Left":"50%"},"imageCaption":{"value":""},"largeParagraph":{"value":""},"stackedText":{"value":""},"EnableImageEnlargement":{"value":false}},"placeholders":{"image-text-block-placeholder-a":[{"uid":"cc40b450-42d2-4126-a876-d25b777d461f","componentName":"CustomRichText","dataSource":"750559c1-bfba-4c1a-94b9-419601b43103","params":{"GridParameters":"col-span-12 mb-6","FieldNames":"Default","Styles":"font-weight--medium","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003ch4\u003eOptical metrology\u003c/h4\u003e"}}},{"uid":"de918f3f-ced7-4a18-997c-ed12dc122aad","componentName":"CustomRichText","dataSource":"027ce7ad-920f-4de9-b8e8-3d979638d37c","params":{"GridParameters":"col-span-12 mb-6","FieldNames":"Default","Styles":"font-weight--light","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003ch5\u003eYieldStar\u003c/h5\u003e"}}},{"uid":"9598e469-d48c-48c4-9daf-6dfecf785e33","componentName":"CustomRichText","dataSource":"dc6c77ce-8032-4b83-b520-1557ccd98f3b","params":{"GridParameters":"col-span-12","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003eASML's YieldStar systems do just what their name suggests: they help our customers increase their yield, or the proportion of functioning chips on the wafer. YieldStar allows manufacturers to track key production parameters such as overlay (the accuracy with which two layers of a chip are aligned). Our YieldStar systems are usually integrated into the production line so that they can measure quickly and accurately, looping the data back to the lithography system for real-time corrections to the manufacturing process.\u003c/p\u003e"}}}],"image-text-block-placeholder-b":[]}},{"uid":"c03b9da0-6d55-4c9c-b264-fbf1fdfa1ce6","componentName":"ReadMorePanel","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/measuring accuracy/Data/RM - Optical metrology","params":{"GridParameters":"col-span-12","FieldNames":"Default","Styles":"pb-12","CacheClearingBehavior":"Clear on publish"},"fields":{"text":{"value":"How it works"}},"placeholders":{"read-more-panel-content":[{"uid":"3601c6c8-c8da-4385-9313-e11850cb2ffa","componentName":"CustomContainer","dataSource":"","params":{"GridParameters":"col-span-12 md:col-start-2 md:col-span-8 lg:col-start-2 lg:col-span-6","FieldNames":"Default","Styles":"no-px","CacheClearingBehavior":"Clear on publish"},"placeholders":{"content-component-placeholder":[{"uid":"3213a836-0250-413c-a11e-18d3a28c5505","componentName":"CustomRichText","dataSource":"ceb306ba-4e24-4dc1-9c0d-e88d99bf542f","params":{"GridParameters":"col-span-12 mb-2","FieldNames":"Default","Styles":"font-weight--medium","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003ch5\u003eDiffraction\u003c/h5\u003e"}}},{"uid":"7845ba12-a098-4ab2-a67c-c9c08050a226","componentName":"CustomRichText","dataSource":"385bdb55-ae15-4e33-8e00-53e2da7675d4","params":{"GridParameters":"col-span-12 mb-6","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003eYieldStar is a diffraction-based optical metrology system which applies the simple fact that an object’s shape determines how light reflects from it. For example, shine a beam of light onto a repeating pattern of lines on a wafer, and you can easily predict what the resulting pattern of scattered light should look like. If you collect the scattered light using a high-resolution digital camera, you can quickly determine how well the prediction matches reality and thus how well the pattern of lines has been printed.\u003c/p\u003e"}}},{"uid":"cd6b9292-edfa-4761-9d8d-933c1319c5c5","componentName":"CustomRichText","dataSource":"fd30e115-391f-4153-9dfe-78bfad9e020e","params":{"GridParameters":"col-span-12 mb-2","FieldNames":"Default","Styles":"font-weight--medium","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003ch5\u003eFast, accurate wafer metrology\u003c/h5\u003e"}}},{"uid":"0978729e-9ebb-40c4-bc39-8ba7944e0493","componentName":"CustomRichText","dataSource":"80087eb7-fb70-40d4-a4ef-0b412995a75a","params":{"GridParameters":"col-span-12 mb-6","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003eIn wafer metrology, key manufacturing parameters such as overlay (the accuracy with which two layers of a chip are aligned) and focus (how sharp the image is) are monitored by measuring how well a particular repeating pattern (the ‘metrology target’) is printed on the wafer. These measurements are made at marked locations across the wafer.\u003c/p\u003e"}}},{"uid":"840fed1a-6df3-407b-b642-1cf243887095","componentName":"CustomRichText","dataSource":"e24f51fa-cf0e-45e3-9a83-0b0342097593","params":{"GridParameters":"col-span-12 mb-2","FieldNames":"Default","Styles":"font-weight--medium","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003ch5\u003eIntegrated into the production line\u003c/h5\u003e"}}},{"uid":"afd57fd3-8410-47cd-a3f3-c1fa666ce66a","componentName":"CustomRichText","dataSource":"52487dc3-8fee-40f7-bb81-035dfba59eb8","params":{"GridParameters":"col-span-12 mb-6","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003ePrior to YieldStar, wafers were taken out of the production line to be measured manually. By integrating our solution into the production line (or ‘track’), chipmakers can now use YieldStar to gather their metrology data quickly and accurately, offering better control over their production processes. Metrology data is analyzed using control software and fed back to the lithography system in real-time, enabling customers to tune the manufacturing process further for optimal yield.\u003c/p\u003e"}}},{"uid":"3167dbe6-8667-4a3b-821b-0e8efa15ddbd","componentName":"CustomRichText","dataSource":"39e41753-1047-4027-85d8-be62e9c1f9ef","params":{"GridParameters":"col-span-12 mb-2","FieldNames":"Default","Styles":"font-weight--medium","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003ch5\u003eFrom repeating patterns to real structures\u003c/h5\u003e"}}},{"uid":"90f28d5a-c5e6-49c7-90fb-8734403eab35","componentName":"CustomRichText","dataSource":"50aaf353-211e-4edf-a850-aa3dd18a1c6d","params":{"GridParameters":"col-span-12","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003eOur latest developments in diffraction-based metrology feature new optics technologies to generate more accurate data, faster, measuring thousands of data points for each batch of wafers. YieldStar matches the productivity of our lithography systems for wafer-to-wafer control on the most advanced chip nodes. Additionally, YieldStar is used for after-etch metrology to inspect actual device structures with more accuracy and higher measuring speeds than our competitors’ scanning electron microscope (SEM) solutions.