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Search results for: aluminum nitride

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text-center" style="font-size:1.6rem;">Search results for: aluminum nitride</h1> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">780</span> Electrical Properties of Polarization-Induced Aluminum Nitride/Gallium Nitride Heterostructures Homoepitaxially Grown on Aluminum Nitride Sapphire Template by Molecular Beam Epitaxy</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=Guanlin%20Wu">Guanlin Wu</a>, <a href="https://publications.waset.org/abstracts/search?q=Jiajia%20Yao"> Jiajia Yao</a>, <a href="https://publications.waset.org/abstracts/search?q=Fang%20Liu"> Fang Liu</a>, <a href="https://publications.waset.org/abstracts/search?q=Junshuai%20Xue"> Junshuai Xue</a>, <a href="https://publications.waset.org/abstracts/search?q=Jincheng%20Zhang"> Jincheng Zhang</a>, <a href="https://publications.waset.org/abstracts/search?q=Yue%20Hao"> Yue Hao</a> </p> <p class="card-text"><strong>Abstract:</strong></p> Owing to the excellent thermal conductivity and ultra-wide bandgap, Aluminum nitride (AlN)/Gallium nitride (GaN) is a highly promising material to achieve high breakdown voltage and output power devices among III-nitrides. In this study, we explore the growth and characterization of polarization-induced AlN/GaN heterostructures using plasma-assisted molecular beam epitaxy (PA-MBE) on AlN-on-sapphire templates. To improve the crystal quality and demonstrate the effectiveness of the PA-MBE approach, a thick AlN buffer of 180 nm was first grown on the AlN-on sapphire template. This buffer acts as a back-barrier to enhance the breakdown characteristic and isolate leakage paths that exist in the interface between the AlN epilayer and the AlN template. A root-mean-square roughness of 0.2 nm over a scanned area of 2×2 µm2 was measured by atomic force microscopy (AFM), and the full-width at half-maximum of (002) and (102) planes on the X-ray rocking curve was 101 and 206 arcsec, respectively, using by high-resolution X-ray diffraction (HR-XRD). The electron mobility of 443 cm2/Vs with a carrier concentration of 2.50×1013 cm-2 at room temperature was achieved in the AlN/GaN heterostructures by using a polarization-induced GaN channel. The low depletion capacitance of 15 pF is resolved by the capacitance-voltage. These results indicate that the polarization-induced AlN/GaN heterostructures have great potential for next-generation high-temperature, high-frequency, and high-power electronics. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=AlN" title="AlN">AlN</a>, <a href="https://publications.waset.org/abstracts/search?q=GaN" title=" GaN"> GaN</a>, <a href="https://publications.waset.org/abstracts/search?q=MBE" title=" MBE"> MBE</a>, <a href="https://publications.waset.org/abstracts/search?q=heterostructures" title=" heterostructures"> heterostructures</a> </p> <a href="https://publications.waset.org/abstracts/165723/electrical-properties-of-polarization-induced-aluminum-nitridegallium-nitride-heterostructures-homoepitaxially-grown-on-aluminum-nitride-sapphire-template-by-molecular-beam-epitaxy" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/165723.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">85</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">779</span> Strained Channel Aluminum Nitride/Gallium Nitride Heterostructures Homoepitaxially Grown on Aluminum Nitride-On-Sapphire Template by Plasma-Assisted Molecular Beam Epitaxy</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=Jiajia%20Yao">Jiajia Yao</a>, <a href="https://publications.waset.org/abstracts/search?q=GuanLin%20Wu"> GuanLin Wu</a>, <a href="https://publications.waset.org/abstracts/search?q=Fang%20liu"> Fang liu</a>, <a href="https://publications.waset.org/abstracts/search?q=JunShuai%20Xue"> JunShuai Xue</a>, <a href="https://publications.waset.org/abstracts/search?q=JinCheng%20Zhang"> JinCheng Zhang</a>, <a href="https://publications.waset.org/abstracts/search?q=Yue%20Hao">Yue Hao</a> </p> <p class="card-text"><strong>Abstract:</strong></p> Due to its outstanding material properties like high thermal conductivity and ultra-wide bandgap, Aluminum nitride (AlN) has the promising potential to provide high breakdown voltage and high output power among III-nitrides for various applications in electronics and optoelectronics. This work presents material growth and characterization of strained channel Aluminum nitride/Gallium nitride (AlN/GaN) heterostructures grown by plasma-assisted molecular beam epitaxy (PA-MBE) on AlN-on-sapphire templates. To improve the crystal quality and manifest the ability of the PA-MBE approach, a thick AlN buffer with a thickness of 180 nm is first grown on AlN template, which acts as a back-barrier to enhance the breakdown characteristic and isolates the leakage path existing in the interface between AlN epilayer and AlN template, as well as improve the heat dissipation. The grown AlN buffer features a root-mean-square roughness of 0.2 nm over a scanned area of 2×2 µm2 measured by atomic force microscopy (AFM), and exhibits full-width at half-maximum of 95 and 407 arcsec for the (002) and (102) plane the X-ray rocking curve, respectively, tested by high resolution x-ray diffraction (HR-XRD). With a thin and strained GaN channel, the electron mobility of 294 cm2 /Vs. with a carrier concentration of 2.82×1013 cm-2 at room temperature is achieved in AlN/GaN double-channel heterostructures, and the depletion capacitance is as low as 14 pF resolved by the capacitance-voltage, which indicates the promising opportunities for future applications in next-generation high temperature, high-frequency and high-power electronics with a further increased electron mobility by optimization of heterointerface quality. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=AlN%2FGaN" title="AlN/GaN">AlN/GaN</a>, <a href="https://publications.waset.org/abstracts/search?q=HEMT" title=" HEMT"> HEMT</a>, <a href="https://publications.waset.org/abstracts/search?q=MBE" title=" MBE"> MBE</a>, <a href="https://publications.waset.org/abstracts/search?q=homoepitaxy" title=" homoepitaxy"> homoepitaxy</a> </p> <a href="https://publications.waset.org/abstracts/157776/strained-channel-aluminum-nitridegallium-nitride-heterostructures-homoepitaxially-grown-on-aluminum-nitride-on-sapphire-template-by-plasma-assisted-molecular-beam-epitaxy" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/157776.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">96</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">778</span> Hard Coatings Characterization Based on Chromium Nitrides: Applications for Wood Machining</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=B.%20Chemani">B. Chemani</a>, <a href="https://publications.waset.org/abstracts/search?q=H.%20Aknouche"> H. Aknouche</a>, <a href="https://publications.waset.org/abstracts/search?q=A.%20Zerizer"> A. Zerizer</a>, <a href="https://publications.waset.org/abstracts/search?q=R.%20Marchal"> R. Marchal</a> </p> <p class="card-text"><strong>Abstract:</strong></p> The phenomena occurring during machining are related to the internal friction of the material that deforms and the friction the flake on the rake face of tool. Various researches have been conducted to improve the wear resistance of the tool by thin film deposition. This work aims to present an experimental approach related to wood machining technique to evaluate the wear for the case of ripping Aleppo pine, a species well established in the Mediterranean in general and in Algeria in particular. The study will be done on tungsten carbide cutting tools widely used in woodworking and coated with chrome nitride (CrN) and Chromium Nitride enriched Aluminium (CrAlN) with percentage different of aluminum sputtered through frame magnetron mark Nordiko 3500. The deposition conditions are already optimized by previous studies. The wear tests were performed in the laboratory of ENSAM Cluny (France) on a numerical control ripper of recordi type. This comparative study of the behavior of tools, coated and uncoated, showed that the addition of the aluminum chromium nitride films does not improve the tool ability to resist abrasive wear that is predominant when ripping the Aleppo pine. By against the aluminum addition improves the crystallization of chromium nitride films. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=Aleppo%20pine" title="Aleppo pine">Aleppo pine</a>, <a href="https://publications.waset.org/abstracts/search?q=PVD" title=" PVD"> PVD</a>, <a href="https://publications.waset.org/abstracts/search?q=coatings" title=" coatings"> coatings</a>, <a href="https://publications.waset.org/abstracts/search?q=CrAlN" title=" CrAlN"> CrAlN</a>, <a href="https://publications.waset.org/abstracts/search?q=wear" title=" wear"> wear</a> </p> <a href="https://publications.waset.org/abstracts/25931/hard-coatings-characterization-based-on-chromium-nitrides-applications-for-wood-machining" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/25931.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">568</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">777</span> Design and Simulation of Step Structure RF MEMS Switch for K Band Applications</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=G.