\u003c/p\u003e"}}}]}}]}},{"uid":"e75d2dfb-dcdf-4993-98bb-e82c2879fe52","componentName":"ImageTextBlock","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/measuring accuracy/Data/ITB - E-beam metrology and inspection","params":{"GridParameters":"col-span-12","FieldNames":"Default","CacheClearingBehavior":"Clear on publish","RenderingIdentifier":"E-beam"},"fields":{"text":{"value":""},"title":{"value":""},"image":{"value":{"src":"https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/products/metrology-and-inspection/hmi-ep5-e-beam-metrology-system.jpg?h=1434\u0026iar=0\u0026w=1920","alt":"HMI eP5","width":"1920","height":"1434"}},"imageFocalPoint":{"Top":"50%","Left":"50%"},"imageCaption":{"value":""},"largeParagraph":{"value":""},"stackedText":{"value":""},"EnableImageEnlargement":{"value":false}},"placeholders":{"image-text-block-placeholder-a":[{"uid":"d8de2c31-3fc0-4683-a5fe-17a19191b5f9","componentName":"CustomRichText","dataSource":"44946ae1-a8ba-4d6e-b162-80fa651998af","params":{"GridParameters":"col-span-12 mb-6","FieldNames":"Default","Styles":"font-weight--medium","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003ch4\u003eE-beam metrology and inspection\u003c/h4\u003e"}}},{"uid":"56a23bbd-3d6d-44bd-b8b9-7ba3971c4c13","componentName":"CustomRichText","dataSource":"7465cfe5-72b9-40d2-aab3-e96256ede440","params":{"GridParameters":"col-span-12 mb-6","FieldNames":"Default","Styles":"font-weight--light","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003ch5\u003e\u003cspan style=\"color: rgb(15, 35, 140);\"\u003eHMI e-beam solutions\u003c/span\u003e\u003c/h5\u003e"}}},{"uid":"8878caa7-11d2-487d-9224-19dead5dc688","componentName":"CustomRichText","dataSource":"82154cc8-0704-4940-b98d-8ccec0452952","params":{"GridParameters":"col-span-12","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003eFor today’s advanced microchips, defects as small as a couple of nanometers can render the entire chip useless. With its 1-nanometer resolution, e-beam inspection offers just the right kind of eyes to spot those tiny misprints.\u003c/p\u003e\u003cp\u003eASML is at the forefront of developments in e-beam metrology and inspection. E-beam achieves a higher resolution than YieldStar, but it measures more slowly, which means that it’s typically used after the pattern is etched onto the wafer.\u003c/p\u003e"}}}],"image-text-block-placeholder-b":[]}},{"uid":"66b3eb9f-cbd0-4033-88d6-a7a5b0c4c39a","componentName":"ReadMorePanel","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/measuring accuracy/Data/RM - E-beam metrology and inspection","params":{"GridParameters":"col-span-12","FieldNames":"Default","Styles":"pb-12","CacheClearingBehavior":"Clear on publish"},"fields":{"text":{"value":"How it works"}},"placeholders":{"read-more-panel-content":[{"uid":"babc1c71-852e-4e8a-afa8-57f06df50ba2","componentName":"CustomContainer","dataSource":"","params":{"GridParameters":"col-span-12 md:col-start-2 md:col-span-8 lg:col-span-6 lg:col-start-2","FieldNames":"Default","Styles":"no-px","CacheClearingBehavior":"Clear on publish"},"placeholders":{"content-component-placeholder":[{"uid":"4b29958b-8748-4af4-bf47-c50ebe29b661","componentName":"CustomRichText","dataSource":"166f3d7b-9182-43e0-98e4-0a202df5bd93","params":{"GridParameters":"col-span-12 mb-2","FieldNames":"Default","Styles":"font-weight--medium","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003ch5\u003e‘E’ is for ‘electron’\u003c/h5\u003e"}}},{"uid":"1b90f475-7fa5-4997-96c7-5d2e9b54e1f9","componentName":"CustomRichText","dataSource":"3d7b09f7-46d8-458b-97e6-5801fcc4d6b5","params":{"GridParameters":"col-span-12 mb-6","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003eE-beam technology has been around for decades. The basic concept is that a metal wire is heated until it gives off electrons, which are accelerated and formed into a beam by electric and magnetic fields. Unlike visible and ultraviolet light (but just like extreme ultraviolet light) electron beams must travel in a vacuum so they are not deflected or absorbed before reaching the target.\u003c/p\u003e\u003cp\u003e\u003cbr /\u003e\u003c/p\u003e\u003cp\u003eIn metrology and inspection in the semiconductor industry, the e-beam scans across the wafer. The electrons strike the surface and penetrate a small distance into the material, generating new 'secondary electrons' before being scattered. Just as with diffraction-based measurements, measuring the scattering of secondary electrons allows us to build up a very high-resolution picture of the surface. The more focused the beam, the smaller the details that can be measured.\u003c/p\u003e"}}},{"uid":"d5b697d7-fea3-4d09-a842-e43d6c539970","componentName":"CustomRichText","dataSource":"43d36fde-e84a-4592-b620-760df0ec2b2c","params":{"GridParameters":"col-span-12 mb-2","FieldNames":"Default","Styles":"font-weight--medium","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003ch5\u003eSpeeding up e-beam imaging\u003c/h5\u003e"}}},{"uid":"2a226361-09fd-4bb4-b6c8-803f8b259e81","componentName":"CustomRichText","dataSource":"0505f2e9-ac06-42f2-8327-e10f9239c7ea","params":{"GridParameters":"col-span-12 mb-6","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003eThe tricky thing with e-beam measurements is that they’re quite slow. As a result, they have only typically been used in the early R\u0026amp;D phase of chip manufacturing, where time is less of an issue.\u003c/p\u003e\u003cp\u003e\u003cbr /\u003e\u003c/p\u003e\u003cp\u003eASML is leading the way in speeding up e-beam measurements so that manufacturers can enjoy their benefits in volume production. One way we do that is by developing solutions that focus e-beam measurements on specific hotspots where defects are more likely or more critical.\u003c/p\u003e"}}},{"uid":"9469e2cd-d2a9-420d-8b73-8170e65b854f","componentName":"CustomRichText","dataSource":"58ad5829-0347-42ae-804f-4b48520f3284","params":{"GridParameters":"col-span-12 mb-2","FieldNames":"Default","Styles":"font-weight--medium","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003ch5\u003eMultibeam inspection\u003c/h5\u003e"}}},{"uid":"1ea3e081-7b83-420f-a86e-21e224b50f2d","componentName":"CustomRichText","dataSource":"c0f19b75-1229-4e92-bf80-86623aab9fec","params":{"GridParameters":"col-span-12 mb-6","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003eOur most recent e-beam system, the\u0026nbsp;\u003ca href=\"/en/products/metrology-and-inspection-systems/hmi-escan-1000\" rel=\"noopener noreferrer\"\u003eHMI eScan 1000\u003c/a\u003e, combines high-resolution e-beam measurements with state-of-the-art computational modeling, machine learning algorithms and data from the lithography system.\u003c/p\u003e\u003cp\u003e\u003cbr /\u003e\u003c/p\u003e\u003cp\u003eThe HMI eScan 1000 uses multiple e-beams to inspect a greater surface area of the wafer faster. First shipped to customers in May, 2020, the eScan 1000 is a 3x3 multibeam system that can increase throughput by around a factor of nine. But we don't intend to stop there – we plan to increase the number of beams and beam resolution for future generations to align with chipmakers’ product roadmap requirements.\u003c/p\u003e"}}},{"uid":"10edc823-50db-4c95-8841-0323e19edf5b","componentName":"CustomRichText","dataSource":"c5d7bba4-a6b7-4e39-8215-efb34cd4a64a","params":{"GridParameters":"col-span-12 mb-2","FieldNames":"Default","Styles":"font-weight--medium","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003ch5\u003eIn-line wafer and reticle inspection\u003c/h5\u003e"}}},{"uid":"57316e3b-da91-4925-97c1-a4d98c45b7f5","componentName":"CustomRichText","dataSource":"84cdd937-bad8-4b74-a38f-927cd82536b5","params":{"GridParameters":"col-span-12","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003eBy speeding up the process and narrowing down the search to specific areas, e-beam can be used directly in the production line for wafer inspection while maintaining productivity levels.\u003c/p\u003e"}}}]}}]}},{"uid":"7f9c43a3-98f0-4fb6-8242-765fa3b928b4","componentName":"VideoBanner","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/measuring accuracy/Data/VB - What is pattern defectivity","params":{"GridParameters":"col-span-12","tag":"span","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"text":{"value":"ASML researcher Scott Middlebrooks explains how our tools identify and measure deformations on chips in this episode of the Whiteboard Sessions"},"title":{"value":"What is pattern defectivity?"},"youtubeid":{"value":"SS7RgAVoa44"},"alt":{"value":"The Whiteboard Sessions"},"banner":{"value":{"src":"https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/scott-middlebrooks-pattern-defectivity.png?h=1080\u0026iar=0\u0026w=1920","alt":"ASML researcher Scott Middlebrooks explains pattern defectivity in a whiteboard session","width":"1920","height":"1080"}},"bannerFocalPoint":{"Top":"50%","Left":"50%"},"enableCookieTitle":{"value":"Enable third party cookies to play this video"},"enableCookieSubtitle":{"value":"Below you can enable third party cookies. Your choice will be saved and the page will refresh."}}},{"uid":"4a5f78a7-c0ab-4ec6-b061-080047f89ddb","componentName":"ImageTextBlock","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/measuring accuracy/Data/ITB - In-scanner metrology","params":{"GridParameters":"col-span-12","FieldNames":"Default","Styles":"img--left","CacheClearingBehavior":"Clear on publish","RenderingIdentifier":"in-scanner"},"fields":{"text":{"value":""},"title":{"value":""},"image":{"value":{}},"imageCaption":{"value":""},"largeParagraph":{"value":""},"stackedText":{"value":""},"EnableImageEnlargement":{"value":false}},"placeholders":{"image-text-block-placeholder-a":[{"uid":"08dab717-ddba-4f0e-9801-fe068ba1041f","componentName":"CustomRichText","dataSource":"0a22e492-cbe1-41d6-a466-a881e65a933c","params":{"GridParameters":"col-span-12 mb-6","FieldNames":"Default","Styles":"font-weight--medium","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003ch4\u003eIn-scanner metrology\u003c/h4\u003e"}}},{"uid":"f614fad7-4312-42f9-84c0-e363b3b0b745","componentName":"CustomRichText","dataSource":"bde437b5-16f3-4d97-a5ca-d194c1823222","params":{"GridParameters":"col-span-12","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003ePrecision and speed are paramount for today’s advanced chipmaking machines. But sub-nanometer inaccuracies inevitably creep in due to material imperfections, temperature fluctuations and atmospheric pressure changes. Scanner metrology software uses computational models of machine processes in machines to predict and coordinate how the powerful mechatronic modules within our lithography systems should behave to compensate for physical imperfections and maximize system performance. \u003c/p\u003e"}}}],"image-text-block-placeholder-b":[]}},{"uid":"9a92f649-8e58-44e3-8b2f-ff9a5fecd15a","componentName":"ReadMorePanel","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/measuring accuracy/Data/RM - In-scanner metrology","params":{"GridParameters":"col-span-12","FieldNames":"Default","Styles":"pb-12","CacheClearingBehavior":"Clear on publish"},"fields":{"text":{"value":"Read more"}},"placeholders":{"read-more-panel-content":[{"uid":"28263e1c-ff30-409b-ada0-ca224d4dab57","componentName":"CustomContainer","dataSource":"","params":{"GridParameters":"col-span-12 md:col-start-2 md:col-span-8 lg:col-span-6 lg:col-start-2","FieldNames":"Default","Styles":"no-px","CacheClearingBehavior":"Clear on publish"},"placeholders":{"content-component-placeholder":[{"uid":"f283b3ec-5f79-4eb2-9e1f-b895a83d6a4e","componentName":"CustomRichText","dataSource":"ef405e59-3d8e-4176-b55f-5b3cd9c30d35","params":{"GridParameters":"col-span-12 mb-2","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003e\u003cstrong style=\"color: rgb(15, 35, 140);\"\u003eEverything counts\u003c/strong\u003e\u003c/p\u003e"}}},{"uid":"3f772d6b-fd21-474a-9c5b-3c2168f37a50","componentName":"CustomRichText","dataSource":"1cae2243-fc98-489d-a4e9-a0908839fb0b","params":{"GridParameters":"col-span-12 mb-6","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003eA lithography system (scanner) must work 24/7 with sub-nanometer precision, while accelerating mechatronic modules at incredible speeds. For example, the reticle stage accelerates at close to 16g and the wafer stage to 7g. That’s more acceleration than a jet fighter.\u003c/p\u003e\u003cp\u003e\u003cbr /\u003e\u003c/p\u003e\u003cp\u003eIt’s not possible to mechanically construct a machine capable of this level of alignment and precision, accelerating at those speeds, and with the level of reliability and repeatability required to make today’s computer chips without the help of in-scanner metrology.\u003c/p\u003e"}}},{"uid":"6b4ea210-d255-4363-90a8-0148823e0236","componentName":"CustomRichText","dataSource":"5d5d641b-199b-4ce9-b666-9841a2b4904c","params":{"GridParameters":"col-span-12 mb-2","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003e\u003cstrong style=\"color: rgb(15, 35, 140);\"\u003eChip by chip adjustments\u003c/strong\u003e\u003c/p\u003e"}}},{"uid":"996086ec-5b1c-41ce-99e6-1f86974ba47c","componentName":"CustomRichText","dataSource":"0fc04c65-8760-489e-94db-2d137f658607","params":{"GridParameters":"col-span-12 mb-6","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003eLithography systems are the most ‘tweakable’ tool in the chipmaking process. There are a multitude of ‘knobs’ within the system that can be used to make small adjustments specific to each individual chip on each wafer.\u003c/p\u003e\u003cp\u003e\u003cbr /\u003e\u003c/p\u003e\u003cp\u003eBy constantly measuring the behavior of the lithography system, in-scanner metrology is used calculate and then coordinate the many tiny adjustments that need to be made by the physical components (the ‘knobs’) to optimize the pattern on every microchip.\u003c/p\u003e\u003cp\u003e\u003cbr /\u003e\u003c/p\u003e\u003cp\u003eHundreds of sensors, including position, temperature, energy and motion sensors, measure every aspect within the system. Advanced algorithms are used to interpret these large volumes of data and coordinate the necessary tweaks in very minor but detailed ways, at the sub-nanometer scale, using thousands of actuators.