%20K.%20S.%20Prakash">G. K. S. Prakash</a>, <a href="https://publications.waset.org/abstracts/search?q=Rao%20K.%20Srinivasa"> Rao K. Srinivasa</a> </p> <p class="card-text"><strong>Abstract:</strong></p> MEMS plays an important role in wide range of applications like biological, automobiles, military and communication engineering. This paper mainly investigates on capacitive shunt RF MEMS switch with low actuation voltage and low insertion losses. To trim the pull-in voltage, a step structure has introduced to trim air gap between the beam and the dielectric layer with that pull in voltage is trim to 2.9 V. The switching time of the proposed switch is 39.1μs, and capacitance ratio is 67. To get more isolation, we have used aluminum nitride as dielectric material instead of silicon nitride (Si₃N₄) and silicon dioxide (SiO₂) because aluminum nitride has high dielectric constant (εᵣ = 9.5) increases the OFF capacitance and eventually increases the isolation of the switch. The results show that the switch is ON state involves return loss (S₁₁) less than -25 dB up to 40 GHz and insertion loss (S₂₁) is more than -1 dB up to 35 GHz. In OFF state switch shows maximum isolation (S₂₁) of -38 dB occurs at a frequency of 25-27 GHz for K band applications. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=RF%20MEMS" title="RF MEMS">RF MEMS</a>, <a href="https://publications.waset.org/abstracts/search?q=actuation%20voltage" title=" actuation voltage"> actuation voltage</a>, <a href="https://publications.waset.org/abstracts/search?q=isolation%20loss" title=" isolation loss"> isolation loss</a>, <a href="https://publications.waset.org/abstracts/search?q=switches" title=" switches"> switches</a> </p> <a href="https://publications.waset.org/abstracts/70729/design-and-simulation-of-step-structure-rf-mems-switch-for-k-band-applications" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/70729.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">362</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">776</span> Resistive Switching in TaN/AlNx/TiN Cell</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=Hsin-Ping%20Huang">Hsin-Ping Huang</a>, <a href="https://publications.waset.org/abstracts/search?q=Shyankay%20Jou"> Shyankay Jou</a> </p> <p class="card-text"><strong>Abstract:</strong></p> Resistive switching of aluminum nitride (AlNx) thin film was demonstrated in a TaN/AlNx/TiN memory cell that was prepared by sputter deposition techniques. The memory cell showed bipolar switching of resistance between +3.5 V and –3.5 V. The resistance ratio of high resistance state (HRS) to low resistance state (HRS), RHRS/RLRS, was about 2 over 100 cycles of endurance test. Both the LRS and HRS of the memory cell exhibited ohmic conduction at low voltages and Poole-Frenkel emission at high voltages. The electrical conduction in the TaN/AlNx/TiN memory cell was possibly attributed to the interactions between charges and defects in the AlNx film. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=aluminum%20nitride" title="aluminum nitride">aluminum nitride</a>, <a href="https://publications.waset.org/abstracts/search?q=nonvolatile%20memory" title=" nonvolatile memory"> nonvolatile memory</a>, <a href="https://publications.waset.org/abstracts/search?q=resistive%20switching" title=" resistive switching"> resistive switching</a>, <a href="https://publications.waset.org/abstracts/search?q=thin%20films" title=" thin films"> thin films</a> </p> <a href="https://publications.waset.org/abstracts/7604/resistive-switching-in-tanalnxtin-cell" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/7604.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">399</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">775</span> Fabrication of Aluminum Nitride Thick Layers by Modified Reactive Plasma Spraying</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=C%C3%A9cile%20Dufloux">Cécile Dufloux</a>, <a href="https://publications.waset.org/abstracts/search?q=Klaus%20B%C3%B6ttcher"> Klaus Böttcher</a>, <a href="https://publications.waset.org/abstracts/search?q=Heike%20Oppermann"> Heike Oppermann</a>, <a href="https://publications.waset.org/abstracts/search?q=J%C3%BCrgen%20Wollweber"> Jürgen Wollweber</a> </p> <p class="card-text"><strong>Abstract:</strong></p> Hexagonal aluminum nitride (AlN) is a promising candidate for several wide band gap semiconductor compound applications such as deep UV light emitting diodes (UVC LED) and fast power transistors (HEMTs). To date, bulk AlN single crystals are still commonly grown from the physical vapor transport (PVT). Single crystalline AlN wafers obtained from this process could offer suitable substrates for a defect-free growth of ultimately active AlGaN layers, however, these wafers still lack from small sizes, limited delivery quantities and high prices so far.Although there is already an increasing interest in the commercial availability of AlN wafers, comparatively cheap Si, SiC or sapphire are still predominantly used as substrate material for the deposition of active AlGaN layers. Nevertheless, due to a lattice mismatch up to 20%, the obtained material shows high defect densities and is, therefore, less suitable for high power devices as described above. Therefore, the use of AlN with specially adapted properties for optical and sensor applications could be promising for mass market products which seem to fulfill fewer requirements. To respond to the demand of suitable AlN target material for the growth of AlGaN layers, we have designed an innovative technology based on reactive plasma spraying. The goal is to produce coarse grained AlN boules with N-terminated columnar structure and high purity. In this process, aluminum is injected into a microwave stimulated nitrogen plasma. AlN, as the product of the reaction between aluminum powder and the plasma activated N2, is deposited onto the target. We used an aluminum filament as the initial material to minimize oxygen contamination during the process. The material was guided through the nitrogen plasma so that the mass turnover was 10g/h. To avoid any impurity contamination by an erosion of the electrodes, an electrode-less discharge was used for the plasma ignition. The pressure was maintained at 600-700 mbar, so the plasma reached a temperature high enough to vaporize the aluminum which subsequently was reacting with the surrounding plasma. The obtained products consist of thick polycrystalline AlN layers with a diameter of 2-3 cm. The crystallinity was determined by X-ray crystallography. The grain structure was systematically investigated by optical and scanning electron microscopy. Furthermore, we performed a Raman spectroscopy to provide evidence of stress in the layers. This paper will discuss the effects of process parameters such as microwave power and deposition geometry (specimen holder, radiation shields, ...) on the topography, crystallinity, and stress distribution of AlN. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=aluminum%20nitride" title="aluminum nitride">aluminum nitride</a>, <a href="https://publications.waset.org/abstracts/search?q=polycrystal" title=" polycrystal"> polycrystal</a>, <a href="https://publications.waset.org/abstracts/search?q=reactive%20plasma%20spraying" title=" reactive plasma spraying"> reactive plasma spraying</a>, <a href="https://publications.waset.org/abstracts/search?q=semiconductor" title=" semiconductor"> semiconductor</a> </p> <a href="https://publications.waset.org/abstracts/47813/fabrication-of-aluminum-nitride-thick-layers-by-modified-reactive-plasma-spraying" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/47813.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">281</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">774</span> Electrical Investigations of Polyaniline/Graphitic Carbon Nitride Composites Using Broadband Dielectric Spectroscopy</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=M.%20A.%20Moussa">M. A. Moussa</a>, <a href="https://publications.waset.org/abstracts/search?q=M.%20H.%20Abdel%20Rehim"> M. H. Abdel Rehim</a>, <a href="https://publications.waset.org/abstracts/search?q=G.M.%20Turky"> G.M. Turky</a> </p> <p class="card-text"><strong>Abstract:</strong></p> Polyaniline composites with carbon nitride, to overcome compatibility restriction with graphene, were prepared with the solution method. FTIR and Uv-vis spectra were used for structural conformation. While XRD and XPS confirmed the structures in addition to estimation of nitrogen atom surroundings, the pore sizes and the active surface area were determined from BET adsorption isotherm. The electrical and dielectric parameters were measured and calculated with BDS . <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=carbon%20nitride" title="carbon nitride">carbon nitride</a>, <a href="https://publications.waset.org/abstracts/search?q=dynamic%20relaxation" title=" dynamic relaxation"> dynamic relaxation</a>, <a href="https://publications.waset.org/abstracts/search?q=electrical%20conductivity" title=" electrical conductivity"> electrical conductivity</a>, <a href="https://publications.waset.org/abstracts/search?q=polyaniline" title=" polyaniline"> polyaniline</a> </p> <a href="https://publications.waset.org/abstracts/135615/electrical-investigations-of-polyanilinegraphitic-carbon-nitride-composites-using-broadband-dielectric-spectroscopy" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/135615.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">142</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">773</span> Study of the Influence of Refractory Nitride Additives on Hydrogen Storage Properties of Ti6Al4V-Based Materials Produced by Spark Plasma Sintering</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=John%20Olorunfemi%20Abe">John Olorunfemi Abe</a>, <a href="https://publications.waset.org/abstracts/search?q=Olawale%20Muhammed%20Popoola"> Olawale Muhammed Popoola</a>, <a href="https://publications.waset.org/abstracts/search?q=Abimbola%20Patricia%20Idowu%20Popoola"> Abimbola Patricia Idowu Popoola</a> </p> <p class="card-text"><strong>Abstract:</strong></p> Hydrogen is an appealing alternative to fossil fuels because of its abundance, low weight, high energy density, and relative lack of contaminants. However, its low density presents a number of storage challenges. Therefore, this work studies the influence of refractory nitride additives consisting of 5 wt. % each of hexagonal boron nitride (h-BN), titanium nitride (TiN), and aluminum nitride (AlN) on hydrogen storage and electrochemical characteristics of Ti6Al4V-based materials produced by spark plasma sintering. The microstructure and phase constituents of the sintered materials were characterized using scanning electron microscopy (in conjunction with energy-dispersive spectroscopy) and X-ray diffraction, respectively. Pressure-composition-temperature (PCT) measurements were used to assess the hydrogen absorption/desorption behavior, kinetics, and storage capacities of the sintered materials, respectively. The pure Ti6Al4V alloy displayed a two-phase (α+β) microstructure, while the modified composites exhibited apparent microstructural modifications with the appearance of nitride-rich secondary phases. It is found that the diffusion process controls the kinetics of the hydrogen absorption. Thus, a faster rate of hydrogen absorption at elevated temperatures ensued. The additives acted as catalysts, lowered the activation energy and accelerated the rate of hydrogen sorption in the composites relative to the monolithic alloy. Ti6Al4V-5 wt. % h-BN appears to be the most promising candidate for hydrogen storage (2.28 wt. %), followed by Ti6Al4V-5 wt. % TiN (2.09 wt. %), whereas Ti6Al4V-5 wt. % AlN shows the least hydrogen storage performance (1.35 wt. %). Accordingly, the developed hydride system (Ti6Al4V-5h-BN) may be competitive for use in applications involving short-range continuous vehicles (~50-100km) as well as stationary applications such as electrochemical devices, large-scale storage cylinders in hydrogen production locations, and hydrogen filling stations. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=hydrogen%20storage" title="hydrogen storage">hydrogen storage</a>, <a href="https://publications.waset.org/abstracts/search?q=Ti6Al4V%20hydride%20system" title=" Ti6Al4V hydride system"> Ti6Al4V hydride system</a>, <a href="https://publications.waset.org/abstracts/search?q=pressure-composition-temperature%20measurements" title=" pressure-composition-temperature measurements"> pressure-composition-temperature measurements</a>, <a href="https://publications.waset.org/abstracts/search?q=refractory%20nitride%20additives" title=" refractory nitride additives"> refractory nitride additives</a>, <a href="https://publications.waset.org/abstracts/search?q=spark%20plasma%20sintering" title=" spark plasma sintering"> spark plasma sintering</a>, <a href="https://publications.waset.org/abstracts/search?q=Ti6Al4V-based%20materials" title=" Ti6Al4V-based materials"> Ti6Al4V-based materials</a> </p> <a href="https://publications.waset.org/abstracts/182054/study-of-the-influence-of-refractory-nitride-additives-on-hydrogen-storage-properties-of-ti6al4v-based-materials-produced-by-spark-plasma-sintering" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/182054.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">72</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">772</span> Microstructure of Ti – AlN Composite Produced by Selective Laser Melting </h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=Jaroslaw%20Mizera">Jaroslaw Mizera</a>, <a href="https://publications.waset.org/abstracts/search?q=Pawel%20Wisniewski"> Pawel Wisniewski</a>, <a href="https://publications.waset.org/abstracts/search?q=Ryszard%20Sitek"> Ryszard Sitek</a> </p> <p class="card-text"><strong>Abstract:</strong></p> Selective Laser Melting (SLM) is an advanced additive manufacturing technique used for producing parts made of wide range of materials such as: austenitic steel, titanium, nickel etc. In the our experiment we produced a Ti-AlN composite from a mixture of titanium and aluminum nitride respectively 70% at. and 30% at. using SLM technique. In order to define the size of powder particles, laser diffraction tests were performed on HORIBA LA-950 device. The microstructure and chemical composition of the composite was examined by Scanning Electron Microscopy (SEM). The chemical composition in micro areas of the obtained samples was determined by of EDS. The phase composition was analyzed by X-ray phase analysis (XRD). Microhardness Vickers tests were performed using Zwick/Roell microhardness machine under the load of 0.2kG (HV0.2). Hardness measurements were made along the building (xy) and along the plane of the lateral side of the cuboid (xz). The powder used for manufacturing of the samples had a mean particle size of 41μm. It was homogenous with a spherical shape. The specimens were built chiefly from Ti, TiN and AlN. The dendritic microstructure was porous and fine-grained. Some of the aluminum nitride remained unmelted but no porosity was observed in the interface. The formed material was characterized by high hardness exceeding 700 HV0.2 over the entire cross-section. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=Selective%20Laser%20Melting" title="Selective Laser Melting">Selective Laser Melting</a>, <a href="https://publications.waset.org/abstracts/search?q=Composite" title=" Composite"> Composite</a>, <a href="https://publications.waset.org/abstracts/search?q=SEM" title=" SEM"> SEM</a>, <a href="https://publications.waset.org/abstracts/search?q=microhardness" title=" microhardness"> microhardness</a> </p> <a href="https://publications.waset.org/abstracts/122336/microstructure-of-ti-aln-composite-produced-by-selective-laser-melting" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/122336.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">136</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">771</span> Mechanical and Optical Properties of Doped Aluminum Nitride Thin Films</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=Padmalochan%20Panda">Padmalochan Panda</a>, <a href="https://publications.waset.org/abstracts/search?q=R.%20Ramaseshan"> R. Ramaseshan</a> </p> <p class="card-text"><strong>Abstract:</strong></p> Aluminum nitride (AlN) is a potential candidate for semiconductor industry due to its wide band gap (6.2 eV), high thermal conductivity and low thermal coefficient of expansion. A-plane oriented AlN film finds an important role in deep UV-LED with higher isotropic light extraction efficiency. Also, Cr-doped AlN films exhibit dilute magnetic semiconductor property with high Curie temperature (300 K), and thus compatible with modern day microelectronics. In this work, highly a-axis oriented wurtzite AlN and Al1-xMxN (M = Cr, Ti) films have synthesized by reactive co-sputtering technique at different concentration. Crystal structure of these films is studied by Grazing incidence X-ray diffraction (GIXRD) and Transmission electron microscopy (TEM). Identification of binding energy and concentration (x) in these films is carried out by X-ray photoelectron spectroscopy (XPS). Local crystal structure around the Cr and Ti atom of these films are investigated by X-ray absorption spectroscopy (XAS). It is found that Cr and Ti replace the Al atom in AlN lattice and the bond lengths in first and second coordination sphere with N and Al, respectively, decrease concerning doping concentration due to strong p-d hybridization. The nano-indentation hardness of Cr and Ti-doped AlN films seems to increase from 17.5 GPa (AlN) to around 23 and 27.5 GPa, respectively. An-isotropic optical properties of these films are studied by the Spectroscopic Ellipsometry technique. Refractive index and extinction coefficient of these films are enhanced in normal dispersion region as compared to the parent AlN film. The optical band gap energies also seem to vary between deep UV to UV regions with the addition of Cr, thus by bringing out the usefulness of these films in the area of optoelectronic device applications. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=ellipsometry" title="ellipsometry">ellipsometry</a>, <a href="https://publications.waset.org/abstracts/search?q=GIXRD" title=" GIXRD"> GIXRD</a>, <a href="https://publications.waset.org/abstracts/search?q=hardness" title=" hardness"> hardness</a>, <a href="https://publications.waset.org/abstracts/search?q=XAS" title=" XAS"> XAS</a> </p> <a href="https://publications.waset.org/abstracts/95083/mechanical-and-optical-properties-of-doped-aluminum-nitride-thin-films" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/95083.