\u003c/p\u003e"}}},{"uid":"5dc5c123-e567-4c47-805f-dae1342a273d","componentName":"CustomRichText","dataSource":"931f9db9-b4e6-45c2-90e3-80554ae8d5b2","params":{"GridParameters":"col-span-12 mb-2","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003e\u003cstrong style=\"color: rgb(15, 35, 140);\"\u003eEnabling 3D chip architecture\u003c/strong\u003e\u003c/p\u003e"}}},{"uid":"4b2d6109-5dc0-4884-845c-259cb02aba09","componentName":"CustomRichText","dataSource":"f49327e2-cd95-4ca2-9d93-c961b8a621e7","params":{"GridParameters":"col-span-12","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003eIn-scanner metrology plays a particularly critical role in ensuring the quality of a certain type of memory chip, known as 3D NAND. These are the flash memory chips used in SD cards, solid state hard drives and smartphones. Previously made in 2D, the introduction of 3D technology was a game-changer for memory chips.\u003c/p\u003e\u003cp\u003e\u003cbr /\u003e\u003c/p\u003e\u003cp\u003eStacking memory cells on top of each other greatly increases storage and enables the chips to run more efficiently and use less energy. But these chips are complex to make and a challenge to measure. 3D NAND chipmakers have to fabricate the intricate structures found on a 2D chip, and then line them up in the vertical plane, connecting them using tiny vertical channels.\u003c/p\u003e\u003cp\u003e\u003cbr /\u003e\u003c/p\u003e\u003cp\u003eMany metrology systems can’t penetrate these 3D structures to look inside the chip to detect fabrication issues, so production relies heavily on in-scanner metrology software to optimize quality. By analyzing the vast amount of data generated while layers are added in the lithography system, the software feeds this back to optimize alignment and overlay.\u003c/p\u003e"}}}]}}]}},{"uid":"c2304389-29bb-4312-82b0-72942c65739a","componentName":"ImageTextBlock","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/measuring accuracy/Data/ITB - Pattern fidelity","params":{"GridParameters":"col-span-12","FieldNames":"Default","Styles":"img--left no-pb","CacheClearingBehavior":"Clear on publish","RenderingIdentifier":"Patternfidelity"},"fields":{"text":{"value":""},"title":{"value":""},"image":{"value":{"src":"https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-elements/47137-wafer-close-up.jpg?h=1282\u0026iar=0\u0026w=1920","alt":"A closeup of a silicon wafer containing colorful chips","width":"1920","height":"1282"}},"imageFocalPoint":{"Top":"50%","Left":"50%"},"imageCaption":{"value":""},"largeParagraph":{"value":""},"stackedText":{"value":""},"EnableImageEnlargement":{"value":false}},"placeholders":{"image-text-block-placeholder-a":[{"uid":"814c52f0-c0f5-4d83-aa9d-f9f20fcdfe3b","componentName":"CustomRichText","dataSource":"6a5ad7ad-159c-472e-a50a-231ba4ea1386","params":{"GridParameters":"col-span-12 mb-6","FieldNames":"Default","Styles":"font-weight--medium","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003ch4\u003ePattern fidelity\u003c/h4\u003e"}}},{"uid":"a1e9ef8d-5aa0-48f6-9629-908a1aa6f799","componentName":"CustomRichText","dataSource":"a9637868-8322-4623-be78-1d29d9aec917","params":{"GridParameters":"col-span-12","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003ePattern fidelity control (PFC) is a new paradigm in chip manufacturing, aiming to deliver the full benefits of our holistic lithography approach. By drawing and analyzing the most precise data from a wider range of sources throughout the entire chip development and manufacturing process, it gives chipmakers unprecedented insights into the patterns they are actually printing on wafers. Powerful algorithms then translate those insights into actions. These actions are implemented in the lithography system to prevent pattern defects and enable high yields, even when producing the most complex chips.\u003c/p\u003e"}}}],"image-text-block-placeholder-b":[]}},{"uid":"5ce9011b-1ee8-48ac-89a7-96e2901fdd7a","componentName":"ReadMorePanel","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/measuring accuracy/Data/RM - Pattern fidelity","params":{"GridParameters":"col-span-12","FieldNames":"Default","Styles":"pb-12","CacheClearingBehavior":"Clear on publish"},"fields":{"text":{"value":"Read more"}},"placeholders":{"read-more-panel-content":[{"uid":"2f78c182-0de1-47e1-988d-f5290d7339f1","componentName":"CustomContainer","dataSource":"","params":{"GridParameters":"col-span-12 md:col-start-2 md:col-span-8 lg:col-span-6 lg:col-start-2","FieldNames":"Default","Styles":"no-px","CacheClearingBehavior":"Clear on publish"},"placeholders":{"content-component-placeholder":[{"uid":"1dc37cf9-5b2c-4676-9109-df1269f955be","componentName":"CustomRichText","dataSource":"f02ec2b7-250b-4f74-b4af-d8e5ca4e806d","params":{"GridParameters":"col-span-12 mb-2","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003e\u003cstrong style=\"color: rgb(15, 35, 140);\"\u003eDelivering the data\u003c/strong\u003e\u003c/p\u003e"}}},{"uid":"66df6280-81be-4c6d-811c-2cdac70a05b6","componentName":"CustomRichText","dataSource":"65dddb55-fc04-498b-9824-428c1435dd2d","params":{"GridParameters":"col-span-12 mb-6","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003eA single lithography system can generate up 31 terabytes of data per week from its sensors alone – that’s three times more than the Hubble Space Telescope gathers in a year.\u003c/p\u003e\u003cp\u003e\u003cbr /\u003e\u003c/p\u003e\u003cp\u003eThe vision for PFC is to draw relevant data from wherever possible in the microchip development and production processes. To do that, we work together with other semiconductor equipment makers in the fab to bring the most benefit to chipmakers.\u003c/p\u003e\u003cp\u003e\u003cbr /\u003e\u003c/p\u003e\u003cp\u003eWe gather and use data from systems including the YieldStar metrology systems, e-beam inspection tools and wafer mapping within our lithography systems. We also leverage information from our\u0026nbsp;\u003ca href=\"/en/products/computational-lithography\" rel=\"noopener noreferrer\"\u003ecomputational lithography solutions\u003c/a\u003e, as well as any non-ASML equipment on the production line. Finally, we are developing a range of pattern fidelity metrology options that harness the high resolution of e-beam measurements in ways that can be integrated into the production line.\u003c/p\u003e"}}},{"uid":"24adf297-0b75-4008-a264-006be67e13d7","componentName":"CustomRichText","dataSource":"1e7accbf-83bc-4a38-a71b-edff974f74e6","params":{"GridParameters":"col-span-12 mb-2","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003e\u003cstrong style=\"color: rgb(15, 35, 140);\"\u003eData analysis\u003c/strong\u003e\u003c/p\u003e"}}},{"uid":"3becc8ba-3af7-4bad-ad5d-84a865a10adc","componentName":"CustomRichText","dataSource":"78b6fe5b-9159-4de3-8413-d8385cdedc18","params":{"GridParameters":"col-span-12","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003cp\u003eWorking with domain experts in specialist fields such as overlay performance or illumination configuration, the vast amount of data we collect is first manually pre-processed to remove any spurious relationships (where the domain experts see a correlation but know there is no causal relationship). That data is then analyzed with advanced computer models and machine learning algorithms to uncover interactions between the many factors that contribute to defects, affecting the performance of the finished microchip. Finally, we calculate suitable corrections, which are then applied in the lithography system. This will deliver the advanced control that manufacturers need for sub-10 nm features.\u003c/p\u003e"}}}]}}]}},{"uid":"8f4d27fd-23da-4bf0-9ed0-b1f08c7255ea","componentName":"Carousel","dataSource":"/sitecore/content/asmlcom/asmlcom/Home/Technology/Lithography principles/measuring accuracy/Data/CAR - Lithography principle","params":{"GridParameters":"col-span-12","tag":"span","CacheClearingBehavior":"Clear on publish","FieldNames":"Default"},"fields":{"data":{"datasource":{"title":{"data":{"value":"The science behind the chip"}},"subtitle":{"data":{"value":"Lithography principle"}},"children":{"results":[{"title":{"data":{"value":"The Rayleigh criterion"}},"content":{"data":{"value":"\u003cp\u003eThe equation that determines just how small the features on a microchip can be.\u003c/p\u003e"}},"callToAction":{"data":{"value":{"linktype":"internal","id":"7d5cb1f4-5f4b-40f4-a43d-a9cda5b72b1d","anchor":"","querystring":"","target":"","class":"","text":"Read more","title":"","href":"/en/technology/lithography-principles/rayleigh-criterion"}}},"backgroundImage":{"data":{"value":{"src":"https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/40868-experience-center-veldhoven.jpg?h=1281\u0026iar=0\u0026w=1920","alt":"Experience Center Veldhoven","width":"1920","height":"1281"}}}},{"title":{"data":{"value":"Light \u0026 lasers"}},"content":{"data":{"value":"\u003cp\u003eOur lithography machines keep innovation in light and lasers moving forward.\u003c/p\u003e"}},"callToAction":{"data":{"value":{"linktype":"internal","id":"7fa7cfed-c648-4516-b65f-266c41806a40","anchor":"","querystring":"","target":"","class":"","text":"Read more","title":"","href":"/en/technology/lithography-principles/light-and-lasers"}}},"backgroundImage":{"data":{"value":{"src":"https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/47099-asml-lab.jpg?h=1280\u0026iar=0\u0026w=1920","alt":"asml lab","width":"1920","height":"1280"}}}},{"title":{"data":{"value":"Lenses \u0026 mirrors"}},"content":{"data":{"value":"\u003cp\u003eLearn about the role of lenses and mirrors in ASML’s lithography machines.\u003c/p\u003e"}},"callToAction":{"data":{"value":{"linktype":"internal","id":"2516d5cc-ab5f-4db5-929d-ddbf8f6e30b1","anchor":"","querystring":"","target":"","class":"","text":"Read more","title":"","href":"/en/technology/lithography-principles/lenses-and-mirrors"}}},"backgroundImage":{"data":{"value":{"src":"https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/duv-lens-element.jpg?h=1280\u0026iar=0\u0026w=1920","alt":"duv lens element","width":"1920","height":"1280"}}}},{"title":{"data":{"value":"Mechanics and mechatronics"}},"content":{"data":{"value":"\u003cp\u003eSpeed and precision meet in ASML’s advanced lithography machines.\u003c/p\u003e"}},"callToAction":{"data":{"value":{"linktype":"internal","id":"e01a6c2d-e4b5-4b94-861f-a64b87b8dbd6","anchor":"","querystring":"","target":"","class":"","text":"Read more","title":"","href":"/en/technology/lithography-principles/mechanics-and-mechatronics"}}},"backgroundImage":{"data":{"value":{"src":"https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-principles/inside-nxe3400---the-wafer-handler-bringing-a-wafer-into-the-machine_43682.jpg?h=1080\u0026iar=0\u0026w=1920","alt":"Inside NXE3400 - The wafer handler bringing a wafer into the machine","width":"1920","height":"1080"}}}},{"title":{"data":{"value":"Pushing 1k further"}},"content":{"data":{"value":"\u003cp\u003eASML is pushing fundamental physical concepts to their absolute limit.\u003c/p\u003e"}},"callToAction":{"data":{"value":{"linktype":"internal","id":"55815fb2-7f01-42cf-97e6-0aac031710fb","anchor":"","querystring":"","target":"","class":"","text":"Read more","title":"","href":"/en/technology/lithography-principles/pushing-k1-further"}}},"backgroundImage":{"data":{"value":{"src":"https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-elements/47147-wafer-and-duv-reticle-mask.jpg?h=1238\u0026iar=0\u0026w=1920","alt":"wafer and DUV reticle mask","width":"1920","height":"1238"}}}}]}}}}},{"uid":"608ad32e-be99-40ae-b408-f3b87da69af5","componentName":"CustomContainer","dataSource":"","params":{"GridParameters":"col-span-12","FieldNames":"Default","Styles":"bg-color-primary bg-dark no-pb","CacheClearingBehavior":"Clear on publish"},"placeholders":{"content-component-placeholder":[{"uid":"69999d22-b9af-4128-b57a-053e40f3eedb","componentName":"CustomRichText","dataSource":"ebb87424-19f0-4f06-91e1-b6950cd31072","params":{"GridParameters":"col-span-12 mb-2 md:col-start-3 md:col-span-7 lg:col-span-5 lg:col-start-3","FieldNames":"Default","CacheClearingBehavior":"Clear on publish"},"fields":{"content":{"value":"\u003ch4\u003eMore about ASML technology\u003c/h4\u003e"}}}]}},{"uid":"f808244e-2e77-4c86-861c-67e3c16919ce","componentName":"ContentCards","dataSource":"bc37340f-6ff9-496e-8be9-87eb1ed9d78c","params":{"GridParameters":"col-span-12","tag":"span","FieldNames":"Default","Styles":"bg-color-primary bg-dark no-pt","CacheClearingBehavior":"Clear on publish"},"fields":{"data":{"datasource":{"children":{"results":[{"text":{"data":{"value":"\u003cp\u003eProviding highest resolution in high-volume manufacturing, ASML’s extreme ultraviolet lithography machines are pushing Moore’s Law forward.\u003c/p\u003e"}},"link":{"data":{"value":{"href":"http://","text":"EUV lithography systems","linktype":"external","url":"","anchor":"","title":"EUV lithography systems","target":""}}},"image":{"data":{"value":{"src":"https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/products/euv-lithography-systems/twinscan-nxe3400c.png?h=1080\u0026iar=0\u0026w=1920","alt":"ASML TWINSCAN NXE:3400C EUV lithography machine","width":"1920","height":"1080"}}},"uiIconName":{"data":{"value":""}},"pictogramName":{"data":{"value":""}}},{"text":{"data":{"value":"\u003cp\u003eASML's deep ultraviolet (DUV) lithography systems dive deep into the UV spectrum to print the tiny features that form the basis of the microchip.\u003c/p\u003e"}},"link":{"data":{"value":{"href":"http://","text":"DUV lithography systems","linktype":"external","url":"","anchor":"","title":"DUV lithography systems","target":""}}},"image":{"data":{"value":{"src":"https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/products/duv-lithography-systems/twinscan-nxt2000i.png?h=1080\u0026iar=0\u0026w=1920","alt":"ASML TWINSCAN NXT:2000i DUV lithography machine","width":"1920","height":"1080"}}},"uiIconName":{"data":{"value":""}},"pictogramName":{"data":{"value":""}}},{"text":{"data":{"value":"\u003cp\u003eDelivering speed and accuracy, our metrology and inspection portfolio covers every step manufacturing processes, from R\u0026amp;D to mass production.