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">113</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">770</span> Dielectric Behavior of 2D Layered Insulator Hexagonal Boron Nitride</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=Nikhil%20Jain">Nikhil Jain</a>, <a href="https://publications.waset.org/abstracts/search?q=Yang%20Xu"> Yang Xu</a>, <a href="https://publications.waset.org/abstracts/search?q=Bin%20Yu"> Bin Yu</a> </p> <p class="card-text"><strong>Abstract:</strong></p> Hexagonal boron nitride (h-BN) has been used as a substrate and gate dielectric for graphene field effect transistors (GFETs). Using a graphene/h-BN/TiN (channel/dielectric/gate) stack, key material properties of h-BN were investigated i.e. dielectric strength and tunneling behavior. Work function difference between graphene and TiN results in spontaneous p-doping of graphene through a multi-layer h-BN flake. However, at high levels of current stress, n-doping of graphene is observed, possibly due to the charge transfer across the thin h-BN multi layer. Neither Direct Tunneling (DT) nor Fowler-Nordheim Tunneling (FNT) was observed in TiN/h-BN/Au hetero structures with h-BN showing two distinct volatile conduction states before breakdown. Hexagonal boron nitride emerges as a material of choice for gate dielectrics in GFETs because of robust dielectric properties and high tunneling barrier. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=graphene" title="graphene">graphene</a>, <a href="https://publications.waset.org/abstracts/search?q=transistors" title=" transistors"> transistors</a>, <a href="https://publications.waset.org/abstracts/search?q=conduction" title=" conduction"> conduction</a>, <a href="https://publications.waset.org/abstracts/search?q=hexagonal%20boron%20nitride" title=" hexagonal boron nitride"> hexagonal boron nitride</a>, <a href="https://publications.waset.org/abstracts/search?q=dielectric%20strength" title=" dielectric strength"> dielectric strength</a>, <a href="https://publications.waset.org/abstracts/search?q=tunneling" title=" tunneling"> tunneling</a> </p> <a href="https://publications.waset.org/abstracts/22593/dielectric-behavior-of-2d-layered-insulator-hexagonal-boron-nitride" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/22593.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">365</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">769</span> Research on Static and Dynamic Behavior of New Combination of Aluminum Honeycomb Panel and Rod Single-Layer Latticed Shell</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=Xu%20Chen">Xu Chen</a>, <a href="https://publications.waset.org/abstracts/search?q=Zhao%20Caiqi"> Zhao Caiqi</a> </p> <p class="card-text"><strong>Abstract:</strong></p> In addition to the advantages of light weight, resistant corrosion and ease of processing, aluminum is also applied to the long-span spatial structures. However, the elastic modulus of aluminum is lower than that of the steel. This paper combines the high performance aluminum honeycomb panel with the aluminum latticed shell, forming a new panel-and-rod composite shell structure. Through comparative analysis between the static and dynamic performance, the conclusion that the structure of composite shell is noticeably superior to the structure combined before. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=combination%20of%20aluminum%20honeycomb%20panel" title="combination of aluminum honeycomb panel">combination of aluminum honeycomb panel</a>, <a href="https://publications.waset.org/abstracts/search?q=rod%20latticed%20shell" title=" rod latticed shell"> rod latticed shell</a>, <a href="https://publications.waset.org/abstracts/search?q=dynamic%20performence" title=" dynamic performence"> dynamic performence</a>, <a href="https://publications.waset.org/abstracts/search?q=response%20spectrum%20analysis" title=" response spectrum analysis"> response spectrum analysis</a>, <a href="https://publications.waset.org/abstracts/search?q=seismic%20properties" title=" seismic properties"> seismic properties</a> </p> <a href="https://publications.waset.org/abstracts/31050/research-on-static-and-dynamic-behavior-of-new-combination-of-aluminum-honeycomb-panel-and-rod-single-layer-latticed-shell" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/31050.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">473</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">768</span> Aluminum Factories, Values and Regeneration Option</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=Tereza%20Bartosikova">Tereza Bartosikova</a> </p> <p class="card-text"><strong>Abstract:</strong></p> This paper describes the values of a specific type of industrial heritage-aluminum factories. It is an especially endangered kind of industrial heritage with only a little attention paid. The paper aims to highlight the uniqueness of these grounds and to specify several options for revitalizations. The research is based on complex aluminum factories mapping in Europe from archives and bibliographic sources and on site. There is analyzed gained information that could offer a new view on the aluminum grounds. Primarily, the data are described according to the works in Žiar nad Hronom, Slovakia. More than a half aluminum grounds have ended up the production, although they can go on further. They are closely connected with some areas identity and their presence has left striking footsteps in the environment. By saving them, the historical continuity, cultural identity of population and also the economic stability of region would be supported. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=aluminum" title="aluminum">aluminum</a>, <a href="https://publications.waset.org/abstracts/search?q=industrial%20heritage" title=" industrial heritage"> industrial heritage</a>, <a href="https://publications.waset.org/abstracts/search?q=regeneration" title=" regeneration"> regeneration</a>, <a href="https://publications.waset.org/abstracts/search?q=values" title=" values"> values</a> </p> <a href="https://publications.waset.org/abstracts/9599/aluminum-factories-values-and-regeneration-option" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/9599.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">387</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">767</span> Carbon Nitride Growth on ZnO Architectures for Enhanced Photoelectrochemical Water Splitting Application</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=%C5%A0pela%20Hajduk">Špela Hajduk</a>, <a href="https://publications.waset.org/abstracts/search?q=Sean%20P.%20Berglund"> Sean P. Berglund</a>, <a href="https://publications.waset.org/abstracts/search?q=Matejka%20Podlogar"> Matejka Podlogar</a>, <a href="https://publications.waset.org/abstracts/search?q=Goran%20Dra%C5%BEi%C4%87"> Goran Dražić</a>, <a href="https://publications.waset.org/abstracts/search?q=Fatwa%20F.%20Abdi"> Fatwa F. Abdi</a>, <a href="https://publications.waset.org/abstracts/search?q=Zorica%20C.%20Orel"> Zorica C. Orel</a>, <a href="https://publications.waset.org/abstracts/search?q=Menny%20Shalom"> Menny Shalom</a> </p> <p class="card-text"><strong>Abstract:</strong></p> Graphitic carbon nitride materials (g-CN) have emerged as an attractive photocatalyst and electrocatalyst for photo and electrochemical water splitting reaction, due to their environmental benignity nature and suitable band gap. Many approaches were introduced to enhance the photoactivity and electronic properties of g-CN and resulted in significant changes in the electronic and catalytic properties. Here we demonstrate the synthesis of thin and homogenous g-CN layer on highly ordered ZnO nanowire (NW) substrate by growing a seeding layer of small supramolecular assemblies on the nanowires. The new synthetic approach leads to the formation of thin g-CN layer (~3 nm) without blocking all structure. Two different deposition methods of carbon nitride were investigated and will be presented. The amount of loaded carbon nitride significantly influences the PEC activity of hybrid material and all the ZnO/g-CNx electrodes show great improvement in photoactivity. The chemical structure, morphology and optical properties of the deposited g-CN were fully characterized by various techniques as X-ray powder spectroscopy (XRD), scanning electron microscopy (SEM), focused ion beam scanning electron microscopy (FIB-SEM), high-resolution scanning microscopy (HR-TEM) and X-ray photoelectron spectroscopy (XPS). <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=carbon%20nitride" title="carbon nitride">carbon nitride</a>, <a href="https://publications.waset.org/abstracts/search?q=photoanode" title=" photoanode"> photoanode</a>, <a href="https://publications.waset.org/abstracts/search?q=solar%20water%20splitting" title=" solar water splitting"> solar water splitting</a>, <a href="https://publications.waset.org/abstracts/search?q=zinc%20oxide" title=" zinc oxide"> zinc oxide</a> </p> <a href="https://publications.waset.org/abstracts/71217/carbon-nitride-growth-on-zno-architectures-for-enhanced-photoelectrochemical-water-splitting-application" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/71217.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">195</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">766</span> Research of the Activation Energy of Conductivity in P-I-N SiC Structures Fabricated by Doping with Aluminum Using the Low-Temperature Diffusion Method</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=Ilkham%20Gafurovich%20Atabaev">Ilkham Gafurovich Atabaev</a>, <a href="https://publications.waset.org/abstracts/search?q=Khimmatali%20Nomozovich%20Juraev"> Khimmatali Nomozovich Juraev</a> </p> <p class="card-text"><strong>Abstract:</strong></p> The activation energy of conductivity in p-i-n SiC structures fabricated by doping with Aluminum using the new low-temperature diffusion method is investigated. In this method, diffusion is stimulated by the flux of carbon and silicon vacancies created by surface oxidation. The activation energy of conductivity in the p - layer is 0.25 eV and it is close to the ionization energy of Aluminum in 4H-SiC from 0.21 to 0.27 eV for the hexagonal and cubic positions of aluminum in the silicon sublattice for weakly doped crystals. The conductivity of the i-layer (measured in the reverse biased diode) shows 2 activation energies: 0.02 eV and 0.62 eV. Apparently, the 0.62 eV level is a deep trap level and it is a complex of Aluminum with a vacancy. According to the published data, an analogous level system (with activation energies of 0.05, 0.07, 0.09 and 0.67 eV) was observed in the ion Aluminum doped 4H-SiC samples. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=activation%20energy" title="activation energy">activation energy</a>, <a href="https://publications.waset.org/abstracts/search?q=aluminum" title=" aluminum"> aluminum</a>, <a href="https://publications.waset.org/abstracts/search?q=low%20temperature%20diffusion" title=" low temperature diffusion"> low temperature diffusion</a>, <a href="https://publications.waset.org/abstracts/search?q=SiC" title=" SiC"> SiC</a> </p> <a href="https://publications.waset.org/abstracts/74668/research-of-the-activation-energy-of-conductivity-in-p-i-n-sic-structures-fabricated-by-doping-with-aluminum-using-the-low-temperature-diffusion-method" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/74668.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">279</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">765</span> Friction Stir Welding of Aluminum Alloys: A Review</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=S.%20K.%20Tiwari">S. K. Tiwari</a>, <a href="https://publications.waset.org/abstracts/search?q=Dinesh%20Kumar%20Shukla"> Dinesh Kumar Shukla</a>, <a href="https://publications.waset.org/abstracts/search?q=R.%20Chandra"> R. Chandra</a> </p> <p class="card-text"><strong>Abstract:</strong></p> Friction stir welding is a solid state joining process. High strength aluminum alloys are widely used in aircraft and marine industries. Generally, the mechanical properties of fusion-welded aluminum joints are poor. As friction stir welding occurs in the solid state, no solidification structures are created thereby eliminating the brittle and eutectic phases common in fusion welding of high strength aluminum alloys. In this review, the process parameters, microstructural evolution and effect of friction stir welding on the properties of weld specific to aluminum alloys have been discussed. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=aluminum%20alloys" title="aluminum alloys">aluminum alloys</a>, <a href="https://publications.waset.org/abstracts/search?q=friction%20stir%20welding%20%28FSW%29" title=" friction stir welding (FSW)"> friction stir welding (FSW)</a>, <a href="https://publications.waset.org/abstracts/search?q=microstructure" title=" microstructure"> microstructure</a>, <a href="https://publications.waset.org/abstracts/search?q=Properties." title=" Properties. "> Properties. </a> </p> <a href="https://publications.waset.org/abstracts/2141/friction-stir-welding-of-aluminum-alloys-a-review" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/2141.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">416</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">764</span> High-Temperature Tribological Characterization of Nano-Sized Silicon Nitride + 5% Boron Nitride Ceramic Composite</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=Mohammad%20Farooq%20Wani">Mohammad Farooq Wani</a> </p> <p class="card-text"><strong>Abstract:</strong></p> Tribological studies on nano-sized ß-silicon nitride+5% BN were carried out in dry air at high temperatures to clarify the lack of consensus in the bibliographic data concerning the Tribological behavior of Si3N4 ceramics and effect of doped hexagonal boron nitride on coefficient of friction and wear coefficient at different loads and elevated temperatures. The composites were prepared via high energy mechanical milling and subsequent spark plasma sintering using Y2O3 and Al2O3 as sintering additives. After sintering, the average crystalline size of Si3N4 was observed to be 50 nm. Tribological tests were performed with temperature and Friction coefficients 0.16 to 1.183 and 0.54 to 0.71 were observed for Nano-sized ß-silicon nitride+5% BN composite under normal load of 10N-70 N and over high temperature range of 350 ºC-550 ºC respectively. Specific wear coefficients from 1.33x 10-4 mm3N-1m-1 to 4.42x 10-4 mm3N-1m-1 were observed for Nano-sized Si3N4 + 5% BN composite against Si3N4 ball as tribo-pair counterpart over high temperature range of 350 ºC-550 ºC while as under normal load of 10N to70N Specific wear coefficients of 6.91x 10-4 mm3N-1m-1 to 1.70x 10-4 were observed. The addition of BN to the Si3N4 composite resulted in a slight reduction of the friction coefficient and lower values of wear coefficient. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=ceramics" title="ceramics">ceramics</a>, <a href="https://publications.waset.org/abstracts/search?q=tribology" title=" tribology"> tribology</a>, <a href="https://publications.waset.org/abstracts/search?q=friction%20and%20wear" title=" friction and wear"> friction and wear</a>, <a href="https://publications.waset.org/abstracts/search?q=solid%20lubrication" title=" solid lubrication"> solid lubrication</a> </p> <a href="https://publications.waset.org/abstracts/15590/high-temperature-tribological-characterization-of-nano-sized-silicon-nitride-5-boron-nitride-ceramic-composite" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/15590.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">377</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">763</span> Corrosion Resistance of Mild Steel Coated with Different Polyimides/h-Boron Nitride Composite Films</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=Tariku%20Nefo%20Duke">Tariku Nefo Duke</a> </p> <p class="card-text"><strong>Abstract:</strong></p> Herein, we synthesized three PIs/h-boron nitride composite films for corrosion resistance of mild steel material. The structures of these three polyimide/h-boron nitride composite films were confirmed using (FTIR, 1H NMR, 13C NMR, and 2D NMR) spectroscopy techniques. The synthesized PIs composite films have high mechanical properties, thermal stability, high glass-transition temperature (Tg), and insulating properties. It has been shown that the presence of electroactive TiO2, SiO2, and h-BN, in polymer coatings effectively inhibits corrosion. The h-BN displays an admirable anti-corrosion barrier for the 6F-OD and BT-OD films. PI/ h-BN composite films of 6F-OD exhibited better resistance to water vapor, high corrosion resistance, and positive corrosion voltage. Only four wt. percentage of h-BN in the composite is adequate. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=polyimide" title="polyimide">polyimide</a>, <a href="https://publications.waset.org/abstracts/search?q=corrosion%20resistance" title=" corrosion resistance"> corrosion resistance</a>, <a href="https://publications.waset.org/abstracts/search?q=electroactive" title=" electroactive"> electroactive</a>, <a href="https://publications.waset.org/abstracts/search?q=Tg" title=" Tg"> Tg</a> </p> <a href="https://publications.waset.org/abstracts/149868/corrosion-resistance-of-mild-steel-coated-with-different-polyimidesh-boron-nitride-composite-films" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/149868.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">200</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">762</span> Effect of Precursor’s Grain Size on the Conversion of Microcrystalline Gallium Antimonide GaSb to Nanocrystalline Gallium Nitride GaN</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=Jerzy%20F.%20Janik">Jerzy F. Janik</a>, <a href="https://publications.waset.org/abstracts/search?q=Mariusz%20Drygas"> Mariusz Drygas</a>, <a href="https://publications.waset.org/abstracts/search?q=Miroslaw%20M.%20Bucko"> Miroslaw M. Bucko</a> </p> <p class="card-text"><strong>Abstract:</strong></p> A simple precursor system has been recently developed in our laboratory for the conversion of affordable microcrystalline gallium antimonide GaSb to a range of nanocrystalline powders of gallium nitride GaN – a wide bandgap semiconductor indispensable in modern optoelectronics. The process relies on high temperature nitridation reactions of GaSb with ammonia. Topochemical relationships set up by the cubic lattice of GaSb result in some metastable cubic GaN formed in addition to the stable hexagonal GaN. A prior application of high energy ball milling to the initially microcrystalline GaSb precursor is shown to alter the nitridation output. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=nanocrystalline" title="nanocrystalline">nanocrystalline</a>, <a href="https://publications.waset.org/abstracts/search?q=gallium%20nitride" title=" gallium nitride"> gallium nitride</a>, <a href="https://publications.waset.org/abstracts/search?q=GaN" title=" GaN"> GaN</a>, <a href="https://publications.waset.org/abstracts/search?q=gallium%20antimonide" title=" gallium antimonide"> gallium antimonide</a>, <a href="https://publications.waset.org/abstracts/search?q=GaSb" title=" GaSb"> GaSb</a>, <a href="https://publications.waset.org/abstracts/search?q=nitridation" title=" nitridation"> nitridation</a>, <a href="https://publications.waset.org/abstracts/search?q=ball%20milling" title=" ball milling"> ball milling</a> </p> <a href="https://publications.waset.org/abstracts/18150/effect-of-precursors-grain-size-on-the-conversion-of-microcrystalline-gallium-antimonide-gasb-to-nanocrystalline-gallium-nitride-gan" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/18150.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">400</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">761</span> Graphitic Carbon Nitride-CeO₂ Nanocomposite for Photocatalytic Degradation of Methyl Red</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=Khansaa%20Al-Essa">Khansaa Al-Essa</a> </p> <p class="card-text"><strong>Abstract:</strong></p> Nanosized ceria (CeO₂) and graphitic carbon nitride-loaded ceria (CeO₂/GCN) nanocomposite have been synthesized by the coprecipitation method and studied its photocatalytic activity for methyl red degradation under Visible type radiation. A phase formation study was carried out by using an x-ray diffraction technique, and it revealed that ceria (CeO₂) is properly supported on the surface of GCN. Ceria nanoparticles and CeO₂/GCN nanocomposite were confirmed by transmission electron microscopy technique. The particle size of the CeO₂, CeO₂/GCN nanocomposite is in the range of 10-15 nm. Photocatalytic activity of the CeO₂/g-C3N4 composite was improved as compared to CeO₂. The enhanced photocatalytic activity is attributed to the increased visible light absorption and improved adsorption of the dye on the surface of the composite catalyst. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=photodegradation" title="photodegradation">photodegradation</a>, <a href="https://publications.waset.org/abstracts/search?q=dye" title=" dye"> dye</a>, <a href="https://publications.waset.org/abstracts/search?q=nanocomposite" title=" nanocomposite"> nanocomposite</a>, <a href="https://publications.waset.org/abstracts/search?q=graphitic%20carbon%20nitride-CeO%E2%82%82" title=" graphitic carbon nitride-CeO₂"> graphitic carbon nitride-CeO₂</a> </p> <a href="https://publications.waset.org/abstracts/189432/graphitic-carbon-nitride-ceo2-nanocomposite-for-photocatalytic-degradation-of-methyl-red" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/189432.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">20</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">760</span> Numerical Design and Characterization of MOVPE Grown Nitride Based Semiconductors</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=J.%20Skibinski">J. Skibinski</a>, <a href="https://publications.waset.org/abstracts/search?q=P.%20Caban"> P. Caban</a>, <a href="https://publications.waset.org/abstracts/search?q=T.%20Wejrzanowski"> T. Wejrzanowski</a>, <a href="https://publications.waset.org/abstracts/search?q=K.%20J.%20Kurzydlowski"> K. J. Kurzydlowski</a> </p> <p class="card-text"><strong>Abstract:</strong></p> In the present study numerical simulations of epitaxial growth of gallium nitride in Metal Organic Vapor Phase Epitaxy reactor AIX-200/4RF-S are addressed. The aim of this study was to design the optimal fluid flow and thermal conditions for obtaining the most homogeneous product. Since there are many agents influencing reactions on the crystal growth area such as temperature, pressure, gas flow or reactor geometry, it is difficult to design optimal process. Variations of process pressure and hydrogen mass flow rates have been considered. According to the fact that it’s impossible to determine experimentally the exact distribution of heat and mass transfer inside the reactor during crystal growth, detailed 3D modeling has been used to get an insight of the process conditions. Numerical simulations allow to understand the epitaxial process by calculation of heat and mass transfer distribution during growth of gallium nitride. Including chemical reactions in the numerical model allows to calculate the growth rate of the substrate. The present approach has been applied to enhance the performance of AIX-200/4RF-S reactor. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=computational%20fluid%20dynamics" title="computational fluid dynamics">computational fluid dynamics</a>, <a href="https://publications.waset.org/abstracts/search?q=finite%20volume%20method" title=" finite volume method"> finite volume method</a>, <a href="https://publications.waset.org/abstracts/search?q=epitaxial%20growth" title=" epitaxial growth"> epitaxial growth</a>, <a href="https://publications.waset.org/abstracts/search?q=gallium%20nitride" title=" gallium nitride"> gallium nitride</a> </p> <a href="https://publications.waset.org/abstracts/19035/numerical-design-and-characterization-of-movpe-grown-nitride-based-semiconductors" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/19035.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">454</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">759</span> Experimental Study and Analysis of Parabolic Trough Collector with Various Reflectors </h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=Avadhesh%20Yadav">Avadhesh Yadav</a>, <a href="https://publications.waset.org/abstracts/search?q=Balram%20Manoj%20Kumar"> Balram Manoj Kumar </a> </p> <p class="card-text"><strong>Abstract:</strong></p> A solar powered air heating system using parabolic trough collector was experimentally investigated. In this experimental setup, the reflected solar radiations were focused on absorber tube which was placed at focal length of the parabolic trough. In this setup, air was used as working fluid which collects the heat from absorber tube. To enhance the performance of parabolic trough, collector with different type of reflectors were used. It was observed for aluminum sheet maximum temperature is 52.3ºC, which 24.22% more than steel sheet as reflector and 8.5% more than aluminum foil as reflector, also efficiency by using Aluminum sheet as reflector compared to steel sheet as reflector is 61.18% more. Efficiency by using aluminum sheet as reflector compared to aluminum foil as reflector is 18.98% more. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=parabolic%20trough%20collector" title="parabolic trough collector">parabolic trough collector</a>, <a href="https://publications.waset.org/abstracts/search?q=reflectors" title=" reflectors"> reflectors</a>, <a href="https://publications.waset.org/abstracts/search?q=air%20flow%20rates" title=" air flow rates"> air flow rates</a>, <a href="https://publications.waset.org/abstracts/search?q=solar%20power" title=" solar power"> solar power</a>, <a href="https://publications.waset.org/abstracts/search?q=aluminum%20sheet" title=" aluminum sheet"> aluminum sheet</a> </p> <a href="https://publications.waset.org/abstracts/2172/experimental-study-and-analysis-of-parabolic-trough-collector-with-various-reflectors" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/2172.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">360</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">758</span> High Thermal Selective Detection of NOₓ Using High Electron Mobility Transistor Based on Gallium Nitride</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=Hassane%20Ouazzani%20Chahdi">Hassane Ouazzani Chahdi</a>, <a href="https://publications.waset.org/abstracts/search?q=Omar%20Helli"> Omar Helli</a>, <a href="https://publications.waset.org/abstracts/search?q=Bourzgui%20Nour%20Eddine"> Bourzgui Nour Eddine</a>, <a href="https://publications.waset.org/abstracts/search?q=Hassan%20Maher"> Hassan Maher</a>, <a href="https://publications.waset.org/abstracts/search?q=Ali%20Soltani"> Ali Soltani</a> </p> <p class="card-text"><strong>Abstract:</strong></p> The real-time knowledge of the NO, NO₂ concentration at high temperature, would allow manufacturers of automobiles to meet the upcoming stringent EURO7 anti-pollution measures for diesel engines. Knowledge of the concentration of each of these species will also enable engines to run leaner (i.e., more fuel efficient) while still meeting the anti-pollution requirements. Our proposed technology is promising in the field of automotive sensors. It consists of nanostructured semiconductors based on gallium nitride and zirconia dioxide. The development of new technologies for selective detection of NO and NO₂ gas species would be a critical enabler of superior depollution. The current response was well correlated to the NO concentration in the range of 0–2000 ppm, 0-2500 ppm NO₂, and 0-300 ppm NH₃ at a temperature of 600. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=NO%E2%82%93%20sensors" title="NOₓ sensors">NOₓ sensors</a>, <a href="https://publications.waset.org/abstracts/search?q=HEMT%20transistor" title=" HEMT transistor"> HEMT transistor</a>, <a href="https://publications.waset.org/abstracts/search?q=anti-pollution" title=" anti-pollution"> anti-pollution</a>, <a href="https://publications.waset.org/abstracts/search?q=gallium%20nitride" title=" gallium nitride"> gallium nitride</a>, <a href="https://publications.waset.org/abstracts/search?q=gas%20sensor" title=" gas sensor"> gas sensor</a> </p> <a href="https://publications.waset.org/abstracts/79681/high-thermal-selective-detection-of-no-using-high-electron-mobility-transistor-based-on-gallium-nitride" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/79681.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">245</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">757</span> Modification of Hexagonal Boron Nitride Induced by Focused Laser Beam</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=I.%20Wlasny">I. Wlasny</a>, <a href="https://publications.waset.org/abstracts/search?q=Z.%20Klusek"> Z. Klusek</a>, <a href="https://publications.waset.org/abstracts/search?q=A.%20Wysmolek"> A. Wysmolek</a> </p> <p class="card-text"><strong>Abstract:</strong></p> Hexagonal boron nitride is a representative of a widely popular class of two-dimensional Van Der Waals materials. It finds its uses, among others, in construction of complexly layered heterostructures. Hexagonal boron nitride attracts great interest because of its properties characteristic for wide-gap semiconductors as well as an ultra-flat surface.Van Der Waals heterostructures composed of two-dimensional layered materials, such as transition metal dichalcogenides or graphene give hope for miniaturization of various electronic and optoelectronic elements. In our presentation, we will show the results of our investigations of the not previously reported modification of the hexagonal boron nitride layers with focused laser beam. The electrostatic force microscopy (EFM) images reveal that the irradiation leads to changes of the local electric fields for a wide range of laser wavelengths (from 442 to 785 nm). These changes are also accompanied by alterations of crystallographic structure of the material, as reflected by Raman spectra. They exhibit high stability and remain visible after at least five months. This behavior can be explained in terms of photoionization of the defect centers in h-BN which influence non-uniform electrostatic field screening by the photo-excited charge carriers. Analyzed changes influence local defect structure, and thus the interatomic distances within the lattice. These effects can be amplified by the piezoelectric character of hexagonal boron nitride, similar to that found in nitrides (e.g., GaN, AlN). Our results shed new light on the optical properties of the hexagonal boron nitride, in particular, those associated with electron-phonon coupling. Our study also opens new possibilities for h-BN applications in layered heterostructures where electrostatic fields can be used in tailoring of the local properties of the structures for use in micro- and nanoelectronics or field-controlled memory storage. This work is supported by National Science Centre project granted on the basis of the decision number DEC-2015/16/S/ST3/00451. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=atomic%20force%20microscopy" title="atomic force microscopy">atomic force microscopy</a>, <a href="https://publications.waset.org/abstracts/search?q=hexagonal%20boron%20nitride" title=" hexagonal boron nitride"> hexagonal boron nitride</a>, <a href="https://publications.waset.org/abstracts/search?q=optical%20properties" title=" optical properties"> optical properties</a>, <a href="https://publications.waset.org/abstracts/search?q=raman%20spectroscopy" title=" raman spectroscopy"> raman spectroscopy</a> </p> <a href="https://publications.waset.org/abstracts/75769/modification-of-hexagonal-boron-nitride-induced-by-focused-laser-beam" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/75769.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">173</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">756</span> A Review on Aluminium Metal Matric Composites</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=V.%20Singh">V. Singh</a>, <a href="https://publications.waset.org/abstracts/search?q=S.%20Singh"> S. Singh</a>, <a href="https://publications.waset.org/abstracts/search?q=S.%20S.%20Garewal"> S. S. Garewal</a> </p> <p class="card-text"><strong>Abstract:</strong></p> Metal matrix composites with aluminum as the matrix material have been heralded as the next great development in advanced engineering materials. Aluminum metal matrix composites (AMMC) refer to the class of light weight high performance material systems. Properties of AMMCs can be tailored to the demands of different industrial applications by suitable combinations of matrix, reinforcement and processing route. AMMC finds its application in automotive, aerospace, defense, sports and structural areas. This paper presents an overview of AMMC material systems on aspects relating to processing, types and applications with case studies. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=aluminum%20metal%20matrix%20composites" title="aluminum metal matrix composites">aluminum metal matrix composites</a>, <a href="https://publications.waset.org/abstracts/search?q=applications%20of%20aluminum%20metal%20matrix%20composites" title=" applications of aluminum metal matrix composites"> applications of aluminum metal matrix composites</a>, <a href="https://publications.waset.org/abstracts/search?q=lighting%20material%20processing%20of%20aluminum%20metal%20matrix%20composites" title=" lighting material processing of aluminum metal matrix composites"> lighting material processing of aluminum metal matrix composites</a> </p> <a href="https://publications.waset.org/abstracts/62849/a-review-on-aluminium-metal-matric-composites" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/62849.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">464</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">755</span> The Mechanical Properties of In-Situ Consolidated Nanocrystalline Aluminum Alloys</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=Khaled%20M.%20Youssef">Khaled M. Youssef</a>, <a href="https://publications.waset.org/abstracts/search?q=Sara%20I.%20Ahmed"> Sara I. Ahmed</a> </p> <p class="card-text"><strong>Abstract:</strong></p> In this study, artifacts-free bulk nanocrystalline pure aluminum alloy samples were prepared through mechanical milling under ultra-high purity argon and at both liquid nitrogen and room temperatures. The nanostructure evolution during milling was examined using X-ray diffraction and transmission electron microscope techniques. The in-situ consolidated samples after milling exhibited an average grain size of 18 nm. The tensile properties of this novel material are reported in comparison with coarse-grained aluminum alloys. The 0.2% offset yield strength of the nanocrystalline aluminum was found to be 340 MPa. This value is at least one order of magnitude higher than that of the coarse-grained aluminum alloy. In addition to this extraordinarily high strength, the nanocrystalline aluminum showed a significant tensile ductility, with 6% uniform elongation and 11% elongation-to-failure. The transmission electron microscope observations in this study provide evidence of deformation twinning in the plastically deformed nanocrystalline aluminum. These results highlight a change of the deformation mechanism from a typical dislocation slip to twinning deformation induced by partial dislocation activities. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=nanocrystalline" title="nanocrystalline">nanocrystalline</a>, <a href="https://publications.waset.org/abstracts/search?q=aluminum" title=" aluminum"> aluminum</a>, <a href="https://publications.waset.org/abstracts/search?q=strength" title=" strength"> strength</a>, <a href="https://publications.waset.org/abstracts/search?q=ductility" title=" ductility"> ductility</a> </p> <a href="https://publications.waset.org/abstracts/147805/the-mechanical-properties-of-in-situ-consolidated-nanocrystalline-aluminum-alloys" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/147805.