\u003c/p\u003e"}},"link":{"data":{"value":{"href":"http://","linktype":"external","url":"","target":"","class":"","text":"Metrology \u0026 inspection systems","title":"Metrology and inspection systems"}}},"image":{"data":{"value":{"src":"https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/43677-inside-nxe3400.jpg?h=1080\u0026iar=0\u0026w=1920","alt":"NXE3400 metrology","width":"1920","height":"1080"}}},"uiIconName":{"data":{"value":""}},"pictogramName":{"data":{"value":""}}},{"text":{"data":{"value":"\u003cp\u003eASML's industry-leading computational lithography products enable accurate lithography simulations that help to improve chip yield and quality.\u003c/p\u003e"}},"link":{"data":{"value":{"href":"http://","text":"Computational lithography","linktype":"external","url":"","anchor":"","title":"Computational lithography","target":""}}},"image":{"data":{"value":{"src":"https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/project/asmlcom/asmlcom/asml/images/technology/lithography-elements/47149-lithography-elements-wafer-reticle.jpg?h=1280\u0026iar=0\u0026w=1920","alt":"lithography elements wafer reticle","width":"1920","height":"1280"}}},"uiIconName":{"data":{"value":""}},"pictogramName":{"data":{"value":""}}}]}}}}}],"headless-footer":[{"uid":"1def0f9e-1a7c-4500-9971-6ff08b0d440f","componentName":"PartialDesignDynamicPlaceholder","dataSource":"","params":{"sid":"{1DEF0F9E-1A7C-4500-9971-6FF08B0D440F}","ph":"headless-footer","sig":"sxa-footer"},"placeholders":{"sxa-footer":[{"uid":"141a30f9-76ae-4383-867b-0607fb938b0c","componentName":"Breadcrumbs","dataSource":"","params":{"FieldNames":"FooterBreadcrumbs","CacheClearingBehavior":"Clear on publish"},"fields":{"data":{"contextItem":{"navigationTitle":{"value":"Measuring accuracy"},"hideFooter":{"data":{"value":false}},"url":{"path":"/en/technology/lithography-principles/measuring-accuracy"},"ancestors":[{"navigationTitle":{"value":"Lithography principles"},"url":{"path":"/en/technology/lithography-principles"}},{"navigationTitle":{"value":"Technology"},"url":{"path":"/en/technology"}},{"navigationTitle":{"value":"Home"},"url":{"path":"/en/"}}],"parentItem":null}}}},{"uid":"f126ad4c-0903-434f-8994-e2363425a66a","componentName":"CustomContainer","dataSource":"","params":{"FieldNames":"Default","CacheClearingBehavior":"Clear on publish","GridParameters":"col-span-12","Styles":"px-1"},"placeholders":{"content-component-placeholder":[{"uid":"0509cb4a-8135-4725-8bb2-687968447bb4","componentName":"LinkList","dataSource":"/sitecore/content/asmlcom/asmlcom/Presentation/Partial Designs/Footer/Data/Learn","params":{"FieldNames":"Default","CacheClearingBehavior":"Clear on publish","GridParameters":"col-span-12 md:col-span-4 md:col-start-3 lg:col-span-2 lg:col-start-3"},"fields":{"data":{"datasource":{"children":{"results":[{"field":{"link":{"value":{"text":"ASML at a glance","anchor":"","linktype":"internal","class":"","title":"ASML at a glance","target":"","querystring":"","id":"{AC94EE61-87D1-49CE-AE57-A2C38CBADBFF}","href":"/en/company/about-asml/asml-at-a-glance"}}}},{"field":{"link":{"value":{"text":"History","anchor":"","linktype":"internal","class":"","title":"History","target":"","querystring":"","id":"{C4BDD45F-37D2-4C30-8465-F804B4F00779}","href":"/en/company/about-asml/history"}}}},{"field":{"link":{"value":{"text":"Products","anchor":"","linktype":"internal","class":"","title":"Products","target":"","querystring":"","id":"{37755A48-C01C-40F6-9ED0-04C28C96EC48}","href":"/en/products"}}}},{"field":{"link":{"value":{"text":"Technology","anchor":"","linktype":"internal","class":"","title":"Technology","target":"","querystring":"","id":"{C44C4F02-B75D-43AB-A2F0-A85B119C6E64}","href":"/en/technology"}}}},{"field":{"link":{"value":{"text":"Sustainability","anchor":"","linktype":"internal","class":"","title":"Sustainability","target":"","querystring":"","id":"{0665865A-2730-4031-95F9-8FCA24770918}","href":"/en/company/sustainability"}}}},{"field":{"link":{"value":{"text":"News","anchor":"","linktype":"internal","class":"","title":"News","target":"","querystring":"","id":"{275F21FA-E198-482D-9FE2-3DDBE17E3A5E}","href":"/en/news"}}}}]},"field":{"title":{"value":"Learn"}}}}}},{"uid":"f0a8815f-46c6-4c3a-8908-f758e5afdcd2","componentName":"LinkList","dataSource":"/sitecore/content/asmlcom/asmlcom/Presentation/Partial Designs/Footer/Data/Careers","params":{"FieldNames":"Default","CacheClearingBehavior":"Clear on publish","GridParameters":"col-span-12 md:col-span-4 lg:col-span-2"},"fields":{"data":{"datasource":{"children":{"results":[{"field":{"link":{"value":{"class":"","id":"2188a6a6-fa98-476c-b698-e3ac66eb1151","querystring":"","anchor":"","target":"","title":"Job search","linktype":"internal","text":"Job search","url":"/asmlcom/asmlcom/Home/careers/Find Your Job","href":"/en/careers/find-your-job"}}}},{"field":{"link":{"value":{"class":"","id":"b2d4499f-dd27-4c7f-b78e-badd651ad9c6","querystring":"","anchor":"","target":"","title":"Careers","linktype":"internal","text":"Careers","url":"/asmlcom/asmlcom/Home/careers","href":"/en/careers"}}}},{"field":{"link":{"value":{"text":"Organization","anchor":"","linktype":"internal","class":"","title":"Organization","target":"","querystring":"","id":"{7ACB9FCA-B03F-4F54-A3BA-9FA634CD6091}","href":"/en/company/about-asml/organization"}}}},{"field":{"link":{"value":{"text":"Locations","anchor":"","linktype":"internal","class":"","title":"Locations","target":"","querystring":"","id":"{C64D829A-7395-4052-B8AD-0C67F9B1D188}","href":"/en/company/about-asml/locations"}}}}]},"field":{"title":{"value":"Work At ASML"}}}}}},{"uid":"382e98a8-7684-4064-bb50-6e66f03d2108","componentName":"LinkList","dataSource":"/sitecore/content/asmlcom/asmlcom/Presentation/Partial Designs/Footer/Data/Invest","params":{"FieldNames":"Default","CacheClearingBehavior":"Clear on publish","GridParameters":"col-span-12 md:col-span-4 md:col-start-3 lg:col-span-2"},"fields":{"data":{"datasource":{"children":{"results":[{"field":{"link":{"value":{"text":"Why invest in ASML","anchor":"","linktype":"internal","class":"","title":"Why invest in ASML","target":"","querystring":"","id":"{8ED633EE-BFC9-489E-B12B-DA0A2CE082E2}","href":"/en/investors/why-invest-in-asml"}}}},{"field":{"link":{"value":{"text":"Annual report","anchor":"","linktype":"internal","class":"","title":"Annual report","target":"","querystring":"","id":"{015ACE77-3E91-4ADF-AEA4-49BCF8EC1E08}","href":"/en/investors/annual-report"}}}},{"field":{"link":{"value":{"text":"Financial results","anchor":"","linktype":"internal","class":"","title":"Financial results","target":"","querystring":"","id":"{89934261-03E4-4E1E-81A9-B4E2C585ED58}","href":"/en/investors/financial-results"}}}},{"field":{"link":{"value":{"text":"Investor days","anchor":"","linktype":"internal","class":"","title":"Investor