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">182</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">754</span> Preparation and Characterization of α–Alumina with Low Sodium Oxide</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=Gyung%20Soo%20Jeon">Gyung Soo Jeon</a>, <a href="https://publications.waset.org/abstracts/search?q=Hong%20Bae%20Kim"> Hong Bae Kim</a>, <a href="https://publications.waset.org/abstracts/search?q=Chi%20Jung%20Oh"> Chi Jung Oh</a> </p> <p class="card-text"><strong>Abstract:</strong></p> In order to prepare the α-alumina with low content of sodium oxide from aluminum trihydroxide as a reactant, three kinds of methods were employed as follows; the mixture of Chamotte (aggregate composed of silica and alumina), ammonium chloride and aluminum fluoride with aluminum trihydroxide under 1600°C, respectively. The sodium oxide in α-alumina produced above methods was analyzed by XRF and the particle size distribution was determined by particle size analyzer, and the specific surface area of α-alumina was measured by BET method, and phase of α-alumina produced was confirmed by XRD. Acknowledgement: This research was supported by Development Program of Technical Innovation funded by Korea Technology and Information Promotion Agency for SMEs (KTIP-2016-S2401821). <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=%CE%B1-alumina" title="α-alumina">α-alumina</a>, <a href="https://publications.waset.org/abstracts/search?q=sodium%20oxide" title=" sodium oxide"> sodium oxide</a>, <a href="https://publications.waset.org/abstracts/search?q=aluminum%20trihydroxide" title=" aluminum trihydroxide"> aluminum trihydroxide</a>, <a href="https://publications.waset.org/abstracts/search?q=Chamotte" title=" Chamotte"> Chamotte</a>, <a href="https://publications.waset.org/abstracts/search?q=ammonium%20chloride" title=" ammonium chloride"> ammonium chloride</a>, <a href="https://publications.waset.org/abstracts/search?q=aluminum%20fluoride" title=" aluminum fluoride"> aluminum fluoride</a> </p> <a href="https://publications.waset.org/abstracts/66138/preparation-and-characterization-of-a-alumina-with-low-sodium-oxide" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/66138.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">315</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">753</span> A Study on the Synthesis of Boron Nitride Microtubes </h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=Pervaiz%20Ahmad">Pervaiz Ahmad</a>, <a href="https://publications.waset.org/abstracts/search?q=Mayeen%20Uddin%20Khandaker"> Mayeen Uddin Khandaker</a>, <a href="https://publications.waset.org/abstracts/search?q=Yusoff%20Mohd%20Amin"> Yusoff Mohd Amin</a> </p> <p class="card-text"><strong>Abstract:</strong></p> A unique cone-like morphologies of boron nitride microtubes with larger internal space and thin walls structure are synthesized in a dual zone quartz tube furnace at 1200 ° C with ammonia as a reaction atmosphere. The synthesized microtubes are found to have diameter in the range of 1 to ̴ 2 μm with walls thickness estimated from 10 – 100 nm. XPS survey shows N 1s and B 1s peaks at 398.7 eV and 191 eV that represent h-BN in the sample. Raman spectroscopy indicates a high intensity peak at 1372.53 (cm-1) that corresponds to the E2g mode of h-BN. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=BNMTs" title="BNMTs">BNMTs</a>, <a href="https://publications.waset.org/abstracts/search?q=synthesis" title=" synthesis"> synthesis</a>, <a href="https://publications.waset.org/abstracts/search?q=reaction%20atmosphere" title=" reaction atmosphere"> reaction atmosphere</a>, <a href="https://publications.waset.org/abstracts/search?q=growth" title=" growth"> growth</a> </p> <a href="https://publications.waset.org/abstracts/30502/a-study-on-the-synthesis-of-boron-nitride-microtubes" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/30502.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">384</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">752</span> Implementing Activity-Based Costing in Architectural Aluminum Projects: Case Study and Lessons Learned</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=Amer%20Momani">Amer Momani</a>, <a href="https://publications.waset.org/abstracts/search?q=Tarek%20Al-Hawari"> Tarek Al-Hawari</a>, <a href="https://publications.waset.org/abstracts/search?q=Abdallah%20Alakayleh"> Abdallah Alakayleh</a> </p> <p class="card-text"><strong>Abstract:</strong></p> This study explains how to construct an actionable activity-based costing and management system to accurately track and account the total costs of architectural aluminum projects. Two ABC models were proposed to accomplish this purpose. First, the learning and development model was introduced to examine how to apply an ABC model in an architectural aluminum firm for the first time and to be familiar with ABC concepts. Second, an actual ABC model was built on the basis of the results of the previous model to accurately trace the actual costs incurred on each project in a year, and to be able to provide a quote with the best trade-off between competitiveness and profitability. The validity of the proposed model was verified on a local architectural aluminum company. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=activity-based%20costing" title="activity-based costing">activity-based costing</a>, <a href="https://publications.waset.org/abstracts/search?q=activity-based%20management" title=" activity-based management"> activity-based management</a>, <a href="https://publications.waset.org/abstracts/search?q=construction" title=" construction"> construction</a>, <a href="https://publications.waset.org/abstracts/search?q=architectural%20aluminum" title=" architectural aluminum"> architectural aluminum</a> </p> <a href="https://publications.waset.org/abstracts/175107/implementing-activity-based-costing-in-architectural-aluminum-projects-case-study-and-lessons-learned" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/175107.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">102</span> </span> </div> </div> <div class="card paper-listing mb-3 mt-3"> <h5 class="card-header" style="font-size:.9rem"><span class="badge badge-info">751</span> Titanium Nitride Nanoparticles for Biological Applications</h5> <div class="card-body"> <p class="card-text"><strong>Authors:</strong> <a href="https://publications.waset.org/abstracts/search?q=Nicole%20Nazario%20Bayon">Nicole Nazario Bayon</a>, <a href="https://publications.waset.org/abstracts/search?q=Prathima%20Prabhu%20Tumkur"> Prathima Prabhu Tumkur</a>, <a href="https://publications.waset.org/abstracts/search?q=Nithin%20Krisshna%20Gunasekaran"> Nithin Krisshna Gunasekaran</a>, <a href="https://publications.waset.org/abstracts/search?q=Krishnan%20Prabhakaran"> Krishnan Prabhakaran</a>, <a href="https://publications.waset.org/abstracts/search?q=Joseph%20C.%20Hall"> Joseph C. Hall</a>, <a href="https://publications.waset.org/abstracts/search?q=Govindarajan%20T.%20Ramesh"> Govindarajan T. Ramesh</a> </p> <p class="card-text"><strong>Abstract:</strong></p> Titanium nitride (TiN) nanoparticles have sparked interest over the past decade due to their characteristics such as thermal stability, extreme hardness, low production cost, and similar optical properties to gold. In this study, TiN nanoparticles were synthesized via a thermal benzene route to obtain a black powder of nanoparticles. The final product was drop cast onto conductive carbon tape and sputter coated with gold/palladium at a thickness of 4 nm for characterization by field emission scanning electron microscopy (FE-SEM) with energy dispersive X-Ray spectroscopy (EDX) that revealed they were spherical. ImageJ software determined the average size of the TiN nanoparticles was 79 nm in diameter. EDX revealed the elements present in the sample and showed no impurities. Further characterization by X-ray diffraction (XRD) revealed characteristic peaks of cubic phase titanium nitride, and crystallite size was calculated to be 14 nm using the Debye-Scherrer method. Dynamic light scattering (DLS) analysis revealed the size and size distribution of the TiN nanoparticles, with average size being 154 nm. Zeta potential concluded the surface of the TiN nanoparticles is negatively charged. Biocompatibility studies using MTT(3-(4,5-Dimethylthiazol-2-yl)-2,5-Diphenyltetrazolium Bromide) assay showed TiN nanoparticles are not cytotoxic at low concentrations (2, 5, 10, 25, 50, 75 mcg/well), and cell viability began to decrease at a concentration of 100 mcg/well. <p class="card-text"><strong>Keywords:</strong> <a href="https://publications.waset.org/abstracts/search?q=biocompatibility" title="biocompatibility">biocompatibility</a>, <a href="https://publications.waset.org/abstracts/search?q=characterization" title=" characterization"> characterization</a>, <a href="https://publications.waset.org/abstracts/search?q=cytotoxicity" title=" cytotoxicity"> cytotoxicity</a>, <a href="https://publications.waset.org/abstracts/search?q=nanoparticles" title=" nanoparticles"> nanoparticles</a>, <a href="https://publications.waset.org/abstracts/search?q=synthesis" title=" synthesis"> synthesis</a>, <a href="https://publications.waset.org/abstracts/search?q=titanium%20nitride" title=" titanium nitride"> titanium nitride</a> </p> <a href="https://publications.waset.org/abstracts/147449/titanium-nitride-nanoparticles-for-biological-applications" class="btn btn-primary btn-sm">Procedia</a> <a href="https://publications.waset.org/abstracts/147449.pdf" target="_blank" class="btn btn-primary btn-sm">PDF</a> <span class="bg-info text-light px-1 py-1 float-right rounded"> Downloads <span class="badge badge-light">178</span> </span> </div> </div> <ul class="pagination"> <li class="page-item disabled"><span class="page-link">&lsaquo;</span></li> <li class="page-item active"><span class="page-link">1</span></li> <li class="page-item"><a class="page-link" href="https://publications.waset.org/abstracts/search?q=aluminum%20nitride&amp;page=2">2</a></li> <li class="page-item"><a class="page-link" href="https://publications.waset.org/abstracts/search?q=aluminum%20nitride&amp;page=3">3</a></li> <li class="page-item"><a class="page-link" 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