days","target":"","querystring":"","id":"{E8E378D9-9962-4EE5-B6B7-B9B1A07AC5C3}","href":"/en/investors/investor-days"}}}},{"field":{"link":{"value":{"text":"Shares","anchor":"","linktype":"internal","class":"","title":"Shares","target":"","querystring":"","id":"{2564C540-F159-4901-A9F9-B141EA007C72}","href":"/en/investors/shares"}}}}]},"field":{"title":{"value":"Invest"}}}}}},{"uid":"048d8c9c-399b-4c7c-a02e-f4e3409b0c8e","componentName":"LinkList","dataSource":"/sitecore/content/asmlcom/asmlcom/Presentation/Partial Designs/Footer/Data/Get in touch","params":{"FieldNames":"Default","CacheClearingBehavior":"Clear on publish","GridParameters":"col-span-12 md:col-span-4 lg:col-span-2"},"fields":{"data":{"datasource":{"children":{"results":[{"field":{"link":{"value":{"text":"Contact information","anchor":"","linktype":"internal","class":"","title":"Contact information","target":"","querystring":"","id":"{51C4D8C9-4A8E-4453-9814-C16FD44DA48D}","href":"/en/contact-us"}}}},{"field":{"link":{"value":{"text":"Contact Media Relations","anchor":"","linktype":"internal","class":"","title":"Contact Media Relations","target":"","querystring":"","id":"{FFDD3747-5D0F-4800-907B-2300256E9DBB}","href":"/en/news/contact-media-relations"}}}},{"field":{"link":{"value":{"text":"Contact Investor Relations","anchor":"","linktype":"internal","class":"","title":"Contact Investor Relations","target":"","querystring":"","id":"{59EB3841-4006-47F9-9372-592ED2F485AD}","href":"/en/investors/contact-investor-relations"}}}},{"field":{"link":{"value":{"text":"CustomerNet","anchor":"","linktype":"internal","class":"","title":"CustomerNet","target":"","querystring":"","id":"{65DF5A50-A7BB-4FE2-8DED-32A4D2BA6D27}","href":"/en/products/customernet"}}}},{"field":{"link":{"value":{"text":"SupplierNet","anchor":"","linktype":"internal","class":"","title":"SupplierNet","target":"","querystring":"","id":"{D847C60C-DB17-424F-BA09-C6A4407B9B48}","href":"/en/products/supplier-net"}}}}]},"field":{"title":{"value":"Get in touch"}}}}}},{"uid":"dfb038a5-06e7-4c87-a093-c4c5dad2bda8","componentName":"CustomContainer","dataSource":"","params":{"GridParameters":"col-span-12","FieldNames":"Default","Styles":"no-pt no-px","CacheClearingBehavior":"Clear on publish"},"placeholders":{"content-component-placeholder":[{"uid":"7ae23467-f3f0-402f-8d1b-5c766422773d","componentName":"SocialMediaChannels","dataSource":"/sitecore/content/asmlcom/asmlcom/Presentation/Partial Designs/Footer/Data/Social Media Channels","params":{"FieldNames":"Default","CacheClearingBehavior":"Clear on publish","linkedin":"1","twitter":"1","facebook":"1","tag":"h4","GridParameters":"col-span-12 md:col-span-4 md:col-start-3 xl:col-start-3","glassdoor":"1","instagram":"1","youtube":"1"},"fields":{"iconSrc":{"value":{"href":"https://edge.sitecorecloud.io/asmlnetherlaaea-asmlcom-prd-5369/media/foundation/settings-templates/icons/social.svg","linktype":"media","target":"","id":"{4E1ADE65-A911-437A-9FCC-EB55BF28428F}"}},"title":{"value":"Social Media"},"linkedin":{"value":{"href":"https://www.linkedin.com/company/asml","linktype":"external","url":"https://www.linkedin.com/company/asml","target":"","class":"","text":"LinkedIn","title":"LinkedIn"}},"twitter":{"value":{"href":"https://twitter.com/asmlcompany","text":"X","linktype":"external","url":"https://twitter.com/asmlcompany","anchor":"","title":"X","target":""}},"wechat":{"value":{"href":""}},"whatsapp":{"value":{"href":""}},"youtube":{"value":{"href":"https://www.youtube.com/channel/UCIT9d3JjHEnsVi_w9guSXvA","linktype":"external","url":"https://www.youtube.com/channel/UCIT9d3JjHEnsVi_w9guSXvA","target":"","class":"","text":"Youtube","title":"Youtube"}},"email":{"value":{"href":""}},"facebook":{"value":{"href":"https://www.facebook.com/asml/","linktype":"external","url":"https://www.facebook.com/asml/","target":"","class":"","text":"Facebook","title":"Facebook"}},"glassdoor":{"value":{"href":"https://www.glassdoor.com/Reviews/ASML-Reviews-E5781.htm","linktype":"external","url":"https://www.glassdoor.com/Reviews/ASML-Reviews-E5781.htm","target":"","class":"","text":"Glassdoor","title":"Glassdoor"}},"instagram":{"value":{"href":"http://www.instagram.com/lifeatasml","linktype":"external","url":"www.instagram.com/lifeatasml","target":"","class":"","text":"Instagram","title":"Instagram"}}},"placeholders":{"social-links":[]}},{"uid":"0aa0ce68-2665-4a66-80d0-edad05fe801b","componentName":"CookiePreferences","dataSource":"10073450-0f44-46be-9277-e35fd5310c0e","params":{"FieldNames":"Default","icon":"wide-arrow-right","CacheClearingBehavior":"Clear on publish","GridParameters":"col-span-12 xl:col-span-12 xl:col-start-7 xl:col-start-7 lg:col-start-7 md:col-start-7","buttonType":"button--box-lightblue"},"fields":{"callToAction":{"value":"Manage cookie settings"}}}]}}]}},{"uid":"b0247ae3-c482-4b00-95a7-a9741ae655d4","componentName":"CustomContainer","dataSource":"","params":{"FieldNames":"Default","CacheClearingBehavior":"Clear on publish","Styles":"bg-color-white bg-light no-pt no-pb box","GridParameters":"col-span-12"},"placeholders":{"content-component-placeholder":[{"uid":"6ced6560-52da-48bf-a8a7-75c13514464a","componentName":"CustomRichText","dataSource":"/sitecore/content/asmlcom/asmlcom/Presentation/Partial Designs/Footer/Data/Copy right and all rights preserved","params":{"FieldNames":"Default","CacheClearingBehavior":"Clear on publish","GridParameters":"col-span-12 lg:col-span-6 order-1","Styles":"text-footer"},"fields":{"content":{"value":"\u003cp\u003e\u003cspan style=\"color: rgb(128, 127, 139);\"\u003eCopyright © 2019-2024 (ASML) All Rights Reserved\u003c/span\u003e\u003c/p\u003e"}}},{"uid":"ca4d2b5d-de69-4486-97e8-ecaa052256c2","componentName":"LinkList","dataSource":"/sitecore/content/asmlcom/asmlcom/Presentation/Partial Designs/Footer/Data/Legal","params":{"FieldNames":"Inline","CacheClearingBehavior":"Clear on publish","GridParameters":"col-span-12 lg:col-start-8 lg:order-1 order-0","Styles":"lg:text-right"},"fields":{"data":{"datasource":{"children":{"results":[{"field":{"link":{"value":{"text":"Terms of use","anchor":"","linktype":"internal","class":"","title":"Terms of use","target":"","querystring":"","id":"{1D46BEAD-9CCF-42AD-9828-5973771C5BE3}","href":"/en/terms-of-use"}}}},{"field":{"link":{"value":{"href":"https://www.asml.com/en/privacy","linktype":"external","url":"https://www.asml.com/en/privacy","target":"","class":"","text":"Privacy","title":"Privacy"}}}},{"field":{"link":{"value":{"class":"","querystring":"","id":"{06B821FD-B804-400C-966F-4B41EBFD10C5}","anchor":"","target":"","title":"Cookies","linktype":"internal","text":"Cookies","url":"/asmlcom/asmlcom/Home/Cookie notice","href":"/en/cookie-notice"}}}},{"field":{"link":{"value":{"href":"https://www.asml.com/en/general-terms-and-conditions","linktype":"external","url":"https://www.asml.com/en/general-terms-and-conditions","target":"","class":"","text":"Terms \u0026 conditions","title":"Terms \u0026 conditions"}}}}]},"field":{"title":{"value":"Copyright © 2019-2022 (ASML) All Rights Reserved"}}}}}}]}}]}}]}}}},"dictionary":{"job-search-search-sorting":"Search Sorting","job-search-jobs-search-sorting":"Job search sorting","pagination-prev":"previous","pagination-next":"next","iframe-whitelist-warning":"Url is not whitelisted","form-field-min-amount":"Amount should be higher than 0","author-by":"by","search-result-label-story_page":"Story","article-summary-details-type-press_release_page":"Press release","article-summary-details-type-share_buyback_page":"Press release","article-summary-details-type-announcement_page":"Announcement","scrollytelling-scroll":"Scroll","scrollytelling-open-menu":"Open Menu","scrollytelling-more-details":"Click for more details","scrollytelling-menu":"Menu","scrollytelling-close-section":"Click to close","scrollytelling-close":"Close","search-result-label-share_buyback_page":"Page","search-result-label-product_detail_page":"Product","search-result-label-press_release_page":"Press release","search-result-label-life_at_asml_page":"Page","search-result-label-financial_results_page":"Page","search-result-label-generic_page":"Page","search-result-label-asml_page":"Page","search-result-label-announcement_page":"Announcement","form-field-numbers-only":"Please enter numbers only","quick-filter-story_page":"Stories","quick-filter-press_release_page":"Press releases","quick-filter-announcement_page":"Announcements","quick-filter-share_buyback_page":"Share buyback","timeline-tileview-toggle":"Tileview","timeline-slideview-toggle":"Slideview","timeline-previous-arrow":"Previous","timeline-next-arrow":"Next","timeline-slideview-disabled":"Slideview is disabled while editing.","html-regex-pattern":"\u003c[^\u003e]*\u003e","form-field-max-length":"Must be {max} characters or less.","onetrust-overlay-disable":"Disabled","onetrust-overlay-enable":"Enabled","jobs-social-share-whatsapp":"https://api.whatsapp.com/send?text=${jobLink}","jobs-social-share-whatsapp-label":"WhatsApp","jobs-social-share-twitter-label":"Twitter","jobs-social-share-twitter":"https://twitter.com/intent/tweet?url=${jobLink}","jobs-social-share-linkedin":"https://www.linkedin.com/shareArticle?mini=true\u0026url=${jobLink}","jobs-social-share-headline":"Share this job","jobs-social-share-linkedin-label":"LinkedIn","jobs-social-share-facebook-label":"Facebook","jobs-social-share-email-subject":"Check out this job at ASML","jobs-social-share-facebook":"https://www.facebook.com/sharer/sharer.php?u=${jobLink}","job-listing-hero-banner-apply-now-button":"Apply Now","jobs-social-share-email-body":"Hi,\r\n\r\nI think this job '${jobTitle}' at ASML might be something for you: ${jobLink}.\r\n\r\nKind regards,","jobs-social-share-email-label":"Email","jobs-country-link-text-united-states":"United States","jobs-team-link-text-research-development":"Research \u0026 development","jobs-country-link-text-the-netherlands":"The Netherlands","jobs-country-link-text-taiwan":"Taiwan","jobs-country-link-text-south-korea":"South Korea","jobs-city-link-text-wilton-ct":"Wilton Connecticut","jobs-country-link-text-china":"China","jobs-country-link-text-japan":"Japan","jobs-city-link-text-tokyo":"Tokyo","jobs-city-link-text-veldhoven-the-netherlands":"Veldhoven, the Netherlands","jobs-city-link-text-silicon-valley":"Silicon Valley","jobs-city-link-text-tainan":"Tainan","jobs-city-link-text-san-diego":"San Diego","jobs-city-link-text-linkou":"Linkou","jobs-city-link-text-shenzhen":"Shenzhen","jobs-city-link-text-shanghai":"Shanghai","jobs-city-link-text-hsinchu":"Hsinchu","jobs-city-link-text-hong-kong":"Hong Kong","jobs-city-link-text-hwasung-si":"Hwasung Si","jobs-city-link-text-hilsboro-oregon":"Hilsboro Oregon","jobs-city-link-text-chandler-arizona":"Chandler Arizona","jobs-city-link-text-berlin":"Berlin","jobs-city-link-text-beijing":"Beijing","jobs-category-link-text-mechanical-engineering":"Mechanical engineering","jobs-team-link-research-development":"https://www.asml.com/en/careers/teams/research-development","jobs-country-link-the-netherlands":"https://www.asml.com/en/careers/working-at-asml/netherlands","jobs-team-link-math":"https://www.asml.com/en/careers/teams/math","jobs-city-link-berlin":"https://www.asml.com/en/company/about-asml/locations/berlin","jobs-city-link-chandler-arizona":"https://www.asml.com/en/company/about-asml/locations/chandler-arizona","jobs-city-link-wilton-ct":"https://www.asml.com/en/company/about-asml/locations/wilton-ct","jobs-city-link-veldhoven":"https://www.asml.com/en/company/about-asml/locations/veldhoven","jobs-city-link-hillsboro-oregon":"https://www.asml.com/en/company/about-asml/locations/hillsboro-oregon","jobs-city-link-san-diego":"https://www.asml.com/en/company/about-asml/locations/san-diego","jobs-city-link-silicon-valley":"https://www.asml.com/en/company/about-asml/locations/silicon-valley","jobs-category-link-mechanical-engineering":"https://www.asml.com/en/careers/job-categories/mechanical-engineering","jobs-search-results-counter-singular":"\u003cstrong\u003e1\u003c/strong\u003e result","jobs-search-results-counter":"\u003cstrong\u003e${count}\u003c/strong\u003e results","jobs-search-results-page-indicator":"Page ${page} / ${totalPages}","job-select-cities-label":"Select Cities","job-filter-location-label":"Filter jobs by location","job-search-results-new-label":"New","job-active-filters-label":"active","toggle-main-header":"toggle main header","toggle-search":"toggle search","header-saved-jobs-toast":"We saved your job","header-back":"Back","header-icon-previous":"icon: previous","recaptcha-required-message":"The recaptcha is a required field","form-field-required":"This is a required field","form-save-failed-message":"Saving the form was not possible, please try later.","no-filter-selected-message":"At least one filter at step 1 is required","form-label-optional":"Optional","enter-valid-email-address":"Please enter a valid email address.","email-field-required":"This is a required field","email-field-max-length":"255","email-field-pattern":"^(([^\u003c\u003e()\\[\\]\\\\.,;:\\s@\"]+(\\.[^\u003c\u003e()\\[\\]\\\\.,;:\\s@\"]+)*)|(\".+\"))@((\\[[0-9]{1,3}\\.[0-9]{1,3}\\.[0-9]{1,3}\\.[0-9]{1,3}])|(([a-zA-Z\\-0-9]+\\.)+[a-zA-Z]{2,}))$","form-email-address-invalid":"Email address contains an invalid email address.","facet_job_type_fix":"Jobs","facet_job_type_internship":"Internships","events-no-start-date":"No start date","facet_job_type_all":"Both","events-invalid-end-date":"Invalid end date","form-no-html-tags":"HTML tags are not allowed"},"headLinks":[],"componentProps":{},"notFound":false,"jsonLdData":[]},"__N_SSG":true},"page":"/[[...path]]","query":{"path":["_site_asmlcom","technology","lithography-principles","measuring-accuracy"]},"buildId":"PH6eWgf8kLvgkUlNp5hb1","assetPrefix":"https://www.asml.com","isFallback":false,"isExperimentalCompile":false,"gsp":true,"locale":"en","locales":["default","en","ko-kr","de-de","zh-tw","zh-cn","ja-jp","nl-nl","en-us"],"defaultLocale":"default","scriptLoader":[]}